Patents by Inventor Venugopal Balakrishna Menon

Venugopal Balakrishna Menon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SHALLOW TRENCH ISOLATION PROCESSING WITH LOCAL OXIDATION OF SILICON
    Publication number: 20220367444
    Abstract: A method of manufacturing an electronic device includes forming a shallow trench isolation (STI) structure on or in a semiconductor surface layer and forming a mask on the semiconductor surface layer, where the mask exposes a surface of a dielectric material of the STI structure and a prospective local oxidation of silicon (LOCOS) portion of a surface of the semiconductor surface layer. The method also includes performing an oxidation process using the mask to oxidize silicon in an indent in the dielectric material of the STI structure and to grow an oxide material on the exposed LOCOS portion of the surface of the semiconductor surface layer.
    Type: Application
    Filed: October 18, 2021
    Publication date: November 17, 2022
    Inventors: Robert Martin Higgins, Xiaoju Wu, Li Wang, Venugopal Balakrishna Menon