Patents by Inventor Valentin Todorow
Valentin Todorow has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10825708Abstract: Process kit components for use with a substrate support of a process chamber are provided herein. In some embodiments, a process kit ring may include a ring shaped body having an outer edge, an inner edge, a top surface and a bottom, wherein the outer edge has a diameter of about 12.473 inches to about 12.479 inches and the inner edge has a diameter of about 11.726 inches to about 11.728 inches, and wherein the ring shaped body has a height of about 0.116 to about 0.118 inches; and a plurality of protrusions disposed on the top surface of the ring shaped body, each of the plurality of protrusions disposed symmetrically about the ring shaped body.Type: GrantFiled: October 12, 2012Date of Patent: November 3, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Valentin Todorow, Samer Banna, Imad Yousif, Albert Wang, Gary Leray
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Patent number: 10546731Abstract: A method, apparatus and system for dechucking a processing object from a surface of an electrostatic chuck (ESC) in a processing chamber can include applying to the ESC for a first time interval, a first dechuck voltage having a substantially equal magnitude and opposite polarity of a chuck voltage chucking the processing object to the surface of the ESC, selecting a second dechuck voltage having an opposite polarity as the first dechuck voltage, linearly sweeping the ESC voltage from the first dechuck voltage to the second dechuck voltage over a second time interval, monitoring the ESC current during the second time interval until a current spike in the ESC current above a threshold is detected, communicating a command to move support pins up to remove the processing object from the ESC surface, and maintaining the second dechuck voltage until the processing object is separated from the surface of the ESC.Type: GrantFiled: October 5, 2018Date of Patent: January 28, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Haitao Wang, Michael G. Chafin, Kartik Ramaswamy, Yue Guo, Valentin Todorow, Kenny Doan, Sergio F. Shoji, Brad L. Mays, Usama Dadu
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Publication number: 20190221463Abstract: Process kit components for use with a substrate support of a process chamber are provided herein. In some embodiments, a process kit ring may include a ring shaped body having an outer edge, an inner edge, a top surface and a bottom, wherein the outer edge has a diameter of about 12.473 inches to about 12.479 inches and the inner edge has a diameter of about 11.726 inches to about 11.728 inches, and wherein the ring shaped body has a height of about 0.116 to about 0.118 inches; and a plurality of protrusions disposed on the top surface of the ring shaped body, each of the plurality of protrusions disposed symmetrically about the ring shaped body.Type: ApplicationFiled: March 21, 2019Publication date: July 18, 2019Inventors: VALENTIN TODOROW, SAMER BANNA, IMAD YOUSIF, ALBERT WANG, GARY LERAY
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Patent number: 10271416Abstract: A plasma processing apparatus may include a process chamber having an interior processing volume, first, second and third RF coils disposed proximate the process chamber to couple RF energy into the processing volume, wherein the second RF coil disposed coaxially with respect to the first RF coil, and wherein the third RF coil disposed coaxially with respect to the first and second RF coils, at least one ferrite shield disposed proximate to at least one of the first, second or third RF coils, wherein the ferrite shield is configured to locally guide a magnetic field produced by an RF current flow through the first, second or third RF coils toward the process chamber, wherein the plasma processing apparatus is configured to control a phase of each RF current flow through each of the of the first, second or third RF coils.Type: GrantFiled: October 22, 2012Date of Patent: April 23, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Samer Banna, Waheb Bishara, Ryan Giar, Valentin Todorow, Dmitry Lubomirsky, Kyle R. Tantiwong
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Patent number: 9945033Abstract: Apparatus for processing substrates are provided herein. In some embodiments, plasma processing apparatus may include a process chamber having a dielectric lid and an interior processing volume beneath the dielectric lid, a first RF coil to couple RF energy into the processing volume, and an RF shielded lid heater coupled to a top surface of the dielectric lid. The RF shielded lid heater may include an annular member, and a plurality of spokes, wherein each of the plurality of spokes includes one of (a) a first portion that extends downward from the annular and couples the annular member to a second portion of the spoke that extends radially inward, or (b) a first portion that extends radially outward from the annular member.Type: GrantFiled: December 16, 2014Date of Patent: April 17, 2018Assignee: APPLIED MATERIALS, INC.Inventors: Samer Banna, Vladimir Knyazik, Waheb Bishara, Valentin Todorow
