Patents by Inventor Umberto Colombo

Umberto Colombo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method to fabricate a redirecting mirror in optical waveguide devices
    Patent number: 8236481
    Abstract: A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer is formed, has a contrast not larger than 3. A first portion of the photoresist layer is exposed to an electron beam, wherein the electron dose of the electron beam exposure is varied within the first portion according to a selected pattern, and wherein the electron does to which a given region in the photoresist is exposed, depends on the resulting photoresist height in the given region after development. A second portion of the photoresist layer is exposed to UV radiation; the first and the second portions are overlapped at least in a third portion.
    Type: Grant
    Filed: December 13, 2010
    Date of Patent: August 7, 2012
    Assignee: Google Inc.
    Inventors: Alessandro Nottola, Umberto Colombo, Giorgio Cataldo Mutinati, Stefano Sardo
  • METHOD TO FABRICATE A REDIRECTING MIRROR IN OPTICAL WAVEGUIDE DEVICES
    Publication number: 20110136063
    Abstract: A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer is formed, has a contrast not larger than 3. A first portion of the photoresist layer is exposed to an electron beam, wherein the electron dose of the electron beam exposure is varied within the first portion according to a selected pattern, and wherein the electron does to which a given region in the photoresist is exposed, depends on the resulting photoresist height in the given region after development. A second portion of the photoresist layer is exposed to UV radiation; the first and the second portions are overlapped at least in a third portion.
    Type: Application
    Filed: December 13, 2010
    Publication date: June 9, 2011
    Inventors: Alessandro Nottola, Umberto Colombo, Giorgio Cataldo Mutinati, Stefano Sardo
  • Method to fabricate a redirecting mirror in optical waveguide devices
    Patent number: 7871760
    Abstract: A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer is formed, has a contrast not larger than 3. A first portion of the photoresist layer is exposed to an electron beam, wherein the electron dose of the electron beam exposure is varied within the first portion according to a selected pattern, and wherein the electron does to which a given region in the photoresist is exposed, depends on the resulting photoresist height in the given region after development. A second portion of the photoresist layer is exposed to UV radiation; the first and the second portions are overlapped at least in a third portion.
    Type: Grant
    Filed: March 31, 2005
    Date of Patent: January 18, 2011
    Assignee: PGT Photonics S.p.A.
    Inventors: Alessandro Nottola, Umberto Colombo, Giorgio Cataldo Mutinati, Stefano Sardo
  • Method to Fabricate a Redirecting Mirror in Optical Waveguide Devices
    Publication number: 20090020499
    Abstract: A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer is formed, has a contrast not larger than 3. A first portion of the photoresist layer is exposed to an electron beam, wherein the electron dose of the electron beam exposure is varied within the first portion according to a selected pattern, and wherein the electron does to which a given region in the photoresist is exposed, depends on the resulting photoresist height in the given region after development. A second portion of the photoresist layer is exposed to UV radiation; the first and the second portions are overlapped at least in a third portion.
    Type: Application
    Filed: March 31, 2005
    Publication date: January 22, 2009
    Inventors: Alessandro Nottola, Umberto Colombo, Giorgio Cataldo Mutinati, Stefano Sardo