Patents by Inventor Uy-Liem Nguyen
Uy-Liem Nguyen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10139733Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: GrantFiled: March 3, 2016Date of Patent: November 27, 2018Assignee: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Marcus Will, Thomas Bischoff, Yim-Bun Patrick Kwan, Uy-Liem Nguyen, Stefan Xalter, Michael Muehlbeyer
-
Publication number: 20160282724Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: ApplicationFiled: March 3, 2016Publication date: September 29, 2016Inventors: Hermann Bieg, Marcus Will, Thomas Bischoff, Yim-Bun Patrick Kwan, Uy-Liem Nguyen, Stefan Xalter, Michael Muehlbeyer
-
Patent number: 9341955Abstract: An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is adapted to define a geometry of a light beam passing the aperture device along an optical axis. The support structure is adapted to hold the aperture device in a defined manner when the aperture plane is inclined with respect to a horizontal plane. A temperature distribution prevails within the aperture device and at least one of the aperture device and the support structure is adapted to maintain at least one of a relative position of the aperture edge with respect to the optical axis and a geometry of the aperture edge substantially unaltered upon an introduction of a thermal energy into the aperture device, where the thermal energy being adapted to cause an alteration in the temperature distribution.Type: GrantFiled: February 13, 2014Date of Patent: May 17, 2016Assignee: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Uy-Liem Nguyen
-
Publication number: 20140160456Abstract: An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is adapted to define a geometry of a light beam passing the aperture device along an optical axis. The support structure is adapted to hold the aperture device in a defined manner when the aperture plane is inclined with respect to a horizontal plane. A temperature distribution prevails within the aperture device and at least one of the aperture device and the support structure is adapted to maintain at least one of a relative position of the aperture edge with respect to the optical axis and a geometry of the aperture edge substantially unaltered upon an introduction of a thermal energy into the aperture device, where the thermal energy being adapted to cause an alteration in the temperature distribution.Type: ApplicationFiled: February 13, 2014Publication date: June 12, 2014Applicant: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Uy-Liem Nguyen
-
Patent number: 8687169Abstract: An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is adapted to define a geometry of a light beam passing the aperture device along an optical axis. The support structure is adapted to hold the aperture device in a defined manner when the aperture plane is inclined with respect to a horizontal plane. A temperature distribution prevails within the aperture device and at least one of the aperture device and the support structure is adapted to maintain at least one of a relative position of the aperture edge with respect to the optical axis and a geometry of the aperture edge substantially unaltered upon an introduction of a thermal energy into the aperture device, where the thermal energy being adapted to cause an alteration in the temperature distribution.Type: GrantFiled: September 30, 2010Date of Patent: April 1, 2014Assignee: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Uy-Liem Nguyen
-
Patent number: 8570676Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.Type: GrantFiled: March 11, 2011Date of Patent: October 29, 2013Assignee: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
-
Publication number: 20120075611Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: ApplicationFiled: November 30, 2011Publication date: March 29, 2012Applicant: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Thomas Bischoff, Uy-Liem Nguyen, Stefan Xalter, Marcus Will, Yim-Bun Patrick Kwan, Michael Muehlbeyer
-
Patent number: 8089707Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: GrantFiled: February 4, 2010Date of Patent: January 3, 2012Assignee: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Marcus Will, Thomas Bischoff, Yim-Bun Patrick Kwan, Uy-Liem Nguyen, Stefan Xalter, Michael Muehlbeyer
-
Patent number: 8009343Abstract: An optical imaging device (PL), in particular an objective for semiconductor lithography, is provided with at least one system diaphragm. The system diaphragm comprises a multiplicity of mobile plates, which are rotatably mounted. The plates have a spherical curvature.Type: GrantFiled: July 2, 2004Date of Patent: August 30, 2011Assignee: Carl Zeiss SMT GmbHInventors: Bernhard Gellrich, Thomas Bischoff, Hermann Bieg, Martin Huber, Francois Henzelin, Gerhard Szekely, Uy-Liem Nguyen, Martin E. Humphries
-
Publication number: 20110181857Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.Type: ApplicationFiled: March 11, 2011Publication date: July 28, 2011Applicant: CARL ZEISS SMT AGInventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
