Patents by Inventor V. Reddy Manukonda

V. Reddy Manukonda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Staircase sidewall spacer for improved source/drain architecture
    Patent number: 5102816
    Abstract: Selective etching of a conformal nitride layer overlying a conformal oxide layer and a subsequent etching of the oxide layer provide for a staircase shaped sidewall spacer which is used to align source and drain regions during implantation. Extent of the implanted n-/n+ and/or p-/p+ regions within the substrate can be tightly controlled due to the tight dimensional tolerances obtained by the footprint of the spacer. Further the source/drain profiles can be utilized with elevated polysilicon and elevated polysilicon having subsequent salicidation.
    Type: Grant
    Filed: March 26, 1991
    Date of Patent: April 7, 1992
    Assignee: Sematech, Inc.
    Inventors: V. Reddy Manukonda, Thomas E. Seidel