Patents by Inventor Viatcheslav Safarov

Viatcheslav Safarov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9468920
    Abstract: The present invention relates to a method for manufacturing ultra-porous photocatalytic materials, to the ultra-porous photocatalytic materials obtained by such a method, as well as to the uses thereof for producing hydrogen, treating wastewater and polluted water, treating polluted air, or furthermore to the use of same as catalytic membranes in fuel cells. Finally, a last aim of the invention relates to articles chosen among hydrogen production devices, self-cleaning glass panes and antipollution walls.
    Type: Grant
    Filed: September 22, 2010
    Date of Patent: October 18, 2016
    Assignees: Aix-Marseille Universite, Faldes
    Inventors: François Arnaud D'Avitaya, Viatcheslav Safarov, Nadzeya Alexandrovna Zalatarevich
  • Publication number: 20120270722
    Abstract: The present invention relates to a method for manufacturing ultra-porous photocatalytic materials, to the ultra-porous photocatalytic materials obtained by such a method, as well as to the uses thereof for producing hydrogen, treating wastewater and polluted water, treating polluted air, or furthermore to the use of same as catalytic membranes in fuel cells. Finally, a last aim of the invention relates to articles chosen among hydrogen production devices, self-cleaning glass panes and antipollution walls.
    Type: Application
    Filed: September 22, 2010
    Publication date: October 25, 2012
    Applicants: FALDES, AIX-MARSEILLE UNIVERSITE
    Inventors: François Arnaud D'Avitaya, Viatcheslav Safarov, Nadzeya Alexandrovna Zalatarevich
  • Publication number: 20080199126
    Abstract: The method comprises emitting appropriate polarisation light waves on a photosensitive material for inducing therein a topographic modification through an aperture of at the most 100 mm bound by an opaque area, said layer being arranged at the most 100 mm away from the aperture.
    Type: Application
    Filed: February 5, 2008
    Publication date: August 21, 2008
    Applicant: ESSILOR INTERNATIONAL COMPAGNIE GENERAL D'OPTIQUE
    Inventors: Nathalie Landraud, Jacques Peretti, Frederic Chaput, Georges Lampel, Jean-Pierre Boilot, Khalid Lahlil, Viatcheslav Safarov
  • Patent number: 7352384
    Abstract: The invention generally concerns a method involving emitting polarization light waves through an aperture with a dimension of maximum size lower than or equal to 100 nm, wherein the aperture is circumferentially bound by an opaque area that prevents the light waves from being propagated outside the aperture during use, and wherein the emitted polarization light waves (1) contact a material layer comprising a photosensitive compound whose surface is located at a distance lower than 100 nm from said aperture, and (2) induce a topographic modification of the material layer. In this manner, a stable structure is printed in relief in the material layer without requiring any additional development step. The invention is applicable, in certain embodiments, to ophthalmic optics.
    Type: Grant
    Filed: July 26, 2002
    Date of Patent: April 1, 2008
    Assignee: Essilor International Compagnie Generale d'Optique
    Inventors: Nathalie Landraud, Jacques Peretti, Frédéric Chaput, Georges Lampel, Jean-Pierre Boilot, Khalid Lahlil, Viatcheslav Safarov
  • Publication number: 20040214115
    Abstract: A method for printing a near field photoinduced stable structure, and an optical fibre tip for implementing same.
    Type: Application
    Filed: January 26, 2004
    Publication date: October 28, 2004
    Inventors: Nathalie Landraud, Jacques Peretti, Frederic Chaput, Georges Lampel, Jean-Pierre Boilot, Khalid Lahlil, Viatcheslav Safarov