-
Patent number: 7929227Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.Type: GrantFiled: July 2, 2010Date of Patent: April 19, 2011Assignee: Carl Zeiss SMT GmbHInventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
-
Publication number: 20110063595Abstract: An optical module includes an aperture device and a support structure supporting the aperture device. The aperture device defines an aperture edge and an aperture plane. The aperture edge is adapted to define a geometry of a light beam passing the aperture device along an optical axis. The support structure is adapted to hold the aperture device in a defined manner when the aperture plane is inclined with respect to a horizontal plane. A temperature distribution prevails within the aperture device and at least one of the aperture device and the support structure is adapted to maintain at least one of a relative position of the aperture edge with respect to the optical axis and a geometry of the aperture edge substantially unaltered upon an introduction of a thermal energy into the aperture device, where the thermal energy being adapted to cause an alteration in the temperature distribution.Type: ApplicationFiled: September 30, 2010Publication date: March 17, 2011Applicant: CARL ZEISS SMT AGInventors: Hermann Bieg, Uy-Liem Nguyen
-
Publication number: 20100271607Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.Type: ApplicationFiled: July 2, 2010Publication date: October 28, 2010Applicant: CARL ZEISS SMT AGInventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
-
Patent number: 7791826Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.Type: GrantFiled: January 26, 2006Date of Patent: September 7, 2010Assignee: Carl Zeiss SMT AGInventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
-
Publication number: 20100134777Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: ApplicationFiled: February 4, 2010Publication date: June 3, 2010Applicant: CARL ZEISS SMT AGInventors: Hermann Bieg, Thomas Bischoff, Uy-Liem Nguyen, Stefan Xalter, Marcus Will, Yim-Bun Patrick Kwan, Michael Muehlbeyer
-
Patent number: 7684125Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: GrantFiled: December 18, 2003Date of Patent: March 23, 2010Assignee: Carl Zeiss SMT AGInventors: Hermann Bieg, Thomas Bischoff, Uy-Liem Nguyen, Stefan Xalter, Marcus Will, Yim-Bum Patrick Kwan, Michael Muehlbeyer
-
Publication number: 20100066990Abstract: The disclosure concerns a method for exchangeable introduction and/or exchange of diaphragms in an imaging device, such as an EUV projection exposure system for microlithography or a corresponding imaging device with a housing and at least one diaphragm, which is accommodated exchangeably in the housing and at least one transfer device with at least one receptacle, on or at which the diaphragm can be detachably arranged in order that it may be moved in or out of the objective space. At least one receptacle of the transfer device, on or at which the diaphragm can be detachably arranged, is an element of the diaphragm mount for positioning the diaphragm in the housing.Type: ApplicationFiled: August 28, 2009Publication date: March 18, 2010Applicant: CARL ZEISS SMT AGInventors: Hermann Bieg, Yim-Bun Patrick Kwan, Uy-Liem Nguyen
-
Publication number: 20090021820Abstract: An optical imaging device (PL), in particular an objective for semiconductor lithography, is provided with at least one system diaphragm. The system diaphragm comprises a multiplicity of mobile plates, which are rotatably mounted. The plates have a spherical curvature.Type: ApplicationFiled: July 2, 2004Publication date: January 22, 2009Applicant: CARL ZEISS SMT AGInventors: Bernhard Gellrich, Thomas Bischoff, Hermann Bieg, Martin Huber, Francois Henzelin, Gerhard Szekely, Uy-Liem Nguyen, Martin E. Humphries
-
Publication number: 20080170303Abstract: Optical assembly supported in an arrangement, especially in an objective (1, 8) or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens (34, 35), a mirror, or an aperture (9), wherein the at least one element is influenceable by at least one manipulator and wherein (i) the at least one manipulator (10, 22, 25) is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator (10, 22, 25) and the element to be influenced by the manipulator (10, 22, 25) in the interior of the arrangement, (ii) the manipulator comprises a mechanism for adjusting precisely or for micro-adjusting of the optical element, or (iii) the manipulator comprises a first and a second means wherein the first means generates a repelling force and/or a repelling torque and the second means (5, 6, 11, 15, 19) counteractType: ApplicationFiled: January 26, 2006Publication date: July 17, 2008Applicant: CARL ZEISS SMT AGInventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
-
Publication number: 20070053076Abstract: The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.Type: ApplicationFiled: December 18, 2003Publication date: March 8, 2007Inventors: Hermann Bieg, Marcus Will, Thomas Bischoff, Yim-Bun Kwan, Uy-Liem Nguyen, Stefan Xalter, Michael Muhlbeyer