Patents by Inventor Victor S. Wang

Victor S. Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6362071
    Abstract: In accordance with one embodiment of the present invention, a method is disclosed for forming a semiconductor device having an isolation region (601). A dielectric layer (108) is deposited and etched to form isolation regions (102, 605) having top portions that are narrower than their bottom portions, thereby a tapered isolation region is formed. Active regions (601, 603) are formed using an epitaxial process in the regions between the isolation regions. The resulting active regions (601, 603) have a greater amount of surface area near a top portion, than near a bottom portion. Transistors (721, 723) having opposite polarities are formed within the active areas.
    Type: Grant
    Filed: April 5, 2000
    Date of Patent: March 26, 2002
    Assignee: Motorola, Inc.
    Inventors: Bich-Yen Nguyen, William J. Taylor, Jr., Philip J. Tobin, David L. O'Meara, Percy V. Gilbert, Yeong-Jyh T. Lii, Victor S. Wang
  • Patent number: D722128
    Type: Grant
    Filed: January 9, 2014
    Date of Patent: February 3, 2015
    Inventors: Roger H. Wang, Victor S. Wang
  • Patent number: D747940
    Type: Grant
    Filed: September 29, 2014
    Date of Patent: January 26, 2016
    Inventors: Roger H. Wang, Eric I. Wang, Victor S. Wang
  • Patent number: D783766
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: April 11, 2017
    Inventors: Roger H. Wang, Victor S. Wang, Eric I. Wang