Patents by Inventor Victoria Kithcart

Victoria Kithcart has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for creating strong interface between in-situ SACVD and PECVD silicon oxide films
    Patent number: 6009827
    Abstract: A method and apparatus for ramping down the deposition pressure in a SACVD process. The present invention also provides a method and apparatus for subsequently ramping up the pressure for a PECVD process in such a manner as to prevent unwanted reactions which could form a weak interlayer interface. In particular, the deposition pressure in the SACVD process is ramped down by stopping the flow of the silicon containing gas (preferably TEOS) and/or the carrier gas (preferably helium), while diluting the flow of ozone with oxygen. A ramp down of the pressure starts at the same time. The diluting of the ozone with oxygen limits reactions with undesired reactants at the end of a process.
    Type: Grant
    Filed: November 5, 1996
    Date of Patent: January 4, 2000
    Assignee: Applied Materials, Inc.
    Inventors: Stuardo Robles, Visweswaren Sivaramakrishnan, Maria Galiano, Victoria Kithcart
  • Method and apparatus for creating strong interface between in-situ SACVD and PECVD silicon oxide films
    Patent number: 5814377
    Abstract: A method and apparatus for ramping down the deposition pressure in a SACVD process. The present invention also provides a method and apparatus for subsequently ramping up the pressure for a PECVD process in such a manner as to prevent unwanted reactions which could form a weak interlayer interface. In particular, the deposition pressure in the SACVD process is ramped down by stopping the flow of the silicon containing gas (preferably TEOS) and/or the carrier gas (preferably helium), while diluting the flow of ozone with oxygen. A ramp down of the pressure starts at the same time. The diluting of the ozone with oxygen, limits reactions with undesired reactants at the end of a process.
    Type: Grant
    Filed: July 8, 1997
    Date of Patent: September 29, 1998
    Assignee: Applied Materials, Inc.
    Inventors: Stuardo Robles, Visweswaren Sivaramakrishnan, Maria Galiano, Victoria Kithcart