Patents by Inventor Victor V. Luu

Victor V. Luu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7987150
    Abstract: Automated defect sourcing systems identify root-causes of yield excursions due to contamination, process faults, equipment failure and/or handling. They perform this function in timely manner and provide accurate and timely feedback to address and contain the sources of yield excursion. A signature repository stores known wafer surface manufacturing defect types as set of rules. The signature of a manufacturing defect pattern is associated with the equipment or process that causes the defects, and is used to source the manufacturing defects and to provide process control for changing and/or stopping yield excursion during fabrication. A defect signature rule-based engine matches wafer defects against the signature repository during wafer fabrication. Once the defect signature is detected during fabrication, handling and/or disposing the root-cause of the corresponding defect is facilitated using messages according to an event handling database.
    Type: Grant
    Filed: September 4, 2007
    Date of Patent: July 26, 2011
    Assignee: SIGLaz
    Inventors: Victor V. Luu, John Poreda, Thieu Nguyen Trinh, Phong Van Nguyen, Luan Thien Dinh, Khoa Pham Dang Truong
  • Patent number: 7229845
    Abstract: Automated defect sourcing system identifies root-causes of yield excursion due to contamination, process faults, equipment failure and/or handling in timely manner and provides accurate timely feedback to address and contain the sources of yield excursion. A signature bank stores known wafer surface manufacturing defects as defect signatures. The signature of a manufacturing defect pattern is associated with a type of equipment or process, and used to source the manufacturing defects and to provide process control for changing and/or stopping yield excursion during fabrication. A defect signature recognition engine matches wafer defects against the signature bank during wafer fabrication. Once the defect signature is detected during fabrication, handling and/or disposing the root-cause of the corresponding defect is facilitated using messages according to an event handling database. Optionally, a real-time process control for wafer fabrication is provided.
    Type: Grant
    Filed: January 26, 2004
    Date of Patent: June 12, 2007
    Assignee: Si Glaz
    Inventors: Victor V. Luu, John Poreda