Patents by Inventor Vara Govindeswara Reddy Vakada
Vara Govindeswara Reddy Vakada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10796973Abstract: Structures for testing a field effect-transistor or Kelvin field-effect transistor, and methods of forming a structure for testing a field-effect transistor or Kelvin field-effect transistor. The structure includes a device-under-testing that has one or more source/drain regions and a first metallization level arranged over the device-under-testing. The first metallization level includes one or more first interconnect lines. The structure further includes a contact level having one or more first contacts arranged between the first metallization level and the device-under-testing. The one or more first contacts directly connect the one or more first interconnect lines with the one or more source/drain regions. The structure further includes a second metallization level arranged over the first metallization level. The second metallization level has a first test pad and one or more second interconnect lines connecting the one or more first interconnect lines with the first test pad.Type: GrantFiled: May 29, 2019Date of Patent: October 6, 2020Assignee: GLOBALFOUNDRIES INC.Inventors: Mankyu Yang, Vara Govindeswara Reddy Vakada, Edward Maciejewski, Brian Greene, Atsushi Ogino, Vikrant Chauhan, Prianka Sengupta
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Patent number: 10790204Abstract: Structures for testing a field effect-transistor or Kelvin field-effect transistor, and methods of forming a structure for testing a field-effect transistor or Kelvin field-effect transistor. The structure includes a test pad, a device-under-testing having one or more source/drain regions, and a metallization level arranged over the device-under-testing. The metallization level includes one or more interconnect lines that are connected with the test pad. One or more contacts, which are arranged between the metallization level and the device-under-testing, directly connect the one or more interconnect lines with the one or more source/drain regions.Type: GrantFiled: November 9, 2018Date of Patent: September 29, 2020Assignee: GLOBALFOUNDRIES INC.Inventors: Mankyu Yang, Vara Govindeswara Reddy Vakada, Edward Maciejewski, Brian Greene, Atsushi Ogino, Vikrant Chauhan, Prianka Sengupta
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Publication number: 20200152531Abstract: Structures for testing a field effect-transistor or Kelvin field-effect transistor, and methods of forming a structure for testing a field-effect transistor or Kelvin field-effect transistor. The structure includes a device-under-testing that has one or more source/drain regions and a first metallization level arranged over the device-under-testing. The first metallization level includes one or more first interconnect lines. The structure further includes a contact level having one or more first contacts arranged between the first metallization level and the device-under-testing. The one or more first contacts directly connect the one or more first interconnect lines with the one or more source/drain regions. The structure further includes a second metallization level arranged over the first metallization level. The second metallization level has a first test pad and one or more second interconnect lines connecting the one or more first interconnect lines with the first test pad.Type: ApplicationFiled: May 29, 2019Publication date: May 14, 2020Inventors: Mankyu Yang, Vara Govindeswara Reddy Vakada, Edward Maciejewski, Brian Greene, Atsushi Ogino, Vikrant Chauhan, Prianka Sengupta
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Publication number: 20200152530Abstract: Structures for testing a field effect-transistor or Kelvin field-effect transistor, and methods of forming a structure for testing a field-effect transistor or Kelvin field-effect transistor. The structure includes a test pad, a device-under-testing having one or more source/drain regions, and a metallization level arranged over the device-under-testing. The metallization level includes one or more interconnect lines that are connected with the test pad. One or more contacts, which are arranged between the metallization level and the device-under-testing, directly connect the one or more interconnect lines with the one or more source/drain regions.Type: ApplicationFiled: November 9, 2018Publication date: May 14, 2020Inventors: Mankyu Yang, Vara Govindeswara Reddy Vakada, Edward Maciejewski, Brian Greene, Atsushi Ogino, Vikrant Chauhan, Prianka Sengupta
