Patents by Inventor Utkarsh Rawat

Utkarsh Rawat has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11449979
    Abstract: There is provided a method, a non-transitory computer readable medium, and a system for measuring a pattern. The method can include (a) obtaining an electron image of an area of a sample, the area comprises the pattern, the electron image comprises multiple lines; each line comprises information obtained by moving an electron beam over a scan line; (b) generating a converted image by applying a noise reduction kernel on the electron image, the noise reduction kernel has a width that represents a number of consecutive lines of the electron image; the width is determined based on relationships between analysis results obtained when using noise reduction kernels of different widths; and (c) analyzing the converted image to provide a pattern measurement.
    Type: Grant
    Filed: October 9, 2020
    Date of Patent: September 20, 2022
    Assignee: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Vladislav Kaplan, Angela Kravtsov, Shimon Halevi, Utkarsh Rawat
  • Publication number: 20220230181
    Abstract: A system includes one or more client instances of a client hosted by a platform, in which the one or more client instances include an agent portal. The agent portal may receive a request from a customer related to a customer issue, determine a context for the customer issue based on one or more attributes, and determine a subset of actions as recommended actions based on factors to resolve the customer issue. The factors may include the context, historical data associated with the customer, and/or a client interest associated with the client. Moreover, the agent portal may rank the recommended actions as ranked recommended actions, display the ranked recommended actions for selection by the agent, and provide a guidance corresponding to a selected recommended action.
    Type: Application
    Filed: January 21, 2021
    Publication date: July 21, 2022
    Inventors: Sanjay Gupta, Ankur Jain, Rahul Guha, Rajesh Kannan Gurusamy, Prashant Dindure, Elizabeth Ilona Szeles, Mahesh Bhandarkar, Shilpa Shree Rajashekara, Utkarsh Rawat, Abishek Vanam, Amanda Nichole Chaffee
  • Publication number: 20220114721
    Abstract: There is provided a method, a non-transitory computer readable medium, and a system for measuring a pattern. The method can include (a) obtaining an electron image of an area of a sample, the area comprises the pattern, the electron image comprises multiple lines; each line comprises information obtained by moving an electron beam over a scan line; (b) generating a converted image by applying a noise reduction kernel on the electron image, the noise reduction kernel has a width that represents a number of consecutive lines of the electron image; the width is determined based on relationships between analysis results obtained when using noise reduction kernels of different widths; and (c) analyzing the converted image to provide a pattern measurement.
    Type: Application
    Filed: October 9, 2020
    Publication date: April 14, 2022
    Applicant: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Vladislav Kaplan, Angela Kravtsov, Shimon Halevi, Utkarsh Rawat