Patents by Inventor Vidyadharan Srinivasa Murthy BANGALORE

Vidyadharan Srinivasa Murthy BANGALORE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate support assemblies and components
    Patent number: 11699602
    Abstract: Exemplary substrate support assemblies may include a platen characterized by a first surface configured to support a semiconductor substrate. The assemblies may include a first stem section coupled with a second surface of the platen opposite the first surface of the platen. The assemblies may include a second stem section coupled with the first stem section. The second stem section may include a housing and a rod holder disposed within the housing. The second stem section may include a connector seated within the rod holder at a first end of the connector. The second stem section may include a heater rod disposed within the first end of the connector and a heater extension rod coupled with the connector at a second end of the connector. The second stem section may include an RF rod and an RF strap coupling the RF rod with an RF extension rod.
    Type: Grant
    Filed: July 7, 2020
    Date of Patent: July 11, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Jian Li, Edward P. Hammond, Viren Kalsekar, Vidyadharan Srinivasa Murthy Bangalore, Juan Carlos Rocha-Alvarez
  • Lid assembly apparatus and methods for substrate processing chambers
    Patent number: 11598004
    Abstract: The present disclosure relates to a lid assembly apparatus and related methods for substrate processing chambers. In one implementation, a lid assembly includes a gas manifold. The gas manifold includes a first gas channel configured to receive a process gas, a second gas channel configured to receive a doping gas, and a third gas channel configured to receive a cleaning gas. The lid assembly also includes a showerhead. The showerhead includes one or more first gas openings that are configured to receive the process gas, and one or more second gas openings that are configured to receive the doping gas.
    Type: Grant
    Filed: February 26, 2020
    Date of Patent: March 7, 2023
    Assignee: APPLIED MATERIALS, iNC.
    Inventors: Hanish Kumar Panavalappil Kumarankutty, Prashant A. Desai, Diwakar N. Kedlaya, Sumit Agarwal, Vidyadharan Srinivasa Murthy Bangalore, Truong Nguyen, Zubin Huang
  • SUBSTRATE SUPPORT ASSEMBLIES AND COMPONENTS
    Publication number: 20220013373
    Abstract: Exemplary substrate support assemblies may include a platen characterized by a first surface configured to support a semiconductor substrate. The assemblies may include a first stem section coupled with a second surface of the platen opposite the first surface of the platen. The assemblies may include a second stem section coupled with the first stem section. The second stem section may include a housing and a rod holder disposed within the housing. The second stem section may include a connector seated within the rod holder at a first end of the connector. The second stem section may include a heater rod disposed within the first end of the connector and a heater extension rod coupled with the connector at a second end of the connector. The second stem section may include an RF rod and an RF strap coupling the RF rod with an RF extension rod.
    Type: Application
    Filed: July 7, 2020
    Publication date: January 13, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Jian Li, Edward P. Hammond, Viren Kalsekar, Vidyadharan Srinivasa Murthy Bangalore, Juan Carlos Rocha-Alvarez
  • LID ASSEMBLY APPARATUS AND METHODS FOR SUBSTRATE PROCESSING CHAMBERS
    Publication number: 20200291522
    Abstract: The present disclosure relates to a lid assembly apparatus and related methods for substrate processing chambers. In one implementation, a lid assembly includes a gas manifold. The gas manifold includes a first gas channel configured to receive a process gas, a second gas channel configured to receive a doping gas, and a third gas channel configured to receive a cleaning gas. The lid assembly also includes a showerhead. The showerhead includes one or more first gas openings that are configured to receive the process gas, and one or more second gas openings that are configured to receive the doping gas.
    Type: Application
    Filed: February 26, 2020
    Publication date: September 17, 2020
    Inventors: Hanish Kumar PANAVALAPPIL KUMARANKUTTY, Prashant A. DESAI, Diwakar N. KEDLAYA, Sumit AGARWAL, Vidyadharan Srinivasa Murthy BANGALORE, Truong NGUYEN, Zubin HUANG