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Patent number: 9601578Abstract: A non-planar lateral drift MOS device eliminates the need for a field plate extension, which reduces gate width. In one example, two sources and two comparatively small gates in a raised structure allow for two channels and a dual current with mirrored flows, each traveling into and downward through a center region of a connecting well that connects the substrate with the drain areas and shallow wells containing the source areas, the current then traveling in opposite directions within the substrate region of the connecting well toward the two drains. The source and drain areas may be separate raised structures or isolated areas of a continuous raised structure.Type: GrantFiled: October 10, 2014Date of Patent: March 21, 2017Assignee: GLOBALFOUNDRIES INC.Inventors: Jerome Ciavatti, Yanxiang Liu, Vara Govindeswara Reddy Vakada
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Patent number: 9362357Abstract: A method of forming SSRW FETs with controlled step height between a field oxide and epitaxially grown silicon and the resulting devices are provided. Embodiments include providing a SiN layer on a substrate, forming first, second, and third spaced STI regions of field oxide through the SiN layer and into the substrate, removing a top portion of the field oxide for each STI region by a controlled deglaze, removing the SiN layer, forming an n-type region in the substrate between the first and second STI regions and a p-type region in the substrate between the second and third STI regions, and epitaxially growing a Si based layer on the substrate over the n-type and p-type regions.Type: GrantFiled: May 19, 2015Date of Patent: June 7, 2016Assignee: GLOBALFOUNDRIES INC.Inventors: Laegu Kang, Vara Govindeswara Reddy Vakada, Michael Ganz, Yi Qi, Puneet Khanna, Sri Charan Vemula, Srikanth Samavedam
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Publication number: 20160104774Abstract: A non-planar lateral drift MOS device eliminates the need for a field plate extension, which reduces gate width. In one example, two sources and two comparatively small gates in a raised structure allow for two channels and a dual current with mirrored flows, each traveling into and downward through a center region of a connecting well that connects the substrate with the drain areas and shallow wells containing the source areas, the current then traveling in opposite directions within the substrate region of the connecting well toward the two drains. The source and drain areas may be separate raised structures or isolated areas of a continuous raised structure.Type: ApplicationFiled: October 10, 2014Publication date: April 14, 2016Applicant: GLOBALFOUNDRIES INC.Inventors: Jerome CIAVATTI, Yanxiang LIU, Vara Govindeswara Reddy VAKADA
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Publication number: 20150340501Abstract: Methods for producing independent-gate FinFETs with improved channel mobility and the resulting devices are disclosed. Embodiments may include forming an independent-gate fin field-effect transistor (FinFET) above a substrate; and forming stress within the fin between two independent gates of the independent-gate FinFET.Type: ApplicationFiled: May 22, 2014Publication date: November 26, 2015Applicant: GLOBALFOUNDRIES INC.Inventors: Xusheng WU, Johannes Marinus VAN MEER, Manfred ELLER, Vara Govindeswara Reddy VAKADA
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Publication number: 20150249129Abstract: A method of forming SSRW FETs with controlled step height between a field oxide and epitaxially grown silicon and the resulting devices are provided. Embodiments include providing a SiN layer on a substrate, forming first, second, and third spaced STI regions of field oxide through the SiN layer and into the substrate, removing a top portion of the field oxide for each STI region by a controlled deglaze, removing the SiN layer, forming an n-type region in the substrate between the first and second STI regions and a p-type region in the substrate between the second and third STI regions, and epitaxially growing a Si based layer on the substrate over the n-type and p-type regions.Type: ApplicationFiled: May 19, 2015Publication date: September 3, 2015Inventors: Laegu KANG, Vara Govindeswara Reddy VAKADA, Michael GANZ, Yi QI, Puneet KHANNA, Sri Charan VEMULA, Srikanth SAMAVEDAM
