Abstract: In accordance with one embodiment of the present invention, a Magnetron Sputtering System consists of a Non-Equipotential Cathode with two or more group of segments made of one or different materials. Each group of segments is electrically insulated from others. At group or groups of segments called as Low-Voltage there is maintained a self-established electric voltage relating to anode that is less than voltages are maintained at remained cathode-target groups of segments called as High-Voltage. Such a Magnetron Sputtering System with a Non-Equipotential cathode makes possible to regulate energy of ions bombarding the cathode parts to control and substantially increase a local productivity of a Magnetron Sputtering System without increasing a discharge current and without change of magnetic field and pressure. Existing Magnetron Sputtering Systems can be adapted for application with this method.

Abstract: An ion source is cooled using a cooling plate that is separate and independent of the anode. The cooling plate forms a coolant cavity through which a fluid coolant (e.g., liquid or gas) can flow to cool the anode. In such configurations, the magnet may be thermally protected by the cooling plate. A thermally conductive material in a thermal transfer interface component can enhance the cooling capacity of the cooling plate. Furthermore, the separation of the cooling plate and the anode allows the cooling plate and cooling lines to be electrically isolated from the high voltage of the anode (e.g., using a thermally conductive, electrically insulating material). Combining these structures into an anode subassembly and magnet subassembly can also facilitate assembly and maintenance of the ion source, particularly as the anode is free of coolant lines, which can present some difficulty during maintenance.

Abstract: A Hall-current ion source for generation of low and high energy ion beams with selection of magnetic fields and emission currents, where there are utilized low magnetic fields and high emission currents that are higher than discharge currents for low energy ion beams, 15-100 eV; high magnetic fields and emission currents that are equal to discharge currents are utilized for discharge voltages providing ion beam energies of 100-500 eV. Other measures are utilized for protection of a gas distribution area and a magnet from pinching by an ion beam penetration through a reflector by a buffer chamber providing better gas distribution in anode area, a protective ring in a center part of a reflector, and others.

Abstract: In accordance with an embodiment of the invention, the hygienic toilet with a user protection from evacuations is designed. A self-foaming liquid soap as a high efficiency absorbing substance is used from contaminations produced during evacuations. A water tank is comprised of two compartments: one is for flashing water that could be a regular gravity tank, or a pressure assisted flash water, and a separate compartment is for a self-foaming liquid soap. A toilet bowl is designed with two rims: one is for a flashing water and another one for a soap foam. A soap foam is applied into a bowl walls and on a water surface on a bowl bottom for protection from evacuations and reflections into a user.

Abstract: Compressed air is utilized for water evacuation from water hose or other liquid containing systems. A freeze-free water hose device is provided which includes an air pump-compressor means, a Y-coupling with a water faucet. In one case, there is utilized one Y-coupling with one shut-off valve and an air-compressor means in a water faucet vicinity or on a faucet's wall. In another case, there is utilized a Y-coupling at a water faucet with one shut-off valves and a Y-coupling with three shut-off valves at a water hose reel. Yet in another case, there are utilized two Y-couplings each with two shut-off valves: one Y-coupling at a faucet and another at a water hose reel. In this case, a compressed air means is assembled with a water hose reel. This device is utilized also in beer, soda and water industry for cleaning lines with chemicals or pure water.

Abstract: A Hall-type ion source for generation of ion beams for technological applications presents itself a hybrid ion source, where properties of closed drift systems and end-Hall ion sources are combined for more efficient operation. An ion source has shorter central magnetic pole than regular closed drift ion source with magnetic screens that provide positive magnetic gradient in an ion source's discharge channel. An ion source with these combined properties has higher ratio of ion beam current to discharge current than end-Hall ion source and wider range of discharge parameters than closed drift ion source.

Abstract: In this invention the system and processes for organization of oil refinery from gases and heavy admixtures with a separation of purified oil for fractions obtained in the process of thermal distillation, and thermal and catalytic cracking and subsequent fine separation of products for narrow fractions are presented. The combining of vortex vapor generation processes of preliminary heated oil in the field of inertia forces of rotating liquid with condensation processes of gaseous products at reduced pressure in vortex vapor condensers with cooled walls with utilization of subsequent heating and productions of fuels with narrow fraction composition permits to obtain a high quality product.

Abstract: In one embodiment of this invention, the apparatus for sputter deposition within an evacuated volume comprises a compact gridless ion source into which an ionizable gas is introduced and from which ions leave with directed energies at or near the sputtering threshold and a sputter target near that source, biased negative relative to the surrounding vacuum enclosure, and located within the beam of ions leaving that source. Particles sputtered from the target are deposited on a deposition substrate spaced from both the ion source and the sputter target. An energetic beam of electrons can be generated by the incident ions striking the negatively biased sputter target and the deposition substrate is located either within or outside of this beam, depending on whether the net effect of bombardment by energetic electrons is beneficial or detrimental to that particular deposition process.

Abstract: In accordance with one specific embodiment of the present invention, a Hall-current ion source of the end-Hall type has an anode that is contoured with one or more recesses in the electron-collecting surface which have areas that are protected from the deposition of externally generated contamination thereon, as well as one or more protrusions that have higher temperatures than the bulk of the anode, thereby increasing the removal or passivation of coatings during operation by the thermal degradation of the coating and the effects of thermomechanical stresses. In another specific embodiment, which can be combined with the above embodiment, electrically isolated baffle or baffles are located to protect a substantial fraction of the electron-collecting surface of the anode from the deposition of externally generated contamination thereon.

