Abstract: A manual-electronic pipetting device for pipetting a medium. The pipetting device includes a controller, a manually displaceable actuating element, at least one piston for aspirating and discharging the medium, a motor for driving the at least one piston in response to an actuation and/or displacement of the actuating element, at least one sensor for determining a displacement of the actuating element, and a data storage. The controller determines a pipetting protocol based on at least one sensor signal of the at least one sensor during a displacement of the actuating element, the controller further storing the pipetting protocol in the data storage, the pipetting protocol including data records indicative of a position and a speed of the at least one piston during the displacement of the actuating element.

Abstract: A manual-electronic pipetting device for pipetting a medium is provided. The pipetting device comprises a controller, a manually displaceable actuating element, at least one piston for aspirating and discharging the medium, a motor for driving the at least one piston in response to an actuation and/or displacement of the actuating element, at least one sensor for determining a displacement of the actuating element, and a data storage. The controller is configured to determine a pipetting protocol based on at least one sensor signal of the at least one sensor during a displacement of the actuating element, wherein the controller is further configured to store the pipetting protocol in the data storage, the pipetting protocol comprising data records indicative of a position and a speed of the at least one piston during the displacement of the actuating element.

Abstract: An axial fan has an impeller provided with vanes and mounted in a flow duct. In or on the wall of the duct at least one port is arranged adjacent to the vane tips. The duct side the port is provided with a covering means having passages therethrough.

Abstract: A plasma or photo-induced chemical vapor deposition coating process and apparatus are provided for applying thin dielectric coatings on planar, curved, and large area substrates. A plasma is generated in a tubular outer conductor. This plasma or the UV radiation occurring in the plasma passes through an opening into a reaction chamber. The opening preferably extends axially along the outer conductor and communicates with the interior of the reaction chamber. At least one component of the reaction gas is introduced directly to the opening or into the reaction gas is introduced directly to the opening or into the reaction chamber adjacent to the opening, bypassing the outer conductor. In this apparatus, the reactive deposition of a coating onto a substrate occurs only in the reaction chamber and below the opening from the outer conductor.

Abstract: For producing a fiberoptic waveguide preforms by plasma pulse-induced chemical vapor deposition (PICVD), blank glass tubes are prepared having a continuously increasing internal diameter in the direction of gas flow. This type of blank compensates for the otherwise occurring decrease in the density of the layer-forming molecules due to pressure drop, thereby permitting the formation of a uniform masswise deposition of layer-forming molecules along the length of the tube. This permits the production of collapsed preforms having a series of coating layers of substantially uniform thickness.

Abstract: A plasma or photo-induced chemical vapor deposition coating process and apparatus are provided for applying thin dielectric coatings on planar, curved, and large area substrates. A plasma is generated in a tubular outer conductor. This plasma or the UV radiation occurring in the plasma passes through an opening into a reaction chamber. The opening preferably extends axially along the outer conductor and communicates with the interior of the reaction chamber. At least one component of the reaction gas is introduced directly to the opening or into the reaction chamber adjacent to the opening, bypassing the outer conductor. In this apparatus, the reactive deposition of a coating onto a substrate occurs only in the reaction chamber and below the opening from the outer conductor.

Abstract: A plasma process and apparatus are provided for coating one or more planar substrates by a plasma-induced chemical vapor deposition in which plasma electrodes provide a plurality of overlapping plasma columns which extend over the entire surface of the substrate to be coated. A plurality of plasma electrodes are fixed in planes above, between, or below the substrates, and the individual plasma electrodes can be separately controlled. With a plasma pulse/CVD process, the spacing and angle between the substrates can be varied to alter the thickness of the coating. The process can be used for coating large area, planar vitreous bodies with multilayer optical coatings.

Abstract: A process is provided for producing a planar glass substrate coated with a dielectric layer system in which the individual layers are formed by a chemical vapor deposition coating process. After the layers have been applied, the glass substrate is either drawn, compressed, or its surface enlarged until the coating layers are reduced in thickness. A planar glass substrate having a multiplicity of extremely thin dielectric layers can be fabricated according to this process.

Abstract: The gas-blast breaker exhibits two contact members (1, 2) which are located in a housing filled with insulating gas and can be brought into and out of engagement with one another along an axis (5), and an insulating material nozzle (4) through the nozzle constriction (6) of which an arc burns during a switching process. The nozzle constriction (6) is formed by several segments (7) which follow one another in the circumferential direction, can be moved in the radial direction and can be loaded with a centripetally acting force.In this gas-blast breaker, the cross-section of the nozzle constriction (6) which is effective during a switching process is intended to be largely independent of the number of switching processes performed and causing nozzle erosion.

Abstract: The compressed-gas breaker exhibits two contact members (3; 11, 12, 13), of which one (11, 12, 13) is constructed as a nozzle, and an insulating nozzle (5) and a heating volume (8) for storing switching-arc-generated compressed gas.This breaker is intended to be distinguished by a high pressure buildup in the heating volume (8) and a great thermal quenching capacity.This is achieved by a multi-part construction of the contact member (11, 12, 13) acting as a nozzle. In particular, this contact member (11, 12, 13) exhibits a tubular body (13), which is axially displaceably conducted in a contact carrier (11), of erosion-resistant contact material, which, during interruption, forms the nozzle constriction (19) of this contact member (11, 12, 13) while under the action of a spring (15).

Abstract: The propagation of sound in flow channels is attenuated by a sound attenuating box comprised of cell-like chambers each with a bottom, an outer plate and a partition with an opening spaced from the outer plate such that the Helmholtz resonator established by the sub-chamber between the bottom and the partiton as well as by the opening is positively coupled to the outer plate as far as vibrations in the audible range are concerned through air flow through the openings and in the subchamber between partition and outer plate. The chambers share appropriately side walls, bottoms, partitions as well as aperture plates, and outer plates.

Abstract: The invention relates to a noiseless combustion and plasma cutting arrangnt with a cutter and an associated gridiron- or honeycomb-type bench that is divided into individual cells that are higher than they are wide to reduce the noise that occurs during cutting.