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Publication number: 20150191823Abstract: Apparatus for processing substrates are provided herein. In some embodiments, a plasma processing apparatus may include a process chamber having a dielectric lid and an interior processing volume beneath the dielectric lid, a first RF coil to couple RF energy into the processing volume, and an RF shielded lid heater coupled to a top surface of the dielectric lid comprising an annular member, and a plurality of spokes, wherein each of the plurality of spokes includes one of (a) a first portion that extends downward from the annular and couples the annular member to a second portion of the spoke that extends radially inward, or (b) a first portion that extends radially outward from the annular member.Type: ApplicationFiled: December 16, 2014Publication date: July 9, 2015Inventors: Samer Banna, Vladimir Knyazik, Waheb Bishara, Valentin Todorow
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Patent number: 8988848Abstract: Apparatus for processing substrates are provided herein. In some embodiments, an apparatus for processing a substrate may include a substrate support comprising a first electrode disposed within the substrate support and having a peripheral edge and a first surface; a substrate support surface disposed above the first surface of the first electrode; and a second electrode disposed within the substrate support and extending radially beyond the peripheral edge of the first electrode, wherein the second electrode has a second surface disposed about and above the first surface of the first electrode.Type: GrantFiled: October 12, 2012Date of Patent: March 24, 2015Assignee: Applied Materials, Inc.Inventors: Valentin Todorow, Samer Banna, Imad Yousif, Albert Wang, Gary Leray
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Patent number: 8956500Abstract: An inductively-coupled plasma processing chamber has a chamber with a ceiling. A first and second antenna are placed adjacent to the ceiling. The first antenna is concentric to the second antenna. A plasma source power supply is coupled to the first and second antenna. The plasma source power supply generates a first RF power to the first antenna, and a second RF power to the second antenna. A substrate support disposed within the chamber. The size of the first antenna and a distance between the substrate support are such that the etch rate of the substrate on the substrate support is substantially uniform.Type: GrantFiled: April 24, 2007Date of Patent: February 17, 2015Assignee: Applied Materials, Inc.Inventors: Stephen Yuen, Kyeong-Tae Lee, Valentin Todorow, Tae Won Kim, Anisul Khan, Shashank Deshmukh
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Patent number: 8933628Abstract: A plasma processing apparatus may include a process chamber having an interior processing volume; a first RF coil to couple RF energy into the processing volume; a second RF coil to couple RF energy into the processing volume, the second RF coil disposed coaxially with respect to the first RF coil; and a third RF coil to couple RF energy into the processing volume, the third RF coil disposed coaxially with respect to the first RF coil, wherein when RF current flows through the each of the RF coils, either the RF current flows out-of-phase through at least one of the RF coils with respect to at least another of the RF coils, or the phase of the RF current may be selectively controlled to be in-phase or out-of-phase in at least one of the RF coils with respect to at least another of the RF coils.Type: GrantFiled: October 12, 2012Date of Patent: January 13, 2015Assignee: Applied Materials, Inc.Inventors: Samer Banna, Zhigang Chen, Valentin Todorow
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Patent number: 8633423Abstract: Methods and apparatus for controlling the temperature of a substrate during processing are provided herein. In some embodiments, an apparatus for retaining and controlling substrate temperature may include a puck of dielectric material; an electrode disposed in the puck proximate a surface of the puck upon which a substrate is to be retained; and a plurality of heater elements disposed in the puck and arranged in concentric rings to provide independent temperature control zones.Type: GrantFiled: April 29, 2011Date of Patent: January 21, 2014Assignee: Applied Materials, Inc.Inventors: Xing Lin, Douglas A. Buchberger, Jr., Xiaoping Zhou, Valentin Todorow, Andrew Nguyen, Anchel Sheyner
