Patents by Inventor Uma Rames Krishna LAGUDA

Uma Rames Krishna LAGUDA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Abrasive-free planarization for EUV mask substrates
    Patent number: 9097994
    Abstract: A process for abrasive-free chemical mechanical planarization of silicon thin film coated EUV mask substrates is disclosed. The process removes bumps and pits on the substrate thereby mitigating reflective errors in the mask. The process employs a two-step polishing procedure, in which the second step is abrasive-free and uses an amine or amine salt as the polishing agent.
    Type: Grant
    Filed: January 25, 2013
    Date of Patent: August 4, 2015
    Assignees: Sematech, Inc., Clarkson University
    Inventors: Suryadevara V. Babu, Hariprasad Amanapu, Uma Rames Krishna Laguda, Ranganath Teki
  • ABRASIVE-FREE PLANARIZATION FOR EUV MASK SUBSTRATES
    Publication number: 20130209924
    Abstract: A process for abrasive-free chemical mechanical planarization of silicon thin film coated EUV mask substrates is disclosed. The process removes bumps and pits on the substrate thereby mitigating reflective errors in the mask. The process employs a two-step polishing procedure, in which the second step is abrasive-free and uses an amine or amine salt as the polishing agent.
    Type: Application
    Filed: January 25, 2013
    Publication date: August 15, 2013
    Inventors: Suryadevara V. BABU, Hariprasad AMANAPU, Uma Rames Krishna LAGUDA, Ranganath TEKI