Patents by Inventor Urbain L. Laridon

Urbain L. Laridon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4411978
    Abstract: A photosensitive recording material which includes in a supported layer a mixture of photosensitive substances in admixture with one or more polymers that are soluble in an alkaline aqueous liquid, characterized in that such mixture of photosensitive substances essentially consists of:(A) at least one photosensitive nitrone of the formula: ##STR1## in which: R is an aromatic hydrocarbon group including a substituted aromatic hydrocarbon group,R.sup.
    Type: Grant
    Filed: March 13, 1978
    Date of Patent: October 25, 1983
    Assignee: AGFA-Gevaert N.V.
    Inventors: Urbain L. Laridon, Hendrik E. Kokelenberg, Rafael P. Samijn
  • Patent number: 4282309
    Abstract: A photosensitive composition of matter suited for the production of polymer resist images which composition comprises a mixture of:(1) a photopolymerizable ethylenically unsaturated compound,(2) at least one oxime ester photopolymerization initiator, and(3) at least one sensitizer increasing the photopolymerization rate of said composition said sensitizer being defined in two general formulae said formulae including respectively a merocyanine dye, a zeromethine merocyanine dye, a carbostyril compound, an aryl-substituted 2-pyrazoline compound, an aryl-substituted oxazole compound, an aryl-substituted 1,2,4-triazole compound, an aryl-substituted 1,3,4-oxadiazole compound or an aryl-substituted-4-oxazolin-2-one compound.
    Type: Grant
    Filed: December 21, 1979
    Date of Patent: August 4, 1981
    Assignee: Agfa-Gevaert, N.V.
    Inventors: Urbain L. Laridon, Walter F. DeWinter, Hendrik E. Kokelenberg
  • Patent number: 4255513
    Abstract: A photosensitive material is described which comprises a base and a solid photosensitive layer comprising a photopolymerizable compound and a photopolymerization initiating mixture consisting of an oxime ester, a photopolymerization initiator and a p-dialkylaminobenzene of the formula ##STR1## wherein R.sup.1 and R.sup.2 are lower alkyl, R.sup.3 is hydrogen, alkyl, alkoxy or N(R.sup.1) (R.sup.2) and X is --CO--, --CS--, CH.sub.2, or --CH(OH)--.Synergistic photocuring sensitivity is obtained by said oxime ester in admixture with said p-dialkyl aminobenzene compound.
    Type: Grant
    Filed: August 8, 1979
    Date of Patent: March 10, 1981
    Assignee: AGFA-GEVAERT N.V.
    Inventors: Urbain L. Laridon, August M. Marien, Walter F. De Winter, Hendrik E. Kokelenberg
  • Patent number: RE30107
    Abstract: A recording process, wherein an organic reducing compound being present in a supported or self-supporting layer and corresponding to one of the following general formulae (I) and (II): ##STR1## wherein: R.sub.1 represents hydrogen, an aliphatic group of a cycloaliphatic group, andR.sub.2 represents an aliphatic oxy group, a cycloaliphatic oxy group, an aryloxy group, an amino group of the formula ##STR2## in which R.sub.3 and R.sub.4 (same or different) represent hydrogen, an aliphatic, a cycloaliphatic or an aromatic group or R.sub.3 and R.sub.4 represent together the necessary atoms to close a heterocyclic nitrogen containing nucleus; ##STR3## wherein R.sub.5 represents an aliphatic, cycloaliphatic, aromatic or heterocyclic group, is caused to effect in said layer under the influence of information-wise heating an information-wise reduction of a reducible reaction partner.
    Type: Grant
    Filed: July 18, 1978
    Date of Patent: October 2, 1979
    Assignee: AGFA-GEVAERT N.V.
    Inventors: Urbain L. Laridon, Albert L. Poot, Jozef F. Willems