Patents by Inventor Victoria L. Hall

Victoria L. Hall has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Non-planar magnet tracking during magnetron sputtering
    Patent number: 5855744
    Abstract: The structure and method which improves the film thickness uniformity or thickness control when using magnetron sputtering by adjusting the distance between the magnetron or a portion of the magnetron and the sputtering target to provide an improvement in the film thickness uniformity. Shimmed rails, contoured rails, contoured surfaces, cam plates, and cam plate control followers are utilized to achieve an improvement in film thickness uniformity or thickness control due to anomalies in magnetic field as a magnetron assembly moves back and forth when sputtering substrates (utilized primarily for rectangularly shaped substrates).
    Type: Grant
    Filed: July 19, 1996
    Date of Patent: January 5, 1999
    Assignee: Applied Komatsu Technology, Inc.
    Inventors: Harlan I. Halsey, Richard E. Demaray, Russell Black, Akihiro Hosokawa, Allan De Salvo, Victoria L. Hall