Patents by Inventor Ulrike Roessner

Ulrike Roessner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Integrated circuit, intermediate structure and a method of fabricating a semiconductor structure
    Patent number: 7858514
    Abstract: In a method of fabricating a semiconductor structure, a carbon containing mask is fabricated over a dielectric layer. The mask exposes the surface of the dielectric layer at least partly in a region between two adjacent conducting lines. A contact hole is etched into the dielectric layer in the region between the two adjacent conducting lines.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: December 28, 2010
    Assignee: Qimonda AG
    Inventors: Ulrike Roessner, Daniel Koehler, Ilona Juergensen, Mirko Vogt
  • Integrated Circuit, Intermediate Structure and a Method of Fabricating a Semiconductor Structure
    Publication number: 20090001595
    Abstract: In a method of fabricating a semiconductor structure, a carbon containing mask is fabricated over a dielectric layer. The mask exposes the surface of the dielectric layer at least partly in a region between two adjacent conducting lines. A contact hole is etched into the dielectric layer in the region between the two adjacent conducting lines.
    Type: Application
    Filed: June 29, 2007
    Publication date: January 1, 2009
    Inventors: Ulrike Roessner, Daniel Koehler, Ilona Juergensen, Mirko Vogt