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Patent number: 8264154Abstract: Embodiments of the present invention generally provide methods and apparatus for pulsed plasma processing over a wide process window. In some embodiments, an apparatus may include an RF power supply having frequency tuning and a matching network coupled to the RF power supply that share a common sensor for reading reflected RF power reflected back to the RF power supply. In some embodiments, an apparatus may include an RF power supply having frequency tuning and a matching network coupled to the RF power supply that share a common sensor for reading reflected RF power reflected back to the RF power supply and a common controller for tuning each of the RF power supply and the matching network.Type: GrantFiled: May 13, 2009Date of Patent: September 11, 2012Assignee: Applied Materials, Inc.Inventors: Samer Banner, Valentin Todorow, Kartik Ramaswamy
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Publication number: 20120091108Abstract: Methods and apparatus for controlling the temperature of a substrate during processing are provided herein. In some embodiments, an apparatus for retaining and controlling substrate temperature may include a puck of dielectric material; an electrode disposed in the puck proximate a surface of the puck upon which a substrate is to be retained; and a plurality of heater elements disposed in the puck and arranged in concentric rings to provide independent temperature control zones.Type: ApplicationFiled: April 29, 2011Publication date: April 19, 2012Applicant: APPLIED MATERIALS, INC.Inventors: XING LIN, DOUGLAS A. BUCHBERGER, Jr., XIAOPING ZHOU, VALENTIN TODOROW, ANDREW NGUYEN, ANCHEL SHEYNER
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Method of fabricating a high dielectric constant transistor gate using a low energy plasma apparatus
Patent number: 7837838Abstract: The present invention generally provides methods and apparatuses that are adapted to form a high quality dielectric gate layer on a substrate. Embodiments contemplate a method wherein a metal plasma treatment process is used in lieu of a standard nitridization process to form a high dielectric constant layer on a substrate. Embodiments further contemplate an apparatus adapted to “implant” metal ions of relatively low energy in order to reduce ion bombardment damage to the gate dielectric layer, such as a silicon dioxide layer and to avoid incorporation of the metal atoms into the underlying silicon. In general, the process includes the steps of forming a high-k dielectric and then terminating the surface of the deposited high-k material to form a good interface between the gate electrode and the high-k dielectric material.Type: GrantFiled: December 20, 2006Date of Patent: November 23, 2010Assignee: Applied Materials, Inc.Inventors: Thai Cheng Chua, Alex M. Paterson, Steven Hung, Patricia M. Liu, Tatsuya Sato, Valentin Todorow, John P. Holland -
Patent number: 7645710Abstract: The present invention generally provides methods and apparatuses that are adapted to form a high quality dielectric gate layer on a substrate. Embodiments contemplate a method wherein a metal plasma treatment process is used in lieu of a standard nitridization process to form a high dielectric constant layer on a substrate. Embodiments further contemplate an apparatus adapted to “implant” metal ions of relatively low energy in order to reduce ion bombardment damage to the gate dielectric layer, such as a silicon dioxide layer and to avoid incorporation of the metal atoms into the underlying silicon. In general, the process includes the steps of forming a high-k dielectric and then terminating the surface of the deposited high-k material to form a good interface between the gate electrode and the high-k dielectric material.Type: GrantFiled: March 8, 2007Date of Patent: January 12, 2010Assignee: Applied Materials, Inc.Inventors: Christopher Sean Olsen, Thai Cheng Chua, Steven Hung, Patricia M. Liu, Tatsuya Sato, Alex M. Paterson, Valentin Todorow, John P. Holland
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Publication number: 20090284156Abstract: Embodiments of the present invention generally provide methods and apparatus for pulsed plasma processing over a wide process window. In some embodiments, an apparatus may include an RF power supply having frequency tuning and a matching network coupled to the RF power supply that share a common sensor for reading reflected RF power reflected back to the RF power supply. In some embodiments, an apparatus may include an RF power supply having frequency tuning and a matching network coupled to the RF power supply that share a common sensor for reading reflected RF power reflected back to the RF power supply and a common controller for tuning each of the RF power supply and the matching network.Type: ApplicationFiled: May 13, 2009Publication date: November 19, 2009Applicant: APPLIED MATERIALS, INC.Inventors: SAMER BANNA, VALENTIN TODOROW, KARTIK RAMASWAMY
