Patents by Inventor Ulrike BRAUN

Ulrike BRAUN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Filter substrate for filtering and optically characterizing microparticles, method for producing the filter substrate, and use of the filter substrate
    Patent number: 11879823
    Abstract: The present invention relates to a filter substrate for filtering and optically characterizing microparticles. The filter substrate comprises a wafer having a thickness of at least 100 pm and a transmittance of at least 10% for radiation in the wavelength range of 2500 nm to 15000 nm. Furthermore, the surface of the front side and/or the surface of the rear side of the wafer is completely or partially provided with an antireflective layer, which prevents the optical reflection of radiation in the wavelength range of 200 nm to 10000 nm. Moreover, the wafer has, at least in some regions, filter holes having a diameter of 1 pm to 5 mm. With the filter substrate according to the invention, microparticles can be filtered and the microparticles on the filter substrate can be subsequently optically characterized with very high measurement quality.
    Type: Grant
    Filed: April 11, 2019
    Date of Patent: January 23, 2024
    Assignees: FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V., HOCHSCHULE ANHALT (FH), BUNDESANSTALT FÜR MATERIALFORSCHUNG UND-PRÜFUNG (BAM)
    Inventors: Christian Hagendorf, Kai Kaufmann, Ulrike Braun
  • FILTER SUBSTRATE FOR FILTERING AND OPTICALLY CHARACTERIZING MICROPARTICLES, METHOD FOR PRODUCING THE FILTER SUBSTRATE, AND USE OF THE FILTER SUBSTRATE
    Publication number: 20210364405
    Abstract: The present invention relates to a filter substrate for filtering and optically characterizing microparticles. The filter substrate comprises a wafer having a thickness of at least 100 pm and a transmittance of at least 10% for radiation in the wavelength range of 2500 nm to 15000 nm. Furthermore, the surface of the front side and/or the surface of the rear side of the wafer is completely or partially provided with an antireflective layer, which prevents the optical reflection of radiation in the wavelength range of 200 nm to 10000 nm. Moreover, the wafer has, at least in some regions, filter holes having a diameter of 1 pm to 5 mm. With the filter substrate according to the invention, microparticles can be filtered and the microparticles on the filter substrate can be subsequently optically characterized with very high measurement quality.
    Type: Application
    Filed: April 11, 2019
    Publication date: November 25, 2021
    Applicants: Fraunhofer-Gesellschaft zur Förderung der Angewandten Forschung e.V., Hochschule Anhalt (FH), Bundesanstalt für Materialforschung und -prüfung (BAM)
    Inventors: Christian HAGENDORF, Kai KAUFMANN, Ulrike BRAUN