Abstract: A radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture comprises a polymer having appendent azide-substituted aromatic ester groups and sulphonyl urethane groups. The radiation sensitive compound is produced by a process in which some hydroxyl and/or epoxide groups of a polymer are reacted with an azide substituted carboxylic acid or ester forming derivative thereof, and some hydroxyl groups are reacted with a sulphonyl isocyanate.

Abstract: A radiation-sensitive compound, which comprises a polymer including a plurality of azide-substituted aromatic ester groups and a plurality of carboxylic or sulphonic acid groups capable of imparting to the compound solubility in aqueous or alkaline medium. After image-wise exposure, the compound can be developed using an aqueous or alkaline developer. The compound is useful in the production of radiation sensitive plates for the manufacture of lithographic printing plates which can be baked to improve printing life.

Abstract: Polymeric compounds comprise groups of the formula ##STR1## attached to carbon atoms of a polymer containing hydroxyl and optionally epoxide groups wherein X is ##STR2## The compounds are produced by reacting a starting polymer, which contains hydroxy groups and optionally epoxide groups with a reagent containing a cyclic anhydride group and a further functional group capable of reacting with the hydroxyl (and/or epoxide) groups preferentially to the anhydride group. The compounds are useful as bakeable support resins for radiation sensitive compounds in the production of printing plates.

Abstract: A radiation sensitive compound and method for making same. The compound has the general formula: ##STR1## wherein, R.sup.1 and R.sup.2, which may be the same or different, each represents lower alkyl, aryl, X, CHX.sub.2, CH.sub.2 X, CX.sub.3 or NHR.sup.3 wherein R.sup.3 represents hydrogen, lower alkyl, aryl or ##STR2## and provided at least one of R.sup.1 and R.sup.2 is CX.sub.3, X is halogen, and A.sup.1 and A.sup.2 are each residues of A.sup.1 --H and A.sup.2 --H respectively wherein A.sup.1 --H and A.sup.2 --H which may be the same or different are each compounds containing at least one group having an active hydrogen atom. The method comprises reacting together an isocyanate of the formula ##STR3## with a compound of the formula A.sup.1 --H or A.sup.2 --H to obtain the desired compound wherein R.sup.1 or R.sup.4 represents lower alkyl, aryl, X, CHX.sub.2, CX.sub.3, NCO or NHR.sup.5 wherein R.sup.5 represents hydrogen, lower alkyl or aryl and at least one of R.sup.1 and R.sup.4 is CX.sub.3.