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Patent number: 9099380Abstract: A methodology enabling the formation of steep channel profiles for devices, such as SSRW FETs, having a resultant channel profiles that enables suppression of threshold voltage variation and the resulting device are disclosed. Embodiments include providing STI regions in a silicon wafer; performing a deep well implantation of a dopant into the silicon wafer between STI regions; forming a recess in the doped silicon wafer between the STI regions; performing a shallow well implantation of the dopant into the silicon wafer in the recess; and forming Si:C on the doped silicon wafer in the recess.Type: GrantFiled: October 10, 2014Date of Patent: August 4, 2015Assignee: GLOBALFOUNDRIES Inc.Inventors: Vara Govindeswara Reddy Vakada, Laegu Kang, Michael P. Ganz, Yi Qi, Puneet Khanna, Sri Charan Vemula, Srikanth Samavedam
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Patent number: 9099525Abstract: A method of forming SSRW FETs with controlled step height between a field oxide and epitaxially grown silicon and the resulting devices are provided. Embodiments include providing a SiN layer on a substrate, forming first, second, and third spaced STI regions of field oxide through the SiN layer and into the substrate, removing a top portion of the field oxide for each STI region by a controlled deglaze, removing the SiN layer, forming an n-type region in the substrate between the first and second STI regions and a p-type region in the substrate between the second and third STI regions, and epitaxially growing a Si based layer on the substrate over the n-type and p-type regions.Type: GrantFiled: December 28, 2012Date of Patent: August 4, 2015Assignee: GLOBALFOUNDRIES Inc.Inventors: Laegu Kang, Vara Govindeswara Reddy Vakada, Michael P. Ganz, Yi Qi, Puneet Khanna, Sri Charan Vemula, Srikanth Samavedam
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Publication number: 20150053981Abstract: A methodology enabling the formation of steep channel profiles for devices, such as SSRW FETs, having a resultant channel profiles that enables suppression of threshold voltage variation and the resulting device are disclosed. Embodiments include providing STI regions in a silicon wafer; performing a deep well implantation of a dopant into the silicon wafer between STI regions; forming a recess in the doped silicon wafer between the STI regions; performing a shallow well implantation of the dopant into the silicon wafer in the recess; and forming Si:C on the doped silicon wafer in the recess.Type: ApplicationFiled: October 10, 2014Publication date: February 26, 2015Inventors: Vara Govindeswara Reddy VAKADA, Laegu KANG, Michael P. GANZ, Yi QI, Puneet KHANNA, Sri Charan VEMULA, Srikanth SAMAVEDAM
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Patent number: 8916442Abstract: A methodology enabling the formation of steep channel profiles for devices, such as SSRW FETs, having a resultant channel profiles that enables suppression of threshold voltage variation and the resulting device are disclosed. Embodiments include providing STI regions in a silicon wafer; performing a deep well implantation of a dopant into the silicon wafer between STI regions; forming a recess in the doped silicon wafer between the STI regions; performing a shallow well implantation of the dopant into the silicon wafer in the recess; and forming Si:C on the doped silicon wafer in the recess.Type: GrantFiled: January 17, 2013Date of Patent: December 23, 2014Assignee: GLOBALFOUNDRIES Inc.Inventors: Vara Govindeswara Reddy Vakada, Laegu Kang, Michael P. Ganz, Yi Qi, Puneet Khanna, Sri Charan Vemula, Srikanth Samavedam
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Publication number: 20140197411Abstract: A methodology enabling the formation of steep channel profiles for devices, such as SSRW FETs, having a resultant channel profiles that enables suppression of threshold voltage variation and the resulting device are disclosed. Embodiments include providing STI regions in a silicon wafer; performing a deep well implantation of a dopant into the silicon wafer between STI regions; forming a recess in the doped silicon wafer between the STI regions; performing a shallow well implantation of the dopant into the silicon wafer in the recess; and forming Si:C on the doped silicon wafer in the recess.Type: ApplicationFiled: January 17, 2013Publication date: July 17, 2014Applicant: GLOBAL FOUNDERIES INC.Inventors: Vara Govindeswara Reddy VAKADA, Laegu Kang, Michael P. Ganz, Yi Qi, Puneet Khanna, Sri Charan Vemula, Srikanth Samavedam
