Patents by Inventor Velt Klee

Velt Klee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of measuring combined critical dimension and overlay in single step
    Patent number: 6440759
    Abstract: A semiconductor wafer structure in a overlay pattern that permits determination of overlay and critical dimension features by CD SEM in a single pass along a given axis, comprising: a) a center feature section that provides a critical dimension point along a given axis; b) plurality of smaller sections positioned adjacent to the center feature section along the given axis that include a plurality of spaces between each of the plurality of smaller sections; and c) a plurality of displacement lines adjacent to the plurality of the smaller sections to displace a plurality of spaces.
    Type: Grant
    Filed: June 29, 2001
    Date of Patent: August 27, 2002
    Assignee: Infineon Technologies AG
    Inventors: Martin Commons, Tobias Mono, Velt Klee, John Pohl, Paul Wensley