Abstract: An imaging system includes at least one laser light source having a wavelength in the visible spectral range and a beam guidance element with high solarization resistance at high beam power densities. The invention also relates to the use of the imaging system, in particularly in projectors and in material processing.

Abstract: An imaging system, includes: a laser light source having a wavelength from 380 nm to 490 nm; and a beam guidance element, the laser light source configured for generating an average surface power density of more than 10 W/cm2, the beam guidance element including a glass which has a quality factor F(436 nm)=S(436 nm)*(Abs0(436 nm)+Abs1(436 nm))/k, wherein S(436 nm) is a thermality at a wavelength of 436 nm, Abs1(436 nm) is an additional absorbance in comparison to Abs0(436 nm) at a wavelength of 436 nm after an irradiation with a power density of 345 W/cm2 for 72 hours with a laser light having a wavelength of 455 nm, Abs0(436 nm) is an absorbance at a wavelength of 436 nm of a sample having a thickness of 100 mm without the irradiation, k is the thermal conductivity, and the quality factor F(436 nm) is <15 ppm/W.

Abstract: A glass includes the following components in the specified proportions (in % by weight): 50-80% SiO2, 2-30% B2O3, 0-5% Al2O3, 0-10% CaO, 0-10% BaO, 0-5% Li2O, 0-20% Na2O, 1-25% K2O, and 5-30% ?R2O. R2O includes at least one alkali metal oxide. The glass includes at least one first solarization component and at least one second solarization component. A proportion of the first solarization component in the glass is in a range from 0.01 to <1.0 ppm (by weight) and a proportion of the second solarization component in the glass is in a range from 1000 to 10,000 ppm (by weight).

Abstract: An imaging system includes at least one laser light source having a wavelength in the visible spectral range and a beam guidance element with high solarization resistance at high beam power densities. The invention also relates to the use of the imaging system, in particularly in projectors and in material processing.