Abstract: A dispersion powder composition based on water-insoluble polymers with particularly low water absorption comprises, based on the total weight of the polymer, an amount in the range from 0.1 to 30% by weight of at least one carboxylic ester whose acid component has at least 6 carbon atoms and whose alcohol component is a polyhydroxy compound, preferably glycerol, diglycerol, or triglycerol. This is prepared by mixing polymer and protective colloid with the carboxylic ester to prepare a dispersion and then, where appropriate, drying this with simultaneous admixing of an anticaking agent, and gives good results when used for modifying wallpaper pastes, mortars, or concrete.

Abstract: A dispersion powder composition based on water-insoluble polymers with particularly low water absorption comprises, based on the total weight of the polymer, an amount in the range from 0.1 to 30% by weight of at least one carboxylic ester whose acid component has at least 6 carbon atoms and whose alcohol component is a polyhydroxy compound, preferably glycerol, diglycerol, or triglycerol. This is prepared by mixing polymer and protective colloid with the carboxylic ester to prepare a dispersion and then, where appropriate, drying this with simultaneous admixing of an anticaking agent, and gives good results when used for modifying wallpaper pastes, mortars, or concrete.

Abstract: The present invention relates to a water-dispersible dispersion powder composition based on water-insoluble polymers, and comprising, based on the total weight of the polymer, from 0.1 to 30% by weight of at least one carboxylic ester whose alcohol component derives from the group consisting of the polyhydroxy compounds, and to a process for preparing the composition, and also to the use of the composition, in particular for reducing the water absorption of construction compositions.

Abstract: The invention relates to the use of a powder composition which comprises at least one carboxylic ester, for hydrophobicizing construction compositions.

Abstract: Polyvinyl ester dispersions which can be employed as binders in building materials, preferably in the form of redispersible plastics powders, are obtained by polymerization of at least one vinyl ester and optionally other monomers which can be copolymerized with vinyl ester, by use of water-soluble cationic azo initiator.

Abstract: Dispersion powders with a reduced tendency to autoignition are obtained by adding antioxidants to dispersions before spray drying or to dispersion powders after spray drying.

Abstract: A photopolymerizable composition, which contains a polymeric binder, a compound which can be polymerized by free radicals and has at least one terminal ethylenic double bond and a photoinitiator combination comprising an N-heterocyclic compound, a thioxanthone derivative and a dialkylamino compound, is highly photosensitive and produces photoresist stencils with vertical side walls.

Abstract: A photopolymerizable composition, which contains a polymeric binder, a compound which can be polymerized by free radicals and has at least one terminal ethylenic double bond and a photoinitiator combination comprising an N-heterocyclic compound, a thioxanthone derivative and a dialkylamino compound, is highly photosensitive and produces photoresist stencils with vertical side walls.

Abstract: A pulverulent adhesive composition which comprises (a) at least one polymer selected from the group consisting of vinyl ester polymers, (meth)acrylate polymers and styrene(meth)acrylate polymers, (b) at least one tackifying resin (tackifier) and, optionally, (c) one or more protective colloids, and, optionally, (d) one or more anticaking agents. The present composition is suitable for use in formulations used for the adhesive bonding of porous and/or semiporous substrates.

Abstract: A process for the preparation of a synthetic resin dispersion stabilized by a protective colloid employing at least one initiator and based on a polymer of (a) a first monomer of at least one ester of acrylic acid or methacrylic acid and an alcohol containing 1 to 22 carbon atoms; and optionally, (b) a second monomer which can be copolymerized with the first monomers. The process comprises introducing at least 50% of the monomers based on the total weight of the monomers, at least 50% of the protective colloid based on the total weight of the protective colloid, and up to 50% of the initiator based on the total weight of the initiator into a reaction vessel to form an aqueous emulsion. Any remaining monomers and protective colloid and at least 50% of the initiator based on the total weight of the initiator are then added to the reaction vessel at a temperature of 30.degree. to 100.degree. C.

Abstract: Radiation-polymerizable composition which comprisesa) a constituent that can be polymerized by free radicals and has a boiling point above 100.degree. C.,b) a photoinitiator, andc) a copolymer comprising units ofc1) an .alpha., .beta.-unsaturated aliphatic carboxylic acid,c2) an alkyl, cycloalkyl or cycloalkenyl methacrylate, andc3) an alkyl, cycloalkyl or cycloalkenyl acrylateand has an acid number of 78 to 176 and a glass transition temperature of 290 to 340 K. The composition is characterized by its ready developability at a low acid number and its good resistance to alkaline etching solutions.

Abstract: Disclosed is a compound of the general formula ##STR1## wherein L=H or CO--(R.sup.1).sub.n (CX.sub.3).sub.m, M=alkylene, alkenylene, Q=S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, with M+Q together forming 3 or 4 ring members, R=alkyl, aralkyl or alkoxyalkyl, R.sup.1 is an aromatic group and X=Cl, Br or I, with n=O and m=1 or n=1 and m=1 or 2. The compounds, on exposure, eliminate HX and form free radicals and are therefore highly effective as acid donors and free radical initiators for photochemical processes.

