Patents by Inventor Vijay Kumar Badam

Vijay Kumar Badam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for liquid treatment of disc-shaped articles and heating system for use in such apparatus
    Patent number: 9748120
    Abstract: An apparatus for treating a disc-shaped article comprises a spin chuck and at least three individually controllable infrared heating elements. The infrared heating elements are mounted in a stationary manner with respect to rotation of said spin chuck. The infrared heating elements are arranged in a nested configuration so as to define individually controllable inner, middle and outer heating zones adjacent a disc-shaped article when positioned on the spin chuck.
    Type: Grant
    Filed: July 1, 2013
    Date of Patent: August 29, 2017
    Assignee: LAM RESEARCH AG
    Inventors: Kevin Matthew Crabb, Philipp Engesser, Vijay Kumar Badam
  • Apparatus for liquid treatment of wafer shaped articles and heating system for use in such apparatus
    Patent number: 9685358
    Abstract: An apparatus for treating a disc-shaped article comprises a spin chuck and at least three individually controllable infrared heating elements. The infrared heating elements are mounted in a stationary manner with respect to rotation of said spin chuck. At least the transparent plate positioned between the infrared heating elements and the underside of a wafer is mounted for rotation with the spin chuck. Alternatively, the transparent plate is part of a housing that encloses the infrared heating elements and that rotates with the spin chuck as the heating elements are stationary relative thereto.
    Type: Grant
    Filed: January 5, 2016
    Date of Patent: June 20, 2017
    Assignee: Lam Research AG
    Inventors: Ante Plazonic, Vijay Kumar Badam, Michael Brugger
  • APPARATUS FOR LIQUID TREATMENT OF WAFER SHAPED ARTICLES AND HEATING SYSTEM FOR USE IN SUCH APPARATUS
    Publication number: 20160118278
    Abstract: An apparatus for treating a disc-shaped article comprises a spin chuck and at least three individually controllable infrared heating elements. The infrared heating elements are mounted in a stationary manner with respect to rotation of said spin chuck. At least the transparent plate positioned between the infrared heating elements and the underside of a wafer is mounted for rotation with the spin chuck. Alternatively, the transparent plate is part of a housing that encloses the infrared heating elements and that rotates with the spin chuck as the heating elements are stationary relative thereto.
    Type: Application
    Filed: January 5, 2016
    Publication date: April 28, 2016
    Inventors: Ante Plazonic, Vijay Kumar Badam, Michael Brugger
  • Apparatus for liquid treatment of wafer shaped articles and heating system for use in such apparatus
    Patent number: 9245777
    Abstract: An apparatus for treating a disc-shaped article comprises a spin chuck and at least three individually controllable infrared heating elements. The infrared heating elements are mounted in a stationary manner with respect to rotation of said spin chuck. At least the transparent plate positioned between the infrared heating elements and the underside of a wafer is mounted for rotation with the spin chuck. Alternatively, the transparent plate is part of a housing that encloses the infrared heating elements and that rotates with the spin chuck as the heating elements are stationary relative thereto.
    Type: Grant
    Filed: May 15, 2013
    Date of Patent: January 26, 2016
    Assignee: LAM RESEARCH AG
    Inventors: Ante Plazonic, Vijay Kumar Badam, Michael Brugger
  • APPARATUS FOR LIQUID TREATMENT OF DISC-SHAPED ARTICLES AND HEATING SYSTEM FOR USE IN SUCH APPARATUS
    Publication number: 20150001202
    Abstract: An apparatus for treating a disc-shaped article comprises a spin chuck and at least three individually controllable infrared heating elements. The infrared heating elements are mounted in a stationary manner with respect to rotation of said spin chuck. The infrared heating elements are arranged in a nested configuration so as to define individually controllable inner, middle and outer heating zones adjacent a disc-shaped article when positioned on the spin chuck.
    Type: Application
    Filed: July 1, 2013
    Publication date: January 1, 2015
    Inventors: Kevin Matthew CRABB, Philipp ENGESSER, Vijay Kumar BADAM
  • APPARATUS FOR LIQUID TREATMENT OF WAFER SHAPED ARTICLES AND HEATING SYSTEM FOR USE IN SUCH APPARATUS
    Publication number: 20140339215
    Abstract: An apparatus for treating a disc-shaped article comprises a spin chuck and at least three individually controllable infrared heating elements. The infrared heating elements are mounted in a stationary manner with respect to rotation of said spin chuck. At least the transparent plate positioned between the infrared heating elements and the underside of a wafer is mounted for rotation with the spin chuck. Alternatively, the transparent plate is part of a housing that encloses the infrared heating elements and that rotates with the spin chuck as the heating elements are stationary relative thereto.
