Patents by Inventor Vicky Nguyen

Vicky Nguyen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and Methods for Cyclical Oxidation and Etching
    Publication number: 20110065276
    Abstract: Apparatus and methods for the manufacture of semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof are described herein. Disclosed are various single chambers configured to form and/or shape a material layer by oxidizing a surface of a material layer to form an oxide layer; removing at least some of the oxide layer by an etching process; and cyclically repeating the oxidizing and removing processes until the material layer is formed to a desired shape. In some embodiments, the material layer may be a floating gate of a semiconductor device.
    Type: Application
    Filed: March 10, 2010
    Publication date: March 17, 2011
    Applicant: Applied Materials, Inc.
    Inventors: Udayan Ganguly, Joseph M. Ranish, Aaron M. Hunter, Jing Tang, Christopher S. Olsen, Matthew D. Scotney-Castle, Vicky Nguyen, Swaminathan Srinivasan, Wei Liu, Johanes F. Swenberg, Shiyu Sun
  • Apparatus and Methods for Cyclical Oxidation and Etching
    Publication number: 20110061810
    Abstract: Apparatus and methods for the manufacture of semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof are described herein. Disclosed are various single chambers configured to form and/or shape a material layer by oxidizing a surface of a material layer to form an oxide layer; removing at least some of the oxide layer by an etching process; and cyclically repeating the oxidizing and removing processes until the material layer is formed to a desired shape. In some embodiments, the material layer may be a floating gate of a semiconductor device.
    Type: Application
    Filed: March 10, 2010
    Publication date: March 17, 2011
    Applicant: Applied Materials, Inc.
    Inventors: Udayan Ganguly, Joseph M. Ranish, Aaron M. Hunter, Jing Tang, Christopher S. Olsen, Matthew D. Scotney-Castle, Vicky Nguyen, Swaminathan Srinivasan, Johanes F. Swenberg, Anchuan Wang, Nitin K. Ingle, Manish Hemkar, Jose A. Marin
  • Apparatus and Methods for Cyclical Oxidation and Etching
    Publication number: 20110061812
    Abstract: Apparatus and methods for the manufacture of semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof are described herein. Disclosed are various single chambers configured to form and/or shape a material layer by oxidizing a surface of a material layer to form an oxide layer; removing at least some of the oxide layer by an etching process; and cyclically repeating the oxidizing and removing processes until the material layer is formed to a desired shape. In some embodiments, the material layer may be a floating gate of a semiconductor device.
    Type: Application
    Filed: March 10, 2010
    Publication date: March 17, 2011
    Applicant: Applied Materials, Inc.
    Inventors: Udayan Ganguly, Yoshitaka Yokota, Christopher S. Olsen, Matthew D. Scotney-Castle, Vicky Nguyen, Swaminathan Srinivasan, Wei Liu, Johanes F. Swenberg, Jose A. Marin, Aijit Balakrishna, Jacob Newman, Stephen C. Hickerson