Abstract: A process for the preparation of a quinacridone comprises oxidation of a 6,13-dihydroquinacridone using hydrogen peroxide, wherein a polymeric dispersant is present in the oxidation reaction mixture. The resulting pigment products exhibit greatly improved dispersibility relative to pigments in which the polymeric dispersant is not present during the oxidation reaction.

Abstract: A process for the preparation of a quinacridone comprises oxidation of a 6,13-dihydroquinacridone using hydrogen peroxide, wherein a polymeric dispersant is present in the oxidation reaction mixture. The resulting pigment products exhibit greatly improved dispersibility relative to pigments in which the polymeric dispersant is not present during the oxidation reaction.

Abstract: The invention relates to a color-pigmented high molecular weight organic material structured from a radiation-sensitive precursor by irradiation, the pigmentation of which material consists of extremely fine particles, at least 80 mol % of the pigmentation consisting of a pigment of the class diketopyrrolopyrrole, dioxazine, isoindoline, isoindolinone, disazo condensation yellow or benzimidazolonazo, each containing at least one --NHCO-- group, and, where appropriate, a second pigment of the class diketopyrrolopyrrole, dioxazine, isoindoline, isoindolinone, benzimidazolonazo, disazo or phthalocyanine, and, when the structure of the main pigment is point-symmetrical, the two pigments being present in a balanced molar ratio of from 1:1 to 7:3. Those materials are used preferably in the form of thin layers which are built up in patterns in one or more layers on a transparent substrate and can be used, for example, as optical color filters.

Abstract: Photoresist compositions are described, which are sufficiently transparent in the solvent-free state for radiation of a wavelength of approximately 193 nm, and which contain nonaromatic chemical groups, which can be converted into groups with aromatic structural elements (latent aromatic groups) under process conditions, for which an image structure comprised of the resist material is not disrupted. A preferred component with latent aromatic groups is bicyclo[3.2.2]nona-6,8-dien-3-one. Resist coatings, which are produced with these compositions, show a stability in plasma etching, which is comparable with the stability of conventional resists based on phenolic resins.

Abstract: Compositions for making structured color images comprising(a) a soluble pigment precursor which can be transformed to an insoluble pigment by means of chemical, thermal, photolytic or radiation-induced method, and(b) a binder polymer or prepolymer, or a positive or negative resist-type resin which can be structured by crosslinking, polymerization or depolymerization by applying heat or electromagnetic irradiation.The compositions can be applied to optical and thermal recording, printing, and the production of color filters for Liquid Crystal Displays, with high accuracy, high transparency and high stability.

Abstract: This invention relates to a black-pigmented high molecular weight organic material which is structured from a radiation-sensitive precursor by irradiation, the pigmentation of which material consists of coloured organic pigments, at least one of which is in latent form before irradiation. This material is preferably used as a thin layer which is built up in the form of patterns on a transparent substrate and which can be used, for example, as black matrix for optical colour filters. This invention also relates to a process for the preparation of this material as well as to novel soluble derivatives of yellow disazo condensation pigments which can be used in this process.

Abstract: Compositions for making structured color images comprising (a) a soluble pigment precursor which can be transformed to an insoluble pigment by means of chemical, thermal, photolytic or radiation-induced method, and (b) a binder polymer or prepolymer, or a positive or negative resist-type resin which can be structured by crosslinking, polymerization or depolymerization by applying heat or electromagnetic irradiation. The compositions can be applied to optical and thermal recording, printing, and the production of color filters for Liquid Crystal Displays, with high accuracy, high transparency and high stability.

Abstract: Polymers having a molecular weight (weight average) M.sub.w from 10.sup.3 to 10.sup.6, comprising recurring structural units of the formulae (I), (IIa) and (IIb) ##STR1## in which R.sub.1 is hydrogen or methyl, Y is a direct bond or a divalent radical of the formula (III) ##STR2## in which Z is a C.sub.1 -C.sub.6 alkylene group bound to the phenyl nucleus,OR.sub.2 is an acid-cleavable radical,in which R.sub.2 is C.sub.4 -C.sub.10 tert-alkyl, allyl, cyclohex-2-enyl, C.sub.6 -C.sub.14 aryl or C.sub.7 -C.sub.16 aralkyl which are unsubstituted or mono- or poly-substituted by C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms, trialkylsilyl or a group of the formulae (IV)-(VII) ##STR3## in which R.sub.8 is C.sub.1 -C.sub.6 alkyl, or C.sub.6 -C.sub.14 aryl or C.sub.7 -C.sub.16 aralkyl which are unsubstituted or mono- or poly-substituted by C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms,R.sub.3 and R.sub.4 independently of one another are hydrogen, C.sub.

