Abstract: a field effect transistor having a channel width of such small dimension that threshold voltage becomes inversely related to channel width allowing the fabrication of field effect transistors of differing threshold voltages while using the same process steps. Reduced threshold voltage due to prior art "short channel length" effect may be offset by the presently disclosed narrow channel width effect. Desired chanel impedance values are achieved independently of threshold voltage influence due to narrow channel width effect by the provision of parallel-connected field effect transistors of the same channel length whose total channel widths yield a desired net width-to-length ratio.