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Publication number: 20080264904Abstract: An inductively-coupled plasma processing chamber has a chamber with a ceiling. A first and second antenna are placed adjacent to the ceiling. The first antenna is concentric to the second antenna. A plasma source power supply is coupled to the first and second antenna. The plasma source power supply generates a first RF power to the first antenna, and a second RF power to the second antenna. A substrate support disposed within the chamber. The size of the first antenna and a distance between the substrate support are such that the etch rate of the substrate on the substrate support is substantially uniform.Type: ApplicationFiled: April 24, 2007Publication date: October 30, 2008Inventors: STEPHEN YUEN, Kyeong-Tae Lee, Valentin Todorow, Tae Won Kim, Anisul Khan, Shashank Deshmukh
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Publication number: 20080023443Abstract: Embodiments of the invention generally provide etch or CVD plasma processing methods and apparatus used to generate a uniform plasma across the surface of a substrate by modulation pulsing the power delivered to a plurality of plasma controlling devices found in a plasma processing chamber. The plasma generated and/or sustained in the plasma processing chamber is created by the one or more plasma controlling devices that are used to control, generate, enhance, and/or shape the plasma during the plasma processing steps by use of energy delivered from a RF power source. Plasma controlling devices may include, for example, one or more coils (inductively coupled plasma), one or more electrodes (capacitively coupled plasma), and/or any other energy inputting device such as a microwave source.Type: ApplicationFiled: June 20, 2007Publication date: January 31, 2008Inventors: Alexander Paterson, Elizabeth Pavel, Valentin Todorow, Huong Nguyen, Thomas Kropewnicki, Brian Hatcher, John Holland
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Publication number: 20070246162Abstract: A plasma reactor for processing a workpiece includes a reactor chamber and a workpiece support within the chamber, the chamber having a ceiling facing the workpiece support, an inductively coupled plasma source power applicator overlying the ceiling, and an RF power generator coupled to the inductively coupled source power applicator, a capacitively coupled plasma source power applicator comprising a source power electrode at one of: (a) the ceiling (b) the workpiece support, and plural VHF power generators of different fixed frequencies coupled to the capacitively coupled source power applicator, and a controller for independently controlling the power output levels of the plural VHF generators so as to control an effective VHF frequency applied to the source power electrode.Type: ApplicationFiled: April 24, 2006Publication date: October 25, 2007Inventors: Alexander Paterson, Valentin Todorow, Theodoros Panagopoulos, Brian Hatcher, Dan Katz, Edward Hammond, John Holland, Alexander Matyushkin
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Publication number: 20070245960Abstract: A method of processing a workpiece in the chamber of a plasma reactor includes introducing a process gas into the chamber, capacitively coupling VHF plasma source power into a process region of the chamber that overlies the wafer while inductively coupling RF plasma source power into the process region. A particular plasma ion density level is established by maintaining the total amount of plasma source power inductively and capacitively coupled into the chamber at a level that provides the desired plasma ion density. Chemical species distribution or content in the process region plasma is controlled by adjusting the ratio between the amounts of the capacitively coupled power and the inductively coupled power while continuing to maintain the level of total plasma source power.Type: ApplicationFiled: April 24, 2006Publication date: October 25, 2007Inventors: Alexander Paterson, Valentin Todorow, Theodoros Panagopoulos, Brian Hatcher, Dan Katz, Edward Hammond, John Holland, Alexander Matyushkin
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Publication number: 20070245958Abstract: A method of processing a workpiece in the chamber of a plasma reactor includes introducing a process gas into the chamber, simultaneously (a) capacitively coupling VHF plasma source power into a process region of the chamber that overlies the wafer, and (b) inductively coupling RF plasma source power into the process region, and controlling radial distribution of plasma ion density in the process region by controlling the effective frequency of the VHF source power. In a preferred embodiment, the step of coupling VHF source power is performed by coupling VHF source power from different generators having different VHF frequencies, and the step of controlling the effective frequency is performed by controlling the ratio of power coupled by the different generators.Type: ApplicationFiled: April 24, 2006Publication date: October 25, 2007Inventors: Alexander Paterson, Valentin Todorow, Theodoros Panagopoulos, Brian Hatcher, Dan Katz, Edward Hammond, John Holland, Alexander Matyushkin