Patents by Inventor Uwe Spengler

Uwe Spengler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Illumination system for a microlithographic projection exposure apparatus
    Patent number: 9575414
    Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
    Type: Grant
    Filed: November 19, 2015
    Date of Patent: February 21, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel
  • ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    Publication number: 20160077446
    Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
    Type: Application
    Filed: November 19, 2015
    Publication date: March 17, 2016
    Inventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel
  • Illumination system for a microlithographic projection exposure apparatus
    Patent number: 9217930
    Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
    Type: Grant
    Filed: February 6, 2013
    Date of Patent: December 22, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel
  • ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    Publication number: 20130148092
    Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
    Type: Application
    Filed: February 6, 2013
    Publication date: June 13, 2013
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel
  • Illumination system for a microlithographic projection exposure apparatus
    Patent number: 8395756
    Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
    Type: Grant
    Filed: August 12, 2008
    Date of Patent: March 12, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel
  • ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    Publication number: 20090021716
    Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
    Type: Application
    Filed: August 12, 2008
    Publication date: January 22, 2009
    Applicant: CARL ZEISS SMT AG
    Inventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel