Patents by Inventor Vidhya Krishnamurthi

Vidhya Krishnamurthi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260097235
    Abstract: Example methods and systems for image data processing for radiation therapy are provided. In one example, a computer system may obtain planning image data that is generated using an imaging source to emit an imaging beam towards a patient and a detector to image a target structure within the patient during a pre-treatment phase of radiation therapy. Based on the planning image data, the computer system may generate at least one of (a) phase-contrast image data associated with the target structure and (b) dark-field image data associated with the target structure. The computer system may generate template image data associated with the target structure by processing at least one of the following: (a) the phase-contrast image data, (b) the dark-field image data and (c) derived image data that is generated based on the phase-contrast image data or the dark-field image data.
    Type: Application
    Filed: October 4, 2024
    Publication date: April 9, 2026
    Applicant: SIEMENS HEALTHINEERS INTERNATIONAL AG
    Inventors: Vidhya KRISHNAMURTHI, Jörg FREUDENBERGER, Thomas WEBER, Michael FOLKERTS
  • Publication number: 20260054094
    Abstract: Example methods and systems for target structure tracking are provided. In one example, a computer system may obtain projection image data that is generated using an imaging source to emit an imaging beam towards a patient and a detector to image a target structure within the patient during a treatment phase of radiation therapy. Based on the projection image data, the computer system may generate at least one of (a) phase-contrast image data associated with the target structure and (b) dark-field image data associated with the target structure. The computer system may determine position data associated with the target structure by processing at least one of the following: (a) the phase-contrast image data, (b) the dark-field image data and (c) derived image data that is generated based on the phase-contrast image data or the dark-field image data, thereby tracking the target structure during the treatment phase of the radiation therapy.
    Type: Application
    Filed: August 20, 2024
    Publication date: February 26, 2026
    Applicant: SIEMENS HEALTHINEERS INTERNATIONAL AG
    Inventors: Vidhya KRISHNAMURTHI, Jörg FREUDENBERGER, Thomas WEBER, Michael FOLKERTS
  • Patent number: 12403328
    Abstract: One or more new metrics are introduced into the treatment planning process. More specifically, a correcting factor/metric referred to herein as the critical/repair ratio index is introduced, and/or a correcting factor/metric referred to herein as the spatial periodicity of critical isodose value is introduced. By using these metrics, the expected sparing from the spatial distribution of dose is better accounted for in treatment modalities including spatially fractionated radiation therapy (SFRT) in general and SFRT with ultra-high dose rates in particular. According to a treatment planning strategy, the target can be covered by a Spread-Out Bragg Peak, to optimize and/or homogenize the dose distribution at the target level but still benefit from the sparing effect of SFRT at the healthy tissue level. Delivery techniques include a dynamic focusing technique and a magnetic beam steering technique. Enhancing dose rate enables maximizing the peak-to-valley dose distribution with SFRT despite patient motion.
    Type: Grant
    Filed: September 21, 2022
    Date of Patent: September 2, 2025
    Assignee: SIEMENS HEALTHINEERS INTERNATIONAL AG
    Inventors: Gael Boivin, Michael Folkerts, Sophia Pfister, Marta Vilalta, Vidhya Krishnamurthi, Ricky Anupam Sharma
  • Publication number: 20240091559
    Abstract: One or more new metrics are introduced into the treatment planning process. More specifically, a correcting factor/metric referred to herein as the critical/repair ratio index is introduced, and/or a correcting factor/metric referred to herein as the spatial periodicity of critical isodose value is introduced. By using these metrics, the expected sparing from the spatial distribution of dose is better accounted for in treatment modalities including spatially fractionated radiation therapy (SFRT) in general and SFRT with ultra-high dose rates in particular. According to a treatment planning strategy, the target can be covered by a Spread-Out Bragg Peak, to optimize and/or homogenize the dose distribution at the target level but still benefit from the sparing effect of SFRT at the healthy tissue level. Delivery techniques include a dynamic focusing technique and a magnetic beam steering technique. Enhancing dose rate enables maximizing the peak-to-valley dose distribution with SFRT despite patient motion.
    Type: Application
    Filed: September 21, 2022
    Publication date: March 21, 2024
    Inventors: Gael BOIVIN, Michael FOLKERTS, Sophia PFISTER, Marta VILALTA, Vidhya KRISHNAMURTHI, Ricky Anupam SHARMA
  • Patent number: 11541252
    Abstract: The dose rate of voxels within a particle beam (e.g., proton beam) treatment field delivered using pencil beam scanning (PBS) is calculated, and a representative dose rate for the particle beam treatment field is reported. The calculations account for a dose accumulation in a local region or a sub-volume (e.g., a voxel) as a function of time.
    Type: Grant
    Filed: June 23, 2020
    Date of Patent: January 3, 2023
    Assignee: Varian Medical Systems, Inc.
    Inventors: Michael Folkerts, Eric Abel, Simon Busold, Jessica Perez, Vidhya Krishnamurthi, C. Clifton Ling
  • Publication number: 20210393981
    Abstract: The dose rate of voxels within a particle beam (e.g., proton beam) treatment field delivered using pencil beam scanning (PBS) is calculated, and a representative dose rate for the PBS treatment field is reported. The calculations account for dose accumulation in a local region or sub-volume (e.g., a voxel) as a function of time.
    Type: Application
    Filed: June 23, 2020
    Publication date: December 23, 2021
    Inventors: Michael FOLKERTS, Eric ABEL, Simon BUSOLD, Jessica PEREZ, Vidhya KRISHNAMURTHI, C. Clifton LING
  • Patent number: 6563124
    Abstract: An electron beam apparatus is capable of registering an image on a substrate. The apparatus comprises a vacuum chamber having a wall. Electron beam source, modulator, and detector components are adapted to generate, modulate and detect an array of electron beams in the vacuum chamber. A circuit board passing through the wall of the vacuum chamber has a plurality of electrical traces to connect to the electron beam source, modulator, and detector components.
    Type: Grant
    Filed: March 21, 2001
    Date of Patent: May 13, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Lee Veneklasen, Vidhya Krishnamurthi, Gil Winograd
  • Patent number: 6538256
    Abstract: A method and system for electron beam lithography at high throughput with shorter electron beam column length, reduced electron-electron interactions, and higher beam current. The system includes a photocathode having a pattern composed of a periodic array of apertures with a specific geometry. The spacing of the apertures is chosen so as to maximize the transmission of the laser beam through apertures significantly smaller than the photon wavelength. The patterned photocathode is illuminated by an array of laser beams to allow blanking and gray-beam modulation of the individual beams at the source level by the switching of the individual laser beams in the array. Potential applications for this invention include electron beam direct write on wafers and mask patterning.
    Type: Grant
    Filed: August 17, 2000
    Date of Patent: March 25, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Marian Mankos, Vidhya Krishnamurthi, Kim Y. Lee
  • Publication number: 20020134912
    Abstract: An electron beam apparatus is capable of registering an image on a substrate. The apparatus comprises a vacuum chamber having a wall. Electron beam source, modulator, and detector components are adapted to generate, modulate and detect an array of electron beams in the vacuum chamber. A circuit board passing through the wall of the vacuum chamber has a plurality of electrical traces to connect to the electron beam source, modulator, and detector components.
    Type: Application
    Filed: March 21, 2001
    Publication date: September 26, 2002
    Applicant: Applied Materials, Inc.
    Inventors: Lee Veneklasen, Vidhya Krishnamurthi, Gil Winograd, Mary Veneklasen