Abstract: Non-polymeric compounds which contain at least one aromatic ring system carrying one or more one or more tetrahydropyranyloxy substituents of formula I ##STR1## wherein R.sub.1 is hydrogen, halogen, alkyl, cycloalkyl, aryl, alkoxy or aryloxy,R.sub.2 is hydrogen, alkyl, cycloalkyl or aryl,R.sub.3 is a saturated or unsaturated hydrocarbon radical,R.sub.4 and R.sub.5 are each independently of the other hydrogen, halogen, alkyl, alkoxy or aryloxy, andX is a direct single bond or a methylene or ethylene bridge.These compounds are especially suitable for the preparation of photoresist compositions which can be used both for the production of positive as well as negative images. The photoresists are preferably used for deep-UV microlithography.

Abstract: Polymers having a molecular weight (weight average) M.sub.w from 10.sup.3 to 10.sup.6, comprising recurring structural units of the formulae (I), (IIa) and (IIb) ##STR1## in which R.sub.1 is hydrogen or methyl, Y is a direct bond or a divalent radical of the formula (III) ##STR2## in which Z is a C.sub.1 -C.sub.6 alkylene group bound to the phenyl nucleus,OR.sub.2 is an acid-cleavable radical,in which R.sub.2 is C.sub.4 -C.sub.10 tert-alkyl, allyl, cyclohex-2-enyl, C.sub.6 -C.sub.14 aryl or C.sub.7 -C.sub.16 aralkyl which are unsubstituted or mono- or poly-substituted by C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms, trialkylsilyl or a group of the formulae (IV)-(VII) ##STR3## in which R.sub.8 is C.sub.1 -C.sub.6 alkyl, or C.sub.6 -C.sub.14 aryl or C.sub.7 -C.sub.16 aralkyl which are unsubstituted or mono- or poly-substituted by C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms,R.sub.3 and R.sub.4 independently of one another are hydrogen, C.sub.

Abstract: Copolymers having a molecular weight (Mw) of from 10.sup.3 to 10.sup.6, measured by gel-permeation chromatography, that are crosslinkable by acid catalysis and that consist ofa) 100-80 mol. % of structural repeating units of formulae I and II ##STR1## in a ratio of from 1:1 to 1:9 and b) 0-20 mol. % of structural repeating units of formula III ##STR2## wherein X and X' each independently of the other are ##STR3## R is hydrogen or a protecting group that can be removed by the action of acids, the radicals R.sub.1 each independently of the other are C.sub.1 -C.sub.5 alkyl, phenyl or naphthyl or together are 1,2-phenylene or --[C(R.sub.3)(R.sub.4)].sub.x -- wherein R.sub.3 and/or R.sub.4 =hydrogen or methyl and x is from 2 to 5, the radicals R.sub.2 each independently of the other are hydrogen, C.sub.1 -C.sub.5 alkyl or C.sub.1 -C.sub.5 alkoxy, R.sub.5 and R.sub.7 are each hydrogen, R.sub.6 is hydrogen, halogen or methyl and R.sub.8 is hydrogen, halogen, methyl, --CH.sub.2 halogen, --CH.sub.

Abstract: Photosensitive compositions comprisinga) at least one solid film-forming polyphenol,b) at least one compound of formula I ##STR1## wherein n is 2, 3 or 4, Ar is an n-valent benzene or naphthalene radical or a divalent radical of formula II ##STR2## Q is a direct bond, --O--, --SO--, --SO.sub.2 --, --CH.sub.2 --, --C(CH.sub.3)(phenyl)- or --C(CH.sub.3).sub.2 --, each of R.sub.1 and R.sub.2, independently of the other, is C.sub.1 -C.sub.8 alkyl, or phenyl or naphthyl each of which is unsubstituted or substituted by C.sub.1 -C.sub.4 alkyl, or R.sub.1 and R.sub.2 together are 1,2-phenylene or --[C(R')(R")].sub.m --, each of R' and R", independently of the other, is hydrogen, C.sub.1 -C.sub.4 alkyl or phenyl and m is 2, 3 or 4, andc) at least one compound that forms an acid under actinic radiation are described.Those compositions are used as negative resists, especially for producing printing plates, printed circuits and integrated circuits.

Abstract: Non-polymeric compounds which contain at least one aromatic ring system carrying one or more one or more tetrahydropyranyloxy substituents of formula I ##STR1## wherein R.sub.1 is hydrogen, halogen, alkyl, cycloalkyl, aryl, alkoxy or aryloxy,R.sub.2 is hydrogen, alkyl, cycloalkyl or aryl,R.sub.3 is a saturated or unsaturated hydrocarbon radical,R.sub.4 and R.sub.5 are each independently of the other hydrogen, halogen, alkyl, alkoxy or aryloxy, andX is a direct single bond or a methylene or ethylene bridge.These compounds are especially suitable for the preparation of photoresist compositions which can be used both for the production of positive as well as negative images. The photoresists are preferably used for deep-UV microlithography.