Abstract: Provided are bitumen nanocomposites. The bitumen nanocomposites have one or more clay, one or more polymer composition, and bitumen. A polymer composition can have one or more polymer and one or more crumb rubber. A polymer may have one or more maleic anhydride group. The bitumen nanocomposites can be used in, for example, road surfacing products and roofing products.

Abstract: A pattern-forming method includes: applying directly or indirectly on a substrate a radiation-sensitive composition containing a complex and an organic solvent to form a film; exposing the film to an ultraviolet ray, a far ultraviolet ray, an extreme ultraviolet ray, or an electron beam; and developing the film exposed, wherein the complex is represented by formula (1). [MmLnQp]??(1) In the formula (1), M represents a zinc atom, a cobalt atom, a nickel atom, a hafnium atom, a zirconium atom, a titanium atom, an iron atom, a chromium atom, a manganese atom, or an indium atom; and L represents a ligand derived from a compound represented by formula (2). R1—CHR3—R2 ??(2) In the formula (2), R1 and R2 each independently represent —C(?O)—RA, —C(?O)—ORB, or —CN.

Abstract: A photoresist including a photochromic compound suitable for extreme ultraviolet lithography or electron-beam lithography and a structure including the photoresist over a substrate are provided. A method for patterning a substrate is also provided and includes: (a) covering the substrate with the photoresist; (b) exposing the photoresist to an extreme ultraviolet or electron-beam lithographic pattern, the lithographic pattern defining an exposed portion of the photoresist and an unexposed portion of the photoresist, and thereby altering a solubility of the exposed portion towards a developing solvent; and (c) developing a patterned photoresist by contacting the developing solvent with the photoresist.

Abstract: Provided are bitumen nanocomposites. The bitumen nanocomposites have one or more clay, one or more polymer composition, and bitumen. A polymer composition can have one or more polymer and one or more crumb rubber. A polymer may have one or more maleic anhydride group. The bitumen nanocomposites can be used in, for example, road surfacing products and roofing products.

Abstract: A radiation-sensitive composition includes a metal-containing component and an organic solvent. The metal-containing component includes particles including a metal oxide as a principal component. The metal-containing component includes at least two metal atoms which are different from one another, and a percentage content of the at least two metal atoms with respect to an entirety of metal atoms and metalloid atoms in the composition is no less than 50 atom %. The metal-containing component preferably includes: a first metal atom that is at least one selected from a titanium atom, a zirconium atom, a hafnium atom, a zinc atom, a tin atom and an indium atom; and a second metal atom that is at least one selected from a lanthanum atom and an yttrium atom.

Abstract: A radiation-sensitive composition includes particles including a metal oxide as a principal component, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, a tellurium atom, or a combination thereof. A percentage content of the first metal atom with respect to total metal atoms in the radiation-sensitive composition is no less than 50 atomic %. A pattern-forming method includes applying the radiation-sensitive composition to form a film on a substrate, exposing the film, and developing the film exposed.

Abstract: A radiation-sensitive composition includes particles including a metal oxide as a principal component, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, a tellurium atom, or a combination thereof. A percentage content of the first metal atom with respect to total metal atoms in the radiation-sensitive composition is no less than 50 atomic %. A pattern-forming method includes applying the radiation-sensitive composition to form a film on a substrate, exposing the film, and developing the film exposed.