Patents by Inventor Vijay Vittal Parsi SREENIVAS

Vijay Vittal Parsi SREENIVAS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process and device for producing at least one photonic component
    Patent number: 8937024
    Abstract: A process for producing at least one photonic component (32, 33, 35, 39, 41), includes inserting the photonic component (32, 33, 35, 39, 41) into a surface layer (12) of a semiconductor wafer and/or within a semiconductor wafer, especially of a semiconductor chip (11, 31, 34, 38, 40) for the simpler and more cost-effective production with the most desired possible three-dimensional structures. At least one laser beam (22) is coupled into the material of the surface layer (12) and/or of the semiconductor wafer, in which the laser beam (22) is focused at a predetermined depth in the material. At least one property of the material and/or the material structure is changed in the area of focus (23, 36).
    Type: Grant
    Filed: September 20, 2012
    Date of Patent: January 20, 2015
    Assignee: BIAS Bremer Institut für angewandte Strahltechnik GmbH
    Inventors: Ralf Bergmann, Mike Bülters, Vijay Vittal Parsi Sreenivas
  • PROCESS AND DEVICE FOR PRODUCING AT LEAST ONE PHOTONIC COMPONENT
    Publication number: 20130183775
    Abstract: A process for producing at least one photonic component (32, 33, 35, 39, 41), includes inserting the photonic component (32, 33, 35, 39, 41) into a surface layer (12) of a semiconductor wafer and/or within a semiconductor wafer, especially of a semiconductor chip (11, 31, 34, 38, 40) for the simpler and more cost-effective production with the most desired possible three-dimensional structures. At least one laser beam (22) is coupled into the material of the surface layer (12) and/or of the semiconductor wafer, in which the laser beam (22) is focused at a predetermined depth in the material. At least one property of the material and/or the material structure is changed in the area of focus (23, 36).
    Type: Application
    Filed: September 20, 2012
    Publication date: July 18, 2013
    Applicant: BIAS Bremer Institut fur angewandte Strahltechnik GmbH
    Inventors: Ralf BERGMANN, Mike Bülters, Vijay Vittal Parsi SREENIVAS