Abstract: A device is provided for treating a workpiece with positively charged ions. The device includes an apparatus including an ion source for producing a positive ion beam and directing the positive ion beam toward a surface of a work piece. The device further includes a source for introducing negative ions into the beam path in at least one selected region downstream of the ion source.

Abstract: A device is provided for treating a workpiece with positively charged ions. The device includes an apparatus including an ion source for producing a positive ion beam and directing the positive ion beam toward a surface of a work piece. The device further includes a source for introducing negative ions into the beam path in at least one selected region downstream of the ion source.

Abstract: An ion implanter is provided for implanting ions in a workpiece. The ion implanter includes an apparatus for generating an ion beam and directing it toward a surface of a work piece and a plasma generator for generating plasma to neutralize the ion beam and the work piece surface. The plasma generator has a plasma generator chamber defined by walls, a relatively narrow outlet aperture for plasma produced in the chamber to leave the chamber to neutralize the beam and work piece surface, cathodes, and anodes spaced from the cathodes and from the walls of the chamber. The plasma generator also has magnets arranged within the plasma generator chamber, adjacent the chamber walls to generate a magnetic field to deflect primary electrons emitted from the cathode from directly reaching the anode.

Abstract: An ion source is provided that is constructed for use with a magnet that produces magnetic flux lines extending in a predetermined direction and a source of ionizable material for creating ion. The ion source includes a chamber, defined by walls, and a relatively narrow outlet aperture for ions produced in the chamber to leave the chamber. The chamber encloses a cathode and an anode spaced from the cathode and from the walls of the chamber. The anode is positioned with respect to the aperture, the cathode and the predetermined direction of the magnetic flux to cause ions produced in the chamber to drift in crossed magnetic and electric fields so as to concentrate near the aperture.