Patents by Inventor Umesh Adiga
Umesh Adiga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11947270Abstract: Apparatuses and methods for metrology on devices using fast marching level sets are disclosed herein. An example method at least includes initiating a fast marching level set seed on an image, propagating a fast marching level set curve from the fast marching level set seed to locate boundaries of a plurality of regions of interest within the image, and performing metrology on the regions of interest based in part on the boundaries.Type: GrantFiled: February 16, 2021Date of Patent: April 2, 2024Assignee: FEI CompanyInventor: Umesh Adiga
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Publication number: 20240094142Abstract: Adaptive endpoint detection is applied to delayering of a multi-layer sample utilizing a combination of dynamic and predetermined parameters. Retrospective evaluation of peaks and troughs can re-classify endpoints as signal properties emerge, enabling accurate mapping of endpoints to layers. The described techniques can be integrated with analysis operations and can be applied across a wide range of device types and manufacturing processes.Type: ApplicationFiled: July 13, 2023Publication date: March 21, 2024Applicant: FEI CompanyInventors: Sophia E. Weeks, Umesh Adiga
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Publication number: 20230260085Abstract: Methods and systems for performing a hybrid machine learning method for enhancing scanning electron microscopy (SEM) images are disclosed herein. Methods include the steps of acquiring a plurality of images of a region of a sample that were each generated by irradiating the sample with a pulsed charged particle beam, upscaling each of the individual images to generate a plurality of upscaled images of the region of the sample, and combining the plurality of upscaled images to form a noise reduced image of the region of the sample.Type: ApplicationFiled: February 17, 2022Publication date: August 17, 2023Applicant: FEI CompanyInventor: Umesh ADIGA
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Publication number: 20230177715Abstract: Fiducial coordinates are obtained by aligning template with region of interest extracted from a workpiece image. Image values in the region of interest are projected along a template axis and the project values evaluated to establish a fiducial location which can be used as a reference location for locating workpiece areas for ion beam milling or other processing.Type: ApplicationFiled: December 3, 2021Publication date: June 8, 2023Applicant: FEI CompanyInventors: Umesh Adiga, Mark Biedrzycki
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Patent number: 11494914Abstract: Smart metrology methods and apparatuses disclosed herein process images for automatic metrology of desired features. An example method at least includes extracting a region of interest from an image, the region including one or more boundaries between different sections, enhancing at least the extracted region of interest based on one or more filters, generating a multi-scale data set of the region of interest based on the enhanced region of interest, initializing a model of the region of interest; optimizing a plurality of active contours within the enhanced region of interest based on the model of the region of interest and further based on the multi-scale data set, the optimized plurality of active contours identifying the one or more boundaries within the region of interest, and performing metrology on the region of interest based on the identified boundaries.Type: GrantFiled: July 15, 2020Date of Patent: November 8, 2022Assignee: FEI CompanyInventor: Umesh Adiga
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Publication number: 20210263430Abstract: Apparatuses and methods for metrology on devices using fast marching level sets are disclosed herein. An example method at least includes initiating a fast marching level set seed on an image, propagating a fast marching level set curve from the fast marching level set seed to locate boundaries of a plurality of regions of interest within the image, and performing metrology on the regions of interest based in part on the boundaries.Type: ApplicationFiled: February 16, 2021Publication date: August 26, 2021Applicant: FEI CompanyInventor: Umesh ADIGA
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Publication number: 20200349713Abstract: Smart metrology methods and apparatuses disclosed herein process images for automatic metrology of desired features. An example method at least includes extracting a region of interest from an image, the region including one or more boundaries between different sections, enhancing at least the extracted region of interest based on one or more filters, generating a multi-scale data set of the region of interest based on the enhanced region of interest, initializing a model of the region of interest; optimizing a plurality of active contours within the enhanced region of interest based on the model of the region of interest and further based on the multi-scale data set, the optimized plurality of active contours identifying the one or more boundaries within the region of interest, and performing metrology on the region of interest based on the identified boundaries.Type: ApplicationFiled: July 15, 2020Publication date: November 5, 2020Applicant: FEI CompanyInventor: Umesh Adiga
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Patent number: 10748290Abstract: Smart metrology methods and apparatuses disclosed herein process images for automatic metrology of desired features. An example method at least includes extracting a region of interest from an image, the region including one or more boundaries between different sections, enhancing at least the extracted region of interest based on one or more filters, generating a multi-scale data set of the region of interest based on the enhanced region of interest, initializing a model of the region of interest; optimizing a plurality of active contours within the enhanced region of interest based on the model of the region of interest and further based on the multi-scale data set, the optimized plurality of active contours identifying the one or more boundaries within the region of interest, and performing metrology on the region of interest based on the identified boundaries.Type: GrantFiled: October 31, 2018Date of Patent: August 18, 2020Assignee: FEI CompanyInventor: Umesh Adiga
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Publication number: 20200134824Abstract: Smart metrology methods and apparatuses disclosed herein process images for automatic metrology of desired features. An example method at least includes extracting a region of interest from an image, the region including one or more boundaries between different sections, enhancing at least the extracted region of interest based on one or more filters, generating a multi-scale data set of the region of interest based on the enhanced region of interest, initializing a model of the region of interest; optimizing a plurality of active contours within the enhanced region of interest based on the model of the region of interest and further based on the multi-scale data set, the optimized plurality of active contours identifying the one or more boundaries within the region of interest, and performing metrology on the region of interest based on the identified boundaries.Type: ApplicationFiled: October 31, 2018Publication date: April 30, 2020Inventor: Umesh ADIGA
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Patent number: 9147104Abstract: A method of classifying, with a computer processor, at least one feature of cells from a low contrast, digital image. The method includes generating a contrast-enhanced image by applying a high-pass filter to the low contrast, digital image. The contrast-enhanced image is smoothed with a first low pass filter. A background image, generated from the low contrast, digital image, is subtracted from the smoothed, contrast-enhanced image to form an analysis image. The at least one feature is identified in analysis image.Type: GrantFiled: November 1, 2013Date of Patent: September 29, 2015Assignee: The United States of America as represented by the Secretary of the Air ForceInventors: Umesh Adiga, Thomas J. Lamkin
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Publication number: 20140126802Abstract: A method of classifying, with a computer processor, at least one feature of cells from a low contrast, digital image. The method includes generating a contrast-enhanced image by applying a high-pass filter to the low contrast, digital image. The contrast-enhanced image is smoothed with a first low pass filter. A background image, generated from the low contrast, digital image, is subtracted from the smoothed, contrast-enhanced image to form an analysis image. The at least one feature is identified in analysis image.Type: ApplicationFiled: November 1, 2013Publication date: May 8, 2014Applicant: Government of the United States as Represented by the Secretary of the Air ForceInventors: Umesh Adiga, Thomas J. Lamkin