Patents by Inventor Vasco Tomas Tenner
Vasco Tomas Tenner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230341813Abstract: A dark field digital holographic microscope and associated metrology method is disclosed which is configured to determine a characteristic of interest of a structure. The dark field digital holographic microscope includes an illumination branch for providing illumination radiation to illuminate the structure; a detection arrangement for capturing object radiation resulting from diffraction of the illumination radiation by the structure; and a reference branch for providing reference radiation for interfering with the object radiation to obtain an image of an interference pattern formed by the illumination radiation and reference radiation. The reference branch has an optical element operable to vary a characteristic of the reference radiation so as to reduce and/or minimize variation in a contrast metric of the image within a field of view of the dark field digital holographic microscope at a detector plane.Type: ApplicationFiled: October 7, 2021Publication date: October 26, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Nitesh PANDEY, Arie Jeffrey DEN BOEF, Hugo Augustinus Joseph CRAMER, Vasco Tomas TENNER
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Publication number: 20230273255Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.Type: ApplicationFiled: May 5, 2023Publication date: August 31, 2023Applicant: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus TINNEMANS, Patrick Warnaar, Vasco Tomas Tenner, Maurits Van Der Schaar
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Patent number: 11709436Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.Type: GrantFiled: August 30, 2021Date of Patent: July 25, 2023Assignee: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Patrick Warnaar, Vasco Tomas Tenner, Maurits Van Der Schaar
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Patent number: 11650047Abstract: Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.Type: GrantFiled: May 7, 2021Date of Patent: May 16, 2023Assignee: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Vasco Tomas Tenner, Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Patrick Warnaar, Grzegorz Grzela, Martin Jacobus Johan Jak
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Publication number: 20230062585Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.Type: ApplicationFiled: July 1, 2022Publication date: March 2, 2023Applicant: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus TINNEMANS, Arie Jeffrey DEN BOEF, Armand Eugene Albert KOOLEN, Nitesh PANDEY, Vasco Tomas TENNER, Willem Marie Julia Marcel COENE, Patrick WARNAAR
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Publication number: 20230064193Abstract: Disclosed is a method of measuring a periodic structure on a substrate with illumination radiation having at least one wavelength, the periodic structure having at least one pitch. The method comprises configuring, based on a ratio of said pitch and said wavelength, one or more of: an illumination aperture profile comprising one or more illumination regions in Fourier space; an orientation of the periodic structure for a measurement; and a detection aperture profile comprising one or more separated detection regions in Fourier space. This configuration is such that: i) diffracted radiation of at least a pair of complementary diffraction orders is captured within the detection aperture profile, and ii) said diffracted radiation fills at least 80% of the one or more separated detection regions. The periodic structure is measured while applying the configured one or more of illumination aperture profile, detection aperture profile and orientation of the periodic structure.Type: ApplicationFiled: January 20, 2021Publication date: March 2, 2023Applicant: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus TINNEMANS, Patrick WARNAAR, Vasco Tomas TENNER, Hugo Augustinus Joseph CRAMER, Bram Antonius Gerardus LOMANS, Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Ahmet Burak CUNBUL, Alexander Prasetya KONIJNENBERG
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Publication number: 20230044632Abstract: A dark field digital holographic microscope is disclosed which is configured to determine a characteristic of interest of a structure. The dark field digital holographic microscope comprises an illumination device configured to provide at least: a first beam pair comprising a first illumination beam of radiation (1010) and a first reference beam of radiation (1030) and a second beam pair comprising a second illumination beam of radiation (1020) and a second reference beam of radiation (1040); and one or more optical elements (1070) operable to capture a first scattered radiation and to capture a second scattered radiation scattered by the structure resultant from the first and second illumination beams respectively. The beams of the first beam pair are mutually coherent and the beams of the second beam pair are mutually coherent. The illumination device is configured to impose incoherence (ADI) between the first beam pair and second beam pair.Type: ApplicationFiled: October 21, 2020Publication date: February 9, 2023Applicant: ASML Netherlands B.V.Inventors: Willem Marie Julia Marcel COENE, Arie Jeffrey DEN BOEF, Vasco Tomas TENNER, Nitesh PANDEY, Christos MESSINIS, Johannes Fitzgerald DE BOER
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Publication number: 20220350260Abstract: Disclosed is a method for a metrology measurement on an area of a substrate comprising at least a portion of a target structure. The method comprises receiving a radiation information representing a portion of radiation scattered by the are, and using a filter in a Fourier domain for removing or suppressing at least a portion of the received radiation information that does not relate to radiation that has been scattered by the target structure for obtaining a filtered radiation information for the metrology measurement, wherein characteristics of the filter are based on target information about the target structure.Type: ApplicationFiled: September 3, 2020Publication date: November 3, 2022Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Armand Eugene Albert, Justin Lloyd KREUZER, Nikhil MEHTA, Patrick WARNAAR, Vasco Tomas TENNER, Patricius Aloysius Jacobus TINNEMANS, Hugo Augustinus Joseph CRAMER
