Abstract: The present invention relates to an X-ray fluorescence, XRF, spectrometer, for measuring X-ray fluorescence emitted by a target, wherein the XRF spectrometer comprises an X-ray tube with an anode to emit a divergent X-ray beam, a capillary lens that is configured to focus the divergent X-ray beam on the target, an aperture system that is positioned between the anode of the X-ray tube and the capillary lens and comprises at least one pinhole, and a detector that is configured for detecting X-ray fluorescence radiation emitted by the target, wherein the at least one pinhole is configured for being inserted into the divergent X-ray beam and for reducing a beam cross section of the divergent X-ray beam between the anode and the capillary lens. The present invention further relates to an aperture system for a spectrometer, to the use of an aperture system for adjusting the focal depth of a spectrometer and to a method for adjusting the focal depth of as spectrometer.

Abstract: The present invention relates to an X-ray fluorescence, XRF, spectrometer, for measuring X-ray fluorescence emitted by a target, wherein the XRF spectrometer comprises an X-ray tube with an anode that is emitting a divergent X-ray beam, a capillary lens that is configured to focus the divergent X-ray beam on the target, an aperture system that is positioned between the anode of the X-ray tube and the capillary lens and comprises at least one pinhole, and a detector that is configured for detecting X-ray fluorescence radiation emitted by the target, wherein the at least one pinhole is configured for being inserted into the divergent X-ray beam and for reducing a beam cross section of the divergent X-ray beam between the anode and the capillary lens. The present invention further relates to an aperture system for a spectrometer, to the use of an aperture system for adjusting the focal depth of a spectrometer and to an method for adjusting the focal depth of as spectrometer.

Abstract: The invention relates to a device (98) for the spatial alignment of X-ray optics (100) with an entry point (104) and an exit point (108). The device (98) comprises a parallel displacement mechanism (200) for gauging the entry point (104) of the X-ray optics (100) to a first predetermined point (100) by parallel displacement of the X-ray optics (100). Further, the device (98) comprises a goniometer mechanism (300) for gauging the exit point (108) of the X-ray optics (100) to a second predetermined point (106) by at least approximate pivoting of the X-ray optics (100) around the entry point (104). Further, the invention relates to an apparatus (96) which comprises the device (98) and X-ray optics (100).

Abstract: A method for scanning a sample by means of X-ray optics for irradiating the sample with X-rays, comprises the following steps: (a) displacing a measuring point, defined by an optical exit point of the X-ray optics, in the sample in a first scanning direction by means of swiveling the X-ray optics about a first swivel axis; (b) detecting radiation emanating from the sample at, at least, two measuring points along the first scanning direction; (c) combining measured values correlating with the detected radiation to form an overall scan.

Abstract: The invention relates to a device (98) for the spatial alignment of X-ray optics (100) with an entry point (104) and an exit point (108). The device (98) comprises a parallel displacement mechanism (200) for gauging the entry point (104) of the X-ray optics (100) to a first predetermined point (100) by means of parallel displacement of the X-ray optics (100). Further, the device (98) comprises a goniometer mechanism (300) for gauging the exit point (108) of the X-ray optics (100) to a second predetermined point (106) by means of the at least approximate pivoting of the X-ray optics (100) around the entry point (104). Further, the invention relates to an apparatus (96) which comprises the device (98) and X-ray optics (100).