Patents by Inventor Vic B. Marriott

Vic B. Marriott has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Water soluble contrast enhancement composition and method of use
    Patent number: 5173390
    Abstract: A water soluble contrast enhancement compound and composition, and a method of use thereof, are disclosed for improving sidewall profiles in photoresist patterning and developing. The compound consists of a 1-oxy-2-diazonaphthalene sulfonamide salt.
    Type: Grant
    Filed: September 13, 1990
    Date of Patent: December 22, 1992
    Assignee: Texas Instruments Incorporated
    Inventors: John B. Covington, Vic B. Marriott, Larry G. Venable, Peter Kim
  • Water soluble contrast enhancement composition with 1-oxy-2 diazonaphthalene sulfonamide salt and polyvinyl alcohol
    Patent number: 4997742
    Abstract: A water soluble contrast enhancement compound and composition, and a method of use thereof, are disclosed for improving sidewall profiles in photoresist patterning and developing. The compound consists of a 1-oxy-2-diazonaphthalene sulfonamide salt.
    Type: Grant
    Filed: December 9, 1988
    Date of Patent: March 5, 1991
    Assignee: Texas Instruments Inc.
    Inventors: John B. Covington, Vic B. Marriott, Larry G. Venable, Peter Kim
  • Water soluble contrast enhancement layer method of forming resist image on semiconductor chip
    Patent number: 4816380
    Abstract: A water soluble contrast enhancement compound and composition, and a method of use thereof, are disclosed for improving sidewall profiles in photoresist patterning and developing. The compound consists of a 1-oxy-2-diazonaphthalene sulfonamide salt.
    Type: Grant
    Filed: June 27, 1986
    Date of Patent: March 28, 1989
    Assignee: Texas Instruments Incorporated
    Inventors: John B. Covington, Vic B. Marriott, Larry G. Venable, Peter Kim
  • Contact etch method
    Patent number: 4758305
    Abstract: A method for patterning small-geometry contacts with sloped sidewalls in integrated circuit fabrication. A multilayer resist process is used, and the spacer layer is undercut by overexposure and overdevelopment at the pattern transfer stage. This provides a cantilever etch mask structure, without the need to use any hardmask layers.
    Type: Grant
    Filed: March 11, 1986
    Date of Patent: July 19, 1988
    Assignee: Texas Instruments Incorporated
    Inventors: Thomas D. Bonifield, Vic B. Marriott, Rhett B. Jucha, Monte A. Douglas