Abstract: An apparatus that comprises a membrane having a plurality of fluid-support-structures and openings located between the fluid-support-structures. The fluid-support-structures have at least one dimension that that is about 1 millimeter or less. The apparatus also comprises a wicking material positioned adjacent to a surface of the membrane. When a fluid locatable on a surface of the fluid-support-structures penetrates the fluid-support-structures, at least a portion of the fluid passes through the openings and into the wicking material.

Abstract: Polyimide is used as a spacer that also bonds together the elements that it is spacing apart. This is achieved by constructing the spacer on at least one of the wafers as is conventionally done, except that prior to performing the final curing of the polyimide precursor to form the final polyimide, the elements are aligned in a bonder and placed in contact with a pressure of 40 grams per square millimeter at a temperature slightly higher than the soft-bake temperature, as specified by the manufacturer of the polyimide precursor, for few minutes to promote tackiness. This holds the elements together, and the combined structure is then baked to fully cure the polyimide precursor into polyimide and complete the bonding.

Abstract: A multilayer micromirror structure that exhibits substantially no form change as a result of a given change in temperature is disclosed. A reflective layer is disposed on a substrate layer, and a counterbalancing structure is disposed on the structure in a way such that a neutral plane is located at a predetermined position relative to the substrate layer and the reflective layer. When forces are exerted at the neutral plane of such a structure, the structure attains a predetermined geometric form. A method of manufacture is disclosed wherein a substrate is etched to define a desired structure and a conformal layer of a masking material is deposited onto the etched substrate. Further etching exposes portions of the substrate and silicon is deposited to achieve another desired structure. Excess material is etched away to free the finished structure and a reflective layer is deposited onto the surface of the structure.

Abstract: Apparatus comprising a first polymer layer carrying positively charged moieties and a net positive charge; a second polymer layer carrying negatively charged moieties and a net negative charge; and a dielectric substrate; the first and second polymer layers constituting a multilayer coating on the dielectric substrate. Method for fabrication of an electrostatic charge dissipation coating comprising steps of providing a dielectric substrate susceptible to electrostatic charge accumulation; coating the dielectric substrate with a first polymer carrying charged moieties and a net charge having a first sign; and then coating the dielectric substrate with a second polymer carrying charged moieties and a net charge having a second sign opposite to the first sign.

Abstract: Polyimide is used as a spacer that also bonds together the elements that it is spacing apart. This is achieved by constructing the spacer on at least one of the wafers as is conventionally done, except that prior to performing the final curing of the polyimide precursor to form the final polyimide, the elements are aligned in a bonder and placed in contact with a pressure of 40 grams per square millimeter at a temperature slightly higher than the soft-bake temperature, as specified by the manufacturer of the polyimide precursor, for few minutes to promote tackiness. This holds the elements together, and the combined structure is then baked to fully cure the polyimide precursor into polyimide and complete the bonding.

Abstract: A multilayer micromirror structure that exhibits substantially no form change as a result of a given change in temperature is disclosed. A reflective layer is disposed on a substrate layer, and a counterbalancing structure is disposed on the structure in a way such that a neutral plane is located at a predetermined position relative to the substrate layer and the reflective layer. When forces are exerted at the neutral plane of such a structure, the structure attains a predetermined geometric form. A method of manufacture is disclosed wherein a substrate is etched to define a desired structure and a conformal layer of a masking material is deposited onto the etched substrate. Further etching exposes portions of the substrate and silicon is deposited to achieve another desired structure. Excess material is etched away to free the finished structure and a reflective layer is deposited onto the surface of the structure.