Patents by Inventor Ventzislav Stoev

Ventzislav Stoev has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Automated bandwidth / wavelength adjustment systems and methods for short pulse lasers and optical amplifiers
    Patent number: 8218587
    Abstract: Embodiments are directed to systems and methods for adjusting a wavelength, bandwidth or both. Such systems and methods may be applicable to laser beams within a laser cavity or amplifier. For some embodiments, such systems and methods may be used to allow a user to set a desired wavelength and bandwidth of a short pulse laser system for operation at those parameters without further adjustment by the user.
    Type: Grant
    Filed: May 28, 2010
    Date of Patent: July 10, 2012
    Assignee: Newport Corporation
    Inventors: Ventzislav Stoev, Kevin Holsinger, David S. Bell, Olaf Korth
  • AUTOMATED BANDWIDTH / WAVELENGTH ADJUSTMENT SYSTEMS AND METHODS FOR SHORT PULSE LASERS AND OPTICAL AMPLIFIERS
    Publication number: 20110292954
    Abstract: Embodiments are directed to systems and methods for adjusting a wavelength, bandwidth or both. Such systems and methods may be applicable to laser beams within a laser cavity or amplifier. For some embodiments, such systems and methods may be used to allow a user to set a desired wavelength and bandwidth of a short pulse laser system for operation at those parameters without further adjustment by the user.
    Type: Application
    Filed: May 28, 2010
    Publication date: December 1, 2011
    Inventors: Ventzislav Stoev, Kevin Holsinger, David S. Bell, Olaf Korth
  • Industrial directly diode-pumped ultrafast amplifier system
    Publication number: 20050157382
    Abstract: A directly diode-pumped amplifier system is disclosed which produces sub-picosecond pulses with an output power of 2 watts or more. Computer resources are coupled to the amplifier system and are configured to provide control of operating parameters of the amplifier system. An optional second harmonic generator is supplied to increase the contrast ratio and reduce the minimum focal spot size. This amplifier system can be utilized for material processing applications.
    Type: Application
    Filed: January 7, 2005
    Publication date: July 21, 2005
    Inventors: James Kafka, Jianping Zhou, Juerg Aus-Der-Au, Kevin Holsinger, Ventzislav Stoev