Patents by Inventor Vera BUTSCHER

Vera BUTSCHER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • EUV lithography apparatus and method for detecting particles in an EUV lithography apparatus
    Patent number: 9298109
    Abstract: An EUV lithography apparatus (1) includes: a light source (15) for generating radiation (17) for the illumination of particles (P) present in the gas phase and present in the EUV lithography apparatus (1) along a light area (18), and a detector, for detecting radiation (17a) from the light source (15) that is scattered at the illuminated particles (P) in a test region (19) captured by the detector. Also, a method for detecting particles (P) in an EUV lithography apparatus (1) includes: producing a light area (18) for illuminating the particles (P) present in the gas phase, detecting radiation (17a) scattered at the illuminated particles (P) in a test region (19), and determining a number (N) of particles in the test region (19) on the basis of the detected radiation (17a).
    Type: Grant
    Filed: June 14, 2013
    Date of Patent: March 29, 2016
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Vera Butscher, Dirk Heinrich Ehm
  • EUV LITHOGRAPHY APPARATUS AND METHOD FOR DETECTING PARTICLES IN AN EUV LITHOGRAPHY APPARATUS
    Publication number: 20140028989
    Abstract: An EUV lithography apparatus (1) includes: a light source (15) for generating radiation (17) for the illumination of particles (P) present in the gas phase and present in the EUV lithography apparatus (1) along a light area (18), and a detector, for detecting radiation (17a) from the light source (15) that is scattered at the illuminated particles (P) in a test region (19) captured by the detector. Also, a method for detecting particles (P) in an EUV lithography apparatus (1) includes: producing a light area (18) for illuminating the particles (P) present in the gas phase, detecting radiation (17a) scattered at the illuminated particles (P) in a test region (19), and determining a number (N) of particles in the test region (19) on the basis of the detected radiation (17a).
    Type: Application
    Filed: June 14, 2013
    Publication date: January 30, 2014
    Inventors: Vera BUTSCHER, Dirk Heinrich EHM