Abstract: A system that contains a semi-ellipsoidal SLM holder supporting a plurality of flat rectangular SLMs, which are placed onto the semi-ellipsoidal surface of the holder in the most surface-covering way. The system contains a coherent light source placed in the first focal point of the ellipsoid. The second focal point of the ellipsoid defines the area in which an image-receiving object is to be placed. All the SLMs are illuminated by a diverging light beam emitted from the coherent light source. In each SLM, the light is subjected to phase-amplitude modulation and is converted into an image-carrying beam, which convergently fells onto the object on which the target image is to be produced. Thus, a pattern is formed on the object by a maskless method in which a plurality of SLMs are combined into a common image-forming holographic unit.

Abstract: A system for generating a lithographic image contains a light source that emits a diverging light beam and a reflective concave curvilinear surface onto which the diverging light beam falls and which reflects the diverging beam in the form of a converging beam. A digital hologram, which is placed into a diverging beam between the light source and the reflective surface, is coded in accordance with the lithographic image either preliminarily or dynamically, with the use of a spatial light modulator. From the curvilinear surface the spatially modulated beam is reflected in the form of a converging beam which falls onto an image-receiving substrate that is located in the image restoration plane and on which the lithographic image is generated.

Abstract: A system for generating a lithographic image contains a a light source that emits a diverging light beam and a reflective concave curvilinear surface onto which the diverging light beam falls and which reflects the diverging beam in the form of a converging beam. A digital hologram, which is placed into a diverging beam between the light source and the reflective surface, is coded in accordance with the lithographic image either preliminarily or dynamically, with the use of a spatial light modulator. From the curvilinear surface the spatially modulated beam is reflected in the form of a converging beam which falls onto an image-receiving substrate that is located in the image restoration plane and on which the lithographic image is generated.

Abstract: A system for generating a lithographic image contains a alight source that emits a diverging light beam and a reflective concave curvilinear surface onto which the diverging light beam falls and which reflects the diverging beam in the form of a converging beam. A digital hologram, which is coded in accordance with the initial lithographic image either preliminarily or dynamically with the use of a spatial light modulator, is placed into the converging beam between the reflective surface and the image-receiving object. The image of an initial lithographic image formed on the image-receiving object is subsequently used in the processes of microlithography.

Abstract: Proposed is a method of static scaling of an image in holographic lithography. The method consists of generating a final virtual digital hologram of the original pattern through a sequence of mathematical calculations with participation of a virtual coherent light source having a predetermined wavelength ?1 and producing an actual hologram on the basis of the virtual digital hologram of the original pattern. The obtained hologram can be used for forming an actual original pattern in a predetermined size. When it is necessary to produce the original pattern in another size, this can be done by static scaling by merely selecting another wavelength for the laser source with adjustable wavelength. The method allows determining the wavelength range in which scalability is possible with substantially homothetic transformation of the image.

Abstract: The invention describes a method of manufacturing a holographic mask capable of producing an image pattern that contains elements of a subwavelength size along with decreased deviations from the original pattern. The original pattern is converted into a virtual electromagnetic field and is divided into a set of virtual cells with certain amplitudes and phases, which are mathematically processed for obtaining the virtual digital hologram. In the calculation of virtual components of the hologram, the method includes a step, wherein as a result of the preliminary divergence of the initial light beam, the entire virtual hologram is increased in proportion to the degree of the divergence of the initial light beam. This facilitate virtual processing of the fine and delicate elements of the virtual hologram. Upon completion of the virtual processing, the final data needed for manufacturing of the actual digital hologram, e.g., on a lithograph, are obtained.

Abstract: The invention describes a method of manufacturing a holographic mask capable of producing an image pattern that contains elements of a sub-wavelength size along with decreased deviations from the original pattern. The original pattern is converted into a virtual electromagnetic field and is divided into a set of virtual cells with certain amplitudes and phases, which are mathematically processed for obtaining the virtual digital hologram. The calculation of the latter is based on parameters of the restoration wave, which is used to produce the image pattern from the mask, and on computer optimization by variation of amplitudes and phases of the set of virtual cells and/or parameters of the virtual digital hologram for reaching a satisfactory matching between the produced image pattern and the original pattern. The obtained virtual digital hologram provides physical parameters of the actual digital hologram that is to be manufactured.

Abstract: A method and a multi-component illuminator for illumination of a hologram in holographic lithography in which a coherent beam is split into a plurality of individual laser light beams by means of a beam splitter which is provided with a plurality of individual sub-illuminators. Each sub-illuminator has an individual aperture, receives a respective individual coherent light beam, and form a an illumination field on the surface of the hologram during hologram illumination. Altogether the sub-illuminators are combined into a common hologram illuminator. In the multi-component illuminator the individual sub-illuminators are arranged so that the illumination fields cover with the light the maximum possible surface of the hologram during illumination of the latter in the holographic lithography process.

Abstract: Proposed is a method of static scaling of an image in holographic lithography. The method consists of generating a final virtual digital hologram of the original pattern through a sequence of mathematical calculations with participation of a virtual coherent light source having a predetermined wavelength ?1 and producing an actual hologram on the basis of the virtual digital hologram of the original pattern. The obtained hologram can be used for forming an actual original pattern in a predetermined size. When it is necessary to produce the original pattern in another size, this can be done by static scaling by merely selecting another wavelength for the laser source with adjustable wavelength. The method allows determining the wavelength range in which scalability is possible with substantially homotetic transformation of the image.

Abstract: The invention describes a method of manufacturing a holographic mask capable of producing an image pattern that contains elements of a sub-wavelength size along with decreased deviations from the original pattern. The original pattern is converted into a virtual electromagnetic field and is divided into a set of virtual cells with certain amplitudes and phases, which are mathematically processed for obtaining the virtual digital hologram. The calculation of the latter is based on parameters of the restoration wave, which is used to produce the image pattern from the mask, and on computer optimization by variation of amplitudes and phases of the set of virtual cells and/or parameters of the virtual digital hologram for reaching a satisfactory matching between the produced image pattern and the original pattern. The obtained virtual digital hologram provides physical parameters of the actual digital hologram that is to be manufactured.

Abstract: The invention describes a method of manufacturing a holographic mask capable of producing an image pattern that contains elements of a subwavelength size along with decreased deviations from the original pattern. The original pattern is converted into a virtual electromagnetic field and is divided into a set of virtual cells with certain amplitudes and phases, which are mathematically processed for obtaining the virtual digital hologram. In the calculation of virtual components of the hologram, the method includes a step, wherein as a result of the preliminary divergence of the initial light beam, the entire virtual hologram is increased in proportion to the degree of the divergence of the initial light beam. This facilitate virtual processing of the fine and delicate elements of the virtual hologram. Upon completion of the virtual processing, the final data needed for manufacturing of the actual digital hologram, e.g., on a lithograph, are obtained.

Abstract: The invention relates to accurate positioning devices which make it possible to displace an object within a nanometric range. The inventive device comprises a fixed base element (BE) provided with accurate and rough positioning steps which are arranged thereon in such a way that they are reciprocatingly movable. The rough positioning step is cinematically connected to the BE and to the accurate positioning step in such a way that they are synchronously movable with respect to the BE. The kinetic connection of said steps is embodied in such a way that the accurate positioning step is autonomously movable with respect to the rough positioning step. Said steps are disposed in such a way that they are autonomously movable with respect to the BE and with respect to each other along two reference axes. The rough positioning step is embodied in a form of a rigid supporting plate, the accurate positioning step being embodied in the form of a rectangular frame which is rigidly fixed to said plate.