Abstract: Disclosed are embodiments of a thin-film photovoltaic technology including a single-junction crystalline silicon solar cell with a photonic-plasmonic back-reflector structure for lightweight, flexible energy conversion applications. The back-reflector enables high absorption for long-wavelength and near-infrared photons via diffraction and light-concentration, implemented by periodic texturing of the bottom-contact layer by nanoimprint lithography. The thin-film crystalline silicon solar cell is implemented in a heterojunction design with amorphous silicon, where plasma enhanced chemical vapor deposition (PECVD) is used for all device layers, including a low-temperature crystalline silicon deposition step. Excimer laser crystallization is used to integrate crystalline and amorphous silicon within a monolithic process, where a thin layer of amorphous silicon is converted to a crystalline silicon seed layer prior to deposition of a crystalline silicon absorber layer via PECVD.

Abstract: A planar plasmonic device includes a first material layer having a surface configured to receive at least one photon of incident light. A patterned plasmonic nanostructured layer is disposed adjacent and optically coupled to the first material layer. The patterned plasmonic nanostructured layer includes a selected one of: a) at least a portion of a surface of the patterned plasmonic nanostructured layer includes a textured surface, and b) at least one compound nanofeature including a first material disposed adjacent to a second material within the compound nanofeature.