Patents by Inventor Uwe Klinsmann

Uwe Klinsmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4632897
    Abstract: Photopolymerizable recording materials which are suitable for the production of photoresist layers, and contain one or more thermoplastic vinyl polymers as the binder, one or more low molecular weight, ethylenically unsaturated, photopolymerizable compounds and one or more photoinitiators, with or without other, conventional additives and/or assistants, have excellent adhesion to metallic substrate surfaces if the binder employed is a vinyl polymer which possesses amino and/or imino groups.
    Type: Grant
    Filed: December 27, 1983
    Date of Patent: December 30, 1986
    Assignee: BASF Aktiengesellschaft
    Inventors: Helmut Barzynski, Albrecht Eckell, Albert Elzer, Uwe Klinsmann, Reinhold J. Leyrer, Axel Sanner
  • Patent number: 4465760
    Abstract: Relief images or resist images are produced by a negative-working process, using a photosensitive resist layer which is applied on a base and contains a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups as well as a crosslinking compound possessing two or more reactive groups which are capable, under the action of heat, of reacting with carboxyl groups to form a covalent chemical bond. To produce the relief images or resist images, the photosensitive resist layer is first exposed imagewise to actinic light, the exposed areas of this layer are subjected to selective thermal hardening and crosslinking and the resist layer is then post-exposed uniformly to actinic light and finally washed out with an aqueous developer.
    Type: Grant
    Filed: August 22, 1983
    Date of Patent: August 14, 1984
    Assignee: BASF Aktiengesellschaft
    Inventors: Reinhold J. Leyrer, Dietrich Saenger, Uwe Klinsmann