    Type: Application
    Filed: May 15, 2013
    Publication date: November 20, 2014
    Applicant: LAM RESEARCH AG
    Inventors: Ante PLAZONIC, Vijay Kumar BADAM, Michael BRUGGER
  • Lithographic apparatus, removable member and device manufacturing method
    Patent number: 8823919
    Abstract: A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.
    Type: Grant
    Filed: November 15, 2010
    Date of Patent: September 2, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Nina Vladimirovna Dziomkina, Roelof Frederik De Graaf, Marcus Adrianus Van De Kerkhof, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Gerardus Martinus Antonius De Rooij, Martijn Houben, Vijay Kumar Badam, Johanna Antoinette Maria Sondag-Huethorst, Niek Elout De Kruijf
  • Lithographic apparatus and device manufacturing method
    Patent number: 8780321
    Abstract: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
    Type: Grant
    Filed: December 4, 2009
    Date of Patent: July 15, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Thijs Egidius Johannes Knaapen, Richard Joseph Bruls, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Martijn Hendrik Kamphuis, Paulus Martinus Maria Liebregts, Rudolf Adrianus Joannes Maas, Marco Koert Stavenga, Coen Cornelis Wilhelmus Verspaget, Rudy Jan Maria Pellens, Jan Cornelis Van Der Hoeven, David Lucien Anstotz, Gert-Jan Gerardus Johannes Thomas Brands, Marcus Johannes Van Der Zanden, Vijay Kumar Badam, Casper Roderik De Groot
  • Lithographic apparatus, removable member and device manufacturing method
    Patent number: 8659741
    Abstract: A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.
    Type: Grant
    Filed: November 15, 2010
    Date of Patent: February 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Roelof Frederik De Graaf, Marcus Adrianus Van De Kerkhof, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Gerardus Martinus Antonius De Rooij, Martijn Houben, Nina Vladimirovna Dziomkina, Johanna Antoinette Maria Sondag-Huethorst, Niek Elout De Kruijf, Vijay Kumar Badam
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110273679
    Abstract: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
    Type: Application
    Filed: July 20, 2011
    Publication date: November 10, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thijs Egidius Johannes Knaapen, Richard Joseph Bruls, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Martijn Hendrik Kamphuis, Paulus Martinus Maria Liebregts, Rudolf Adrianus Joannes Maas, Marco Koert Stavenga, Coen Cornelis Wilhelmus Verspaget, Rudy Jan Maria Pellens, Jan Cornelis Van Der Hoeven, David Lucien Anstotz, Gert-Jan Gerardus Johannes Thomas Brands, Marcus Johannes Van Der Zanden, Vijay Kumar Badam, Casper Roderik De Groot
  • LITHOGRAPHIC APPARATUS, REMOVABLE MEMBER AND DEVICE MANUFACTURING METHOD
    Publication number: 20110199592
    Abstract: A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.
    Type: Application
    Filed: November 15, 2010
    Publication date: August 18, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Roelof Frederik De Graff, Marcus Adrianus Van De Kerkhof, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Gerardus Martinus Antonius De Rooij, Martijn Houben, Nina Vladimirovna Dziomkina, Johanna Antoinette Maria Sondag-Huethorst, Niek Elout De Kruijf, Vijay Kumar Badam
  • LITHOGRAPHIC APPARATUS, REMOVABLE MEMBER AND DEVICE MANUFACTURING METHOD
    Publication number: 20110116060
    Abstract: A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.
    Type: Application
    Filed: November 15, 2010
    Publication date: May 19, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Nina Vladimirovna Dziomkina, Roelof Frederik De Graaf, Marcus Adrianus Van De Kerkhof, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Gerardus Martinus Antonius De Rooij, Martijn Houben, Vijay Kumar Badam, Johanna Antoinette Maria Sondag-Huethorst, Niek Elout De Kruijf
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100157260
    Abstract: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
    Type: Application
    Filed: December 4, 2009
    Publication date: June 24, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thijs Egidius Johannes KNAAPEN, Richard Joseph Bruls, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Martijn Hendrik Kamphuis, Paulus Martinus Maria Liebregts, Rudolf Adrianus Joannes Maas, Marco Koert Stavenga, Coen Cornelis Wilhelmus Verspaget, Rudy Jan Maria Pellens, Jan Cornelis Van Der Hoeven, David Lucien Anstotz, Gert-Jan Gerardus Johannes Thomas Brands, Marcus Johannes Van Der Zanden, Vijay Kumar Badam, Casper Roderik De Groot