Abstract: In accordance with one embodiment of the present invention, the ion-beam apparatus takes the form of a gridless ion source with a hot-filament cathode-neutralizer, in which the hot filament is heated with a current from the cathode-neutralizer heater. The cathode-neutralizer is connected to the negative terminal of the discharge supply for the gridless ion source. This connection is substantially isolated from ground (the potential of the surrounding vacuum chamber, which is usually at earth ground) and its potential is measured relative to ground. The heater current to the cathode-neutralizer is controlled by adjusting it so as to maintain this potential in a narrow operating range. This control can be manual or automatic.

Abstract: In accordance with one specific embodiment of the present invention, the apparatus for sputter deposition within an evacuated volume comprises a compact ion source to generate ions into which an ionizable gas is introduced and from which ions leave with directed energies near or below the sputtering threshold, a sputter target near that source and located within the beam of ions leaving that source, a sputter target with a grounded shield that defines the target portion exposed to sputtering, and a power supply to bias the target negative relative to ground so that ions are attracted to and sputter the target. Particles sputtered from the target are deposited on a deposition substrate separate from both the ion source and the sputter target. For an insulating target, the target is biased with a radiofrequency power supply and the bias has a mean negative value rather than a direct-current negative value relative to ground.

Abstract: In accordance with one embodiment of the present invention, the ion-beam apparatus takes the form of a gridless ion source with a hot-filament cathode-neutralizer, in which the hot filament is heated with a current from the cathode-neutralizer heater. The cathode-neutralizer is connected to the negative terminal of the discharge supply for the gridless ion source. This connection is substantially isolated from ground (the potential of the surrounding vacuum chamber, which is usually at earth ground) and its potential is measured relative to ground. The heater current to the cathode-neutralizer is controlled by adjusting it so as to maintain this potential in a narrow operating range. This control can be manual or automatic.

Abstract: In accordance with an embodiment of the invention, the apparatuses such as a vortex hydroseparator, a vortex vapor generator and a vortex catalytic generator are presented with the nozzle that serves as the exit port of a light liquid component separated from liquid mixture such as oil and water.

Abstract: In accordance with one specific embodiment of the present invention, a Hall-current ion source of the end-Hall type has an anode that is contoured with one or more recesses in the electron-collecting surface which have areas that are protected from the deposition of externally generated contamination thereon, as well as one or more protrusions that have higher temperatures than the bulk of the anode, thereby increasing the removal or passivation of coatings during operation by the thermal degradation of the coating and the effects of thermomechanical stresses.

Abstract: In one embodiment of a compact closed-drift ion source, an ionizable gas is introduced into a annular discharge region. An anode is at one end of this region and an electron-emitting cathode is near the opposite and open end. A magnetic circuit extends from an inner pole piece to an outer pole piece, with both pole pieces near the open end. The electron current in the discharge region interacts with the magnetic field therein to generate and accelerate ions out of the open end. A permeable enclosure surrounds the anode end of the discharge region. Adjacent elements of the permeable enclosure, the inner pole piece, and any intermediate permeable elements are in close proximity, one to the next. A magnetizing means is located only between the outer pole piece and the permeable enclosure.

Abstract: In one embodiment of a compact closed-drift ion source, an ionizable gas is introduced into a annular discharge region. An anode is at one end of this region and an electron-emitting cathode is near the opposite and open end. A magnetic circuit extends from an inner pole piece to an outer pole piece, with both pole pieces near the open end. The electron current in the discharge region interacts with the magnetic field therein to generate and accelerate ions out of the open end. A permeable enclosure surrounds the anode end of the discharge region. Adjacent elements of the permeable enclosure, the inner pole piece, and any intermediate permeable elements are in close proximity, one to the next. A magnetizing means is located only between the outer pole piece and the permeable enclosure.

Abstract: In accordance with an embodiment of the present invention, apparatus for ion-assisted magnetron deposition takes a form that includes a magnetron, a deposition substrate displaced from the magnetron, and an ion source also displaced from the magnetron and located so that the ion beam from the ion source is directed at the deposition substrate. The ion source is operated without an electron-emitting cathode-neutralizer, the electron current for this function being provided by electrons from the magnetron. In one specific embodiment, the ion source is operated so that the potential of the deposition substrate is maintained close to that of a common ground for the magnetron and the ion source. In another embodiment, the ion source is of the Hall-current type and the discharge current of the ion source is approximately equal in magnitude to the current of the magnetron discharge.

Abstract: In accordance with one specific embodiment of the present invention, an ion-beam deposition apparatus uses a plurality of stationary sputter targets so located so as to provide a predetermined thickness distribution of the target material on a substrate. This distribution is obtained without mechanical motion of ion sources, sputter targets, or a shaper located between the sputter targets and deposition substrate.

Abstract: In this invention the system and processes for organization of oil refinery from gases and heavy admixtures with a separation of purified oil for fractions obtained in the process of thermal distillation, and thermal and catalytic cracking and subsequent fine separation of products for narrow fractions are presented. The combining of vortex vapor generation processes of preliminary heated oil in the field of inertia forces of rotating liquid with condensation processes of gaseous products at reduced pressure in vortex vapor condensers with cooled walls with utilization of subsequent heating and productions of fuels with narrow fraction composition permits to obtain a high quality product.

Abstract: In accordance with one specific embodiment of the present invention, the closed drift hollow cathode comprises an axisymmetric discharge region into which an ionizable gas is introduced, an annular electron emitting cathode insert disposed laterally about that discharge region, a surrounding enclosure, an aperture in that enclosure disposed near the axis of symmetry and at one end of that region, and a magnetic field within that region which is both axisymmetric and generally disposed transverse to a path from the cathode insert to the aperture. An electrical discharge is established between the cathode insert and the enclosure. The electrons emitted from the cathode insert drift in closed paths around the axis, collide with molecules of ionizable gas, and sustain the discharge plasma by generating additional electron-ion pairs. Ions from the plasma bombard the cathode insert, thereby maintaining an emissive temperature.