Patents by Inventor Vadim Iourievich Timoshkov

Vadim Iourievich Timoshkov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multilayer mirror
    Patent number: 9329503
    Abstract: There is provided a multilayer mirror (80) comprising a layer of a first material (84) and a layer of silicon (82). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon.
    Type: Grant
    Filed: April 6, 2011
    Date of Patent: May 3, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Iourievich Timoshkov, Jan Bernard Plechelmus van Schoot, Antonius Theodorus Wilhelmus Kempen, Andrei Mikhailovich Yakunin, Edgar Alberto Osorio Oliveros
  • Multilayer Mirror
    Publication number: 20130057840
    Abstract: There is provided a multilayer mirror (80) comprising a layer of a first material (84) and a layer of silicon (82). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon.
    Type: Application
    Filed: April 6, 2011
    Publication date: March 7, 2013
    Applicant: ASML NETHERLAND B.V.
    Inventors: Vadim Iourievich Timoshkov, Jan Bernard Plechelmus Van Schoot, Antonius Theodorus Wilhelmu Kempen, Andrei Mikhailovich Yakunin, Edgar Alberto Osorio Oliveros
  • SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER AND METHOD OF MANUFACTURING A DEVICE USING LITHOGRAPHIC APPARATUS
    Publication number: 20120170015
    Abstract: A spectral purity filter includes a substrate, a plurality of apertures through the substrate, and a plurality of walls. The walls define the plurality of apertures through the substrate. The spectral purity filter also includes a first layer formed on the substrate to reflect radiation of a first wavelength, and a second layer formed on the first layer to prevent oxidation of the first layer. The apertures are constructed and arranged to be able to transmit at least a portion of radiation of a second wavelength therethrough.
    Type: Application
    Filed: July 29, 2010
    Publication date: July 5, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Andrei Mikhailovich Yakunin, Maarten Van Kampen, Vadim Iourievich Timoshkov