Abstract: A radiation-polymerizable mixture, recording material and process for using the recording material in relief recordings. The radiation-polymerizable mixture contains:(a) a polymeric binder,(b) a compound of the formula: ##STR1## `in which A is O, NH or N-alkyl,Q is --CO--C.sub.p H.sub.2p -Z-- or --C.sub.k H.sub.2k O--,Z is O or NH,R.sup.1 is H or alkyl,R.sup.2 is alkyl, alkenyl, cycloalkyl, aryl, aralkyl or SO.sub.2 R.sup.3,R.sup.3 is alkyl, alkenyl, cycloalkyl, aryl, aralkyl or aryloxy,k is a number from 3 to 20,l is a number from 0 to 20,m is a number from 2 to 20,n is a number from 1 to 20 andp is a number from 2 to 10, and(c) a compound or a combination of compounds, which is capable of initiating the polymerization of the compound (b) under the action of actinic radiation.The mixture is especially suitable for the preparation of dry photoresist materials and is distinguished by good flexibility and adhesion to copper and by easy strippability in the light-cured state.

Abstract: Light-hardened photoresist layers are stripped by treating the layer with an aqueous solution of an organic quaternary ammonium base and, optionally a strong inorganic base. The resulting layer residues are dispersed as relatively small flakes which do not become lodged between conducting paths.

Abstract: A layer comprised of a radiation-polymerizable mixture containing (a) a first compound capable of undergoing free radical polymerization, the first compound containing at least two terminal ethylenically unsaturated groups and having a boiling point above 100.degree. C. under atmospheric pressure, (b) a second compound capable of initiating the polymerization of the first compound when exposed to actinic radiation, and (c) a water-insoluble copolymer which is soluble in aqueous alkaline solutions and which comprises (c1) an .alpha..beta.-unsaturated aliphatic carboxylic acid and (c2) an alkyl methacrylate having at least 4 carbon atoms in the alkyl group, wherein the copolymer has a mean molecular weight in the range from about 50,000 to 200,000 possesses high flexiblity and resilience in both unexposed and exposed states. The mixture is particularly suitable for use as dry resist material for the tenting technique in printed circuit board production.

Abstract: Disclosed is a radiation-sensitive composition, a recording material prepared therewith, and process therefor. The invention is suitable for the production of printing plates and photoresists. The composition contains a 1,2-quinonediazide or a combination of (1) a compound which, under the action of actinic radiation, forms a strong acid, and (2) a compound which possesses at least one acid-cleavable C--O--C bond, the solubility of which in a liquid developer is increased by the action of acid and, as the binder, a polymer having lateral crosslinking groups of the formula --CH.sub.2 OR, in which R is a hydrogen atom, a lower alkyl group, acyl group or hydroxyalkyl group. After being exposed and developed, the composition can be thermally cured and results in an image stencil exhibiting a clean background.

Abstract: A photopolymerizable composition is disclosed which comprises: (a) a free-radically polymerizable compound, (b) a polymeric binder, (c) a photopolymerization initiator, (d) a compound which is thermally crosslinkable with the polymeric binder, with a polymerization product of (a) or with itself, and (e) a pigment. The disclosed composition is used for applying markings to printed circuits and preferably is applied to the solder-resist layer using a dry-resist process, is exposed and then developed, either separately or together with the solder-resist layer.

Abstract: A photopolymerizable composition is disclosed which comprises (a) a polymeric binder, (b) a polymerizable compound, and (c) a photoinitiator comprised of a compound according to formula I ##STR1## wherein R.sup.1 is a hydrogen atom, a halogen atom, an alkyl group, alkoxy group, or dialkylamino group,R.sup.1 ' is a hydrogen atom, a halogen atom or an alkyl groupR.sup.2 is an alkyl group or an alkoxycarbonylalkyl group, or, if R.sup.1 and R.sup.2 each denote an alkyl moiety,R.sup.1 and R.sup.2 together form a five- or six-membered ring, andR.sup.3 denotes a tertiary amino group.The compounds are distinguished by their good solubility and high activity in the short-wave visible region of the spectrum.

Abstract: Disclosed is a radiation-polymerizable mixture which includes a polymerizable compound, a radiation-activatable polymerization initiator and a polymeric binder with lateral cross-linking groups of the formula--CH.sub.2 OR,wherein R denotes a hydrogen atom or a lower alkyl group, a lower acyl group or a lower hydroxyalkyl group. The mixture is cured by heating after development. Also disclosed is a polymerizable copying material which includes a layer comprising the mixture and a process for producing a solder mask including a laminating step for laminating a photoresist layer which includes the layer.

Abstract: The present invention relates to a photosensitive transfer material, which comprises a flexible temporary support film which is preferably transparent, a thermoplastic photosensitive layer, optionally a flexible cover film on the free side of the photosensitive layer and, optionally, an intermediate layer between the support film and the photosensitive layer. The photosensitive transfer material is suitable for manufacturing photoresist stencils and solder masks. The temporary support film has a rough surface which exerts an embossing effect on the surface of the photosensitive layer and the intermediate layer, respectively. The mat-finish of the intermediate layer prevents an irregular deformation of this layer in moist air, while the mat-finish of the photosensitive layer precludes unwanted reflections.