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Publication number: 20140183551Abstract: A method of forming SSRW FETs with controlled step height between a field oxide and epitaxially grown silicon and the resulting devices are provided. Embodiments include providing a SiN layer on a substrate, forming first, second, and third spaced STI regions of field oxide through the SiN layer and into the substrate, removing a top portion of the field oxide for each STI region by a controlled deglaze, removing the SiN layer, forming an n-type region in the substrate between the first and second STI regions and a p-type region in the substrate between the second and third STI regions, and epitaxially growing a Si based layer on the substrate over the n-type and p-type regions.Type: ApplicationFiled: December 28, 2012Publication date: July 3, 2014Applicant: GLOBALFOUNDRIES Inc.Inventors: Laegu Kang, Vara Govindeswara Reddy Vakada, Michael P. Ganz, Yi Qi, Puneet Khanna, Sri Charan Vemula, Srikanth Samavedam
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Patent number: 8669616Abstract: Semiconductor devices with n-shaped bottom stress liners are formed. Embodiments include forming a protuberance on a substrate, conformally forming a sacrificial material layer over the protuberance, forming a gate stack above the sacrificial material layer on a silicon layer, removing the sacrificial material layer to form a tunnel, and forming a stress liner in the tunnel conforming to the shape of the protuberance. Embodiments further include forming a silicon layer over the sacrificial material layer and lining the tunnel with a passivation layer prior to forming the stress liner.Type: GrantFiled: September 13, 2013Date of Patent: March 11, 2014Assignee: GlobalFoundries Singapore Pte. Ltd.Inventors: Xiaodong Yang, Yanxiang Liu, Vara Govindeswara Reddy Vakada, Jinping Liu, Min Dai
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Publication number: 20140015020Abstract: Semiconductor devices with n-shaped bottom stress liners are formed. Embodiments include forming a protuberance on a substrate, conformally forming a sacrificial material layer over the protuberance, forming a gate stack above the sacrificial material layer on a silicon layer, removing the sacrificial material layer to form a tunnel, and forming a stress liner in the tunnel conforming to the shape of the protuberance. Embodiments further include forming a silicon layer over the sacrificial material layer and lining the tunnel with a passivation layer prior to forming the stress liner.Type: ApplicationFiled: September 13, 2013Publication date: January 16, 2014Inventors: Xiaodong YANG, Yanxiang LIU, Vara Govindeswara Reddy VAKADA, Jinping LIU, Min DAI
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Patent number: 8557668Abstract: Semiconductor devices with n-shaped bottom stress liners are formed. Embodiments include forming a protuberance on a substrate, conformally forming a sacrificial material layer over the protuberance, forming a gate stack above the sacrificial material layer on a silicon layer, removing the sacrificial material layer to form a tunnel, and forming a stress liner in the tunnel conforming to the shape of the protuberance. Embodiments further include forming a silicon layer over the sacrificial material layer and lining the tunnel with a passivation layer prior to forming the stress liner.Type: GrantFiled: January 12, 2012Date of Patent: October 15, 2013Assignee: GLOBALFOUNDRIES SINGAPORE Pte. Ltd.Inventors: Xiaodong Yang, Yanxiang Liu, Vara Govindeswara Reddy Vakada, Jinping Liu, Min Dai
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Publication number: 20130181260Abstract: Semiconductor devices with n-shaped bottom stress liners are formed. Embodiments include forming a protuberance on a substrate, conformally forming a sacrificial material layer over the protuberance, forming a gate stack above the sacrificial material layer on a silicon layer, removing the sacrificial material layer to form a tunnel, and forming a stress liner in the tunnel conforming to the shape of the protuberance. Embodiments further include forming a silicon layer over the sacrificial material layer and lining the tunnel with a passivation layer prior to forming the stress liner.Type: ApplicationFiled: January 12, 2012Publication date: July 18, 2013Applicants: GLOBALFOUNDRIES Singapore Pte. Ltd., GLOBALFOUNDRIES Inc.Inventors: Xiaodong Yang, Yanxiang Liu, Vara Govindeswara Reddy Vakada, Jinping Liu, Min Dai