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Publication number: 20220309645Abstract: Disclosed is a method of determining a complex-valued field relating to a structure, comprising: obtaining image data relating to a series of images of the structure, for which at least one measurement parameter is varied over the series and obtaining a trained network operable to map a series of images to a corresponding complex-valued field. The method comprises inputting the image data into said trained network and non-iteratively determining the complex-valued field relating to the structure as the output of the trained network. A method of training the trained network is also disclosed.Type: ApplicationFiled: May 8, 2020Publication date: September 29, 2022Applicant: ASML Netherlands B.V.Inventors: Vasco Tomas TENNER, Willem Marie Julia Marcel COENE
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Patent number: 11415900Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.Type: GrantFiled: September 16, 2020Date of Patent: August 16, 2022Assignee: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Arie Jeffrey Den Boef, Armand Eugene Albert Koolen, Nitesh Pandey, Vasco Tomas Tenner, Willem Marie Julia Marcel Coene, Patrick Warnaar
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Publication number: 20210389365Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.Type: ApplicationFiled: August 30, 2021Publication date: December 16, 2021Applicant: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus TINNEMANS, Patrick WARNAAR, Vasco Tomas TENNER, Maurits VAN DER SCHAAR
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Publication number: 20210349403Abstract: Methods and apparatus are disclosed for determining a characteristic of a structure. In one arrangement, the structure is illuminated with first illumination radiation to generate first scattered radiation. A first interference pattern is formed by interference between a portion of the first scattered radiation reaching a sensor and first reference radiation. The structure is also illuminated with second illumination radiation from a different direction. A second interference pattern is formed using second reference radiation. The first and second interference patterns are used to determine the characteristic of the structure. Azimuthal angles of the first and second reference radiations onto the sensor are different.Type: ApplicationFiled: July 22, 2021Publication date: November 11, 2021Applicant: ASML Netherlands B.V.Inventors: Johannes Fitzgerald De Boer, Vasco Tomas Tenner, Arie Jeffrey Den Boef, Christos Messinis
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Publication number: 20210325174Abstract: Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.Type: ApplicationFiled: May 7, 2021Publication date: October 21, 2021Applicant: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus TINNEMANS, Vasco Tomas Tenner, Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Patrick Warnaar, Grzegorz Grzela, Martin Jacobus Johan Jak
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Patent number: 11125806Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.Type: GrantFiled: July 31, 2019Date of Patent: September 21, 2021Assignee: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Patrick Warnaar, Vasco Tomas Tenner, Maurits Van der Schaar
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Patent number: 11119415Abstract: Methods and apparatus are disclosed for determining a characteristic of a structure. In one arrangement, the structure is illuminated with first illumination radiation to generate first scattered radiation. A first interference pattern is formed by interference between a portion of the first scattered radiation reaching a sensor and first reference radiation. The structure is also illuminated with second illumination radiation from a different direction. A second interference pattern is formed using second reference radiation. The first and second interference patterns are used to determine the characteristic of the structure. Azimuthal angles of the first and second reference radiations onto the sensor are different.Type: GrantFiled: April 5, 2019Date of Patent: September 14, 2021Assignee: ASML Netherlands B.V.Inventors: Johannes Fitzgerald De Boer, Vasco Tomas Tenner, Arie Jeffrey Den Boef, Christos Messinis
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Patent number: 11009343Abstract: Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.Type: GrantFiled: February 15, 2019Date of Patent: May 18, 2021Assignee: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Vasco Tomas Tenner, Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Patrick Warnaar, Grzegorz Grzela, Martin Jacobus Johan Jak
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Publication number: 20210003924Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.Type: ApplicationFiled: September 16, 2020Publication date: January 7, 2021Applicant: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus TINNEMANS, Arie Jeffrey DEN BOEF, Armand Eugene Albert KOOLEN, Nitesh PANDEY, Vasco Tomas TENNER, Willem Marie Julia Marcel COENE, Patrick WARNAAR
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Patent number: 10816909Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.Type: GrantFiled: October 3, 2018Date of Patent: October 27, 2020Assignee: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Arie Jeffrey Den Boef, Armand Eugene Albert Koolen, Nitesh Pandey, Vasco Tomas Tenner, Willem Marie Julia Marcel Coene, Patrick Warnaar
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Publication number: 20200041563Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.Type: ApplicationFiled: July 31, 2019Publication date: February 6, 2020Applicant: Stichting VUInventors: Patricius Aloysius Jacobus TINNEMANS, Patrick WARNAAR, Vasco Tomas Tenner, Maurits Van der schaar
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Publication number: 20190310559Abstract: Methods and apparatus are disclosed for determining a characteristic of a structure. In one arrangement, the structure is illuminated with first illumination radiation to generate first scattered radiation. A first interference pattern is formed by interference between a portion of the first scattered radiation reaching a sensor and first reference radiation. The structure is also illuminated with second illumination radiation from a different direction. A second interference pattern is formed using second reference radiation. The first and second interference patterns are used to determine the characteristic of the structure. Azimuthal angles of the first and second reference radiations onto the sensor are different.Type: ApplicationFiled: April 5, 2019Publication date: October 10, 2019Applicants: Stichting VU, Stichting Nederlandse Wetenschappelijk Onderzoek Instituten, Universiteit van Amsterdam, ASML Netherlands B.V.Inventors: Johannes Fitzgerald DE BOER, Vasco Tomas TENNER, Arie Jeffrey DEN BOEF, Christos MESSINIS