Patents by Inventor Valerie J. Henderson

Valerie J. Henderson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for relofting a nonwoven substrate
    Patent number: 11655572
    Abstract: Aspects of the present disclosure relate to methods and apparatuses for relofting nonwoven substrates. During the relofting process, a substrate is directed to advance in a first direction such that a length of the substrate is in a facing relationship with a radiation source. The advancing substrate is relofted by irradiating the length of the substrate with infrared radiation from the infrared radiation source. The substrate comprises a first caliper upstream of the radiation source and the substrate comprises a second caliper downstream of the radiation source greater than the first caliper. The substrate may also be redirected around an axis to advance the substrate in a second direction, wherein the second direction is different than the first direction. The axis may be selectively movable between a first position and a second position to selectively subject the substrate to infrared radiation and remove the substrate from the infrared radiation.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: May 23, 2023
    Assignee: THE PROCTER & GAMBLE COMPANY
    Inventors: Rong Deng, Aleksey M. Pinyayev, Valerie J. Henderson, Craig A. Powell
  • METHOD AND APPARATUS FOR RELOFTING A NONWOVEN SUBSTRATE
    Publication number: 20200190715
    Abstract: Aspects of the present disclosure relate to methods and apparatuses for relofting nonwoven substrates. During the relofting process, a substrate is directed to advance in a first direction such that a length of the substrate is in a facing relationship with a radiation source. The advancing substrate is relofted by irradiating the length of the substrate with infrared radiation from the infrared radiation source. The substrate comprises a first caliper upstream of the radiation source and the substrate comprises a second caliper downstream of the radiation source greater than the first caliper. The substrate may also be redirected around an axis to advance the substrate in a second direction, wherein the second direction is different than the first direction. The axis may be selectively movable between a first position and a second position to selectively subject the substrate to infrared radiation and remove the substrate from the infrared radiation.
    Type: Application
    Filed: November 21, 2019
    Publication date: June 18, 2020
    Inventors: Rong Deng, Aleksey M. Pinyayev, Valerie J. Henderson, Craig A. Powell
  • Method for embossing an absorbent article using a segmented anvil
    Patent number: 8491742
    Abstract: A method for embossing an absorbent article using a segmented anvil and attaching a release paper to a backsheet having depressed regions.
    Type: Grant
    Filed: October 28, 2010
    Date of Patent: July 23, 2013
    Assignee: The Procter and Gamble Company
    Inventors: Steve J. Waas, Gregory J. Wilson, Rong Deng, Valerie J. Henderson
  • METHOD FOR EMBOSSING AN ABSORBENT ARTICLE USING A SEGMENTED ANVIL
    Publication number: 20120103505
    Abstract: A method for embossing an absorbent article using a segmented anvil and attaching a release paper to a backsheet having depressed regions.
    Type: Application
    Filed: October 28, 2010
    Publication date: May 3, 2012
    Inventors: Steve J. Waas, Gregory J. Wilson, Rong Deng, Valerie J. Henderson