Abstract: An ion implanter comprising a process chamber, a FOUP and a temperature treating assembly and a method using the same are provided. A workpiece can be implanted according to a recipe of an ion implantation in the process chamber. The FOUP can transfer a workpiece toward and away from the process chamber. The temperature treating assembly comprises a vacuum chamber, a heating module and a cooling module. The vacuum chamber communicates with the process chamber and has a heating space and a cooling space next to the heating space. The heating module is mounted on the vacuum chamber from a side of the heating space for heating the workpiece located in the heating space to a first temperature. The cooling module is mounted in the cooling space for cooling the workpiece located in the cooling space to a second temperature different from the first temperature.

Abstract: An aspect of the present invention provides a system and method for controlling a wafer cleaning system having a wafer carrier and a driving portion. The wafer carrier can move along a path in a first direction and a second direction. The driving portion can controllably move the wafer carrier in the first direction and the second direction. The control system includes a vibration sensor portion and a wafer carrier position controller. The vibration sensor portion can detect vibration of the wafer carrier and can output a vibration signal based on the detected vibration. The wafer carrier position controller can instruct the driving portion to modify motion of the wafer carrier based on the vibration signal to reduce the detected vibration.

Abstract: A handpiece apparatus and/or method for dispensing media, and that can include one or more lights for illumination and/or for curing of composite materials. The handpiece apparatus includes a heat source with a flow diverter to enhance heat transfer to the media, and a temperature controller that synchronizes the heat source with the fluid and/or gaseous flow. The handpiece apparatus has an accumulator chamber that temporarily removes transient flow that has not reached a predetermined temperature and then gradually recirculates it back into the media flow after the media reaches a predetermined temperature so that the media is dispensed at an elevated and uniform temperature. The handpiece apparatus can have one or more light sources for illumination and/or for curing composite materials. The handpiece apparatus dispensing nozzle acts as a light pipe to direct and focus illumination from an internal light source onto the work area.