Patents by Inventor Uppala V. Choudary

Uppala V. Choudary has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4611091
    Abstract: A thin film photovoltaic device having first layer of copper indium selenide, a second layer of cadmium sulfide having a thickness less than 2500 angstroms, and a third layer of conducting wide bandgap semiconductor such as zinc oxide. The transparent third layer allows good transmission of blue light to the junction region while fully depleting the junction area to improve device voltage.
    Type: Grant
    Filed: December 6, 1984
    Date of Patent: September 9, 1986
    Assignee: Atlantic Richfield Company
    Inventors: Uppala V. Choudary, Yuh-Han Shing, Richard R. Potter, James H. Ermer, Vijay K. Kapur
  • Patent number: 4581108
    Abstract: A process of forming a compound semiconductive material having a plurality of constituent elements comprising electrodepositing a plurality of such constituent elements and subsequently heating the deposits to produce the desired semiconductive material.
    Type: Grant
    Filed: January 6, 1984
    Date of Patent: April 8, 1986
    Assignee: Atlantic Richfield Company
    Inventors: Vijay K. Kapur, Uppala V. Choudary, Alan K. P. Chu
  • Patent number: 4465575
    Abstract: At least two constituent elements of a semiconductor compound are deposited in varying proportions by magnetron sputtering to produce a film having a preselected concentration gradient of the constituent elements. The film can be heat treated during or after deposition to diffuse the constituent elements within the film and enhance growth of a desired film structure. The sputtering step may be performed using a planar magnetron having a plurality of continuous magnetically enhanced sputtering cathodes extending about a common axis. Each of the cathodes includes a source structure containing at least one of the constituent elements, and provision for applying electrical power to the source structure to sputter the constituent element at a controlled rate. If one of the elements is difficult to control in the deposition process, it can be sputtered from a cathode made up of a stable alloy of the element and another constituent of the film. For example, when the semiconductor compound is CuInSe.sub.
    Type: Grant
    Filed: February 28, 1983
    Date of Patent: August 14, 1984
    Assignee: Atlantic Richfield Company
    Inventors: Robert B. Love, Uppala V. Choudary
  • Patent number: 4388286
    Abstract: A method for refining silicon to produce a high purity silicon product for re-use in industries which demand high purity silicon starting material, comprising vacuum refining said silicon to remove gaseous CO and SiO followed by mixing with an effective fluxing material of at least one fluoride of alkali metals and/or alkaline earth metals, heating the mixture at a temperature and time sufficient to produce a molten silicon phase and a slag phase, and separating the slag from the silicon for recovery of the silicon for re-use.
    Type: Grant
    Filed: January 27, 1982
    Date of Patent: June 14, 1983
    Assignee: Atlantic Richfield Company
    Inventors: Vijay K. Kapur, Uppala V. Choudary