Abstract: Disclosed herein is a system for non-destructive depth-profiling of samples. The system includes: (i) an electron beam (e-beam) source for projecting e-beams at each of a plurality of landing energies on an inspected sample; (ii) an electron sensor for obtaining a measured set of electron intensities pertaining to each of the landing energies; and (iii) processing circuitry for determining a set of structural parameters, which characterizes an internal geometry and/or a composition of the inspected sample, based on the measured set of electron intensities and taking into account reference data indicative of an intended design of the inspected sample.

Abstract: Disclosed herein is a computer-based method for non-destructive depth-profiling of samples. The method includes a measurement operation and a data analysis operation. The measurement operation includes, for each of a plurality of landing energies: (i) projecting an electron beam on a sample, which penetrates the sample to a respective depth determined by the landing energy, and (ii) sensing electrons returned from the sample, thereby obtaining a respective sensed electrons data set. The data analysis operation includes generating from the sensed electrons data sets a concentration map, which characterizing at least a vertical dimension of the sample.

Abstract: Disclosed herein is a system for non-destructive depth-profiling of samples. The system includes an electron beam source, a light sensor, and processing circuitry. The electron beam source configured to project e-beams on an inspected sample at each of a plurality of landing energies, which induce X-ray emitting interactions within each of a plurality of probed regions in the inspected sample, respectively, whose depth is determined by the landing energy. The light sensor is configured to measure the emitted X-ray light to obtain optical emission data sets pertaining to each of the probed regions, respectively. The processing circuitry is configured to determine a set of structural parameters, characterizing an internal geometry and/or a composition of the inspected sample, based on the measured optical emission data sets and taking into account reference data indicative of an intended design of the inspected sample.

Abstract: A computer-based method for non-destructive z-profiling of samples. The method includes: a measurement operation and a data analysis operation. The measurement operation includes, for each of a plurality of landing energies: (i) projecting an electron beam on a sample at a respective landing energy, such that light-emitting interactions between electrons from the electron beam and the sample occur within a respective probed region of the sample, which is centered about a respective depth; and (ii) measuring the emitted light to obtain an optical emission data set of the sample. The data analysis operation includes obtaining from the measured optical emission data sets a concentration map quantifying a dependence of a concentration of a material, which the sample comprises, on at least the depth.

Abstract: There is provided a system and method of examining a specimen comprising a first layer and a second layer. The method comprises obtaining a recipe including a template image for each reference polygon in a reference image and a template mask indicative of proximity of a set of locations in the template image to an edge of the reference polygon; obtaining an inspection image in runtime; identifying first inspection polygons in the inspection image corresponding to the first reference polygons using template images and template masks thereof; determining a first shift for the first layer based on the first locations, and registering the first reference polygons with the inspection image based on the first shift. Similarly, a second shift for the second layer can be determined, and the second reference polygons can be registered with the inspection image based on the second shift.

Abstract: Systems and methods are described, including a system (100) for automatically ascertaining a height characteristic of a contaminant (104) on a travel surface (102). The system (100) comprises an illumination and imaging device (106). At a first time, when the travel surface (102) is generally free of contaminant, the illumination and imaging device (106) illuminates the travel surface (102) with at least one light beam (119), and images at least one impingement of the at least one light beam (119). At a second time, when the travel surface (102) is covered by a layer of contaminant (104), the illumination and imaging device (106) illuminates the travel surface with a light beam (132), and images an impingement of the light beam on an impingement surface (107). In response to the imaging, a computer (130) calculates the height characteristic of the contaminant. Other embodiments are also described.

Abstract: Systems and methods are described, including a system (100) for automatically ascertaining a height characteristic of a contaminant (104) on a travel surface (102). The system (100) comprises an illumination and imaging device (106). At a first time, when the travel surface (102) is generally free of contaminant, the illumination and imaging device (106) illuminates the travel surface (102) with at least one light beam (119), and images at least one impingement of the at least one light beam (119). At a second time, when the travel surface (102) is covered by a layer of contaminant (104), the illumination and imaging device (106) illuminates the travel surface with a light beam (132), and images an impingement of the light beam on an impingement surface (107). In response to the imaging, a computer (130) calculates the height characteristic of the contaminant. Other embodiments are also described.