Patents by Inventor Vikrant Agnihotri
Vikrant Agnihotri has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20160079060Abstract: A technique for forming nanostructures including introducing a plurality of molecular-size scale and/or nanoscale building blocks to a region near a substrate and simultaneously scanning a pattern on the substrate with an energy beam, wherein the energy beam causes a change in at least one physical property of at least a portion of the building blocks, such that a probability of the portion of the building blocks adhering to the pattern scanned by the energy beam is increased, and wherein the building blocks adhere to the pattern to form the structure. The energy beam and at least a portion of the building blocks may interact by electrostatic interaction to form the structure.Type: ApplicationFiled: June 30, 2015Publication date: March 17, 2016Applicant: Massachusetts Institute of TechnologyInventors: Joseph M. Jacobson, David Kong, Vikas Anant, Ashley Salomon, Saul Griffith, Will DelHagen, Vikrant Agnihotri
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Patent number: 9070556Abstract: A technique for forming nanostructures including introducing a plurality of molecular-size scale and/or nanoscale building blocks to a region near a substrate and simultaneously scanning a pattern on the substrate with an energy beam, wherein the energy beam causes a change in at least one physical property of at least a portion of the building blocks, such that a probability of the portion of the building blocks adhering to the pattern scanned by the energy beam is increased, and wherein the building blocks adhere to the pattern to form the structure. The energy beam and at least a portion of the building blocks may interact by electrostatic interaction to form the structure.Type: GrantFiled: January 20, 2015Date of Patent: June 30, 2015Assignee: Massachusetts Institute of TechnologyInventors: Joseph M. Jacobson, David Kong, Vikas Anant, Ashley Salomon, Saul Griffith, Will DelHagen, Vikrant Agnihotri
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Publication number: 20150132928Abstract: A technique for forming nanostructures including introducing a plurality of molecular-size scale and/or nanoscale building blocks to a region near a substrate and simultaneously scanning a pattern on the substrate with an energy beam, wherein the energy beam causes a change in at least one physical property of at least a portion of the building blocks, such that a probability of the portion of the building blocks adhering to the pattern scanned by the energy beam is increased, and wherein the building blocks adhere to the pattern to form the structure. The energy beam and at least a portion of the building blocks may interact by electrostatic interaction to form the structure.Type: ApplicationFiled: January 20, 2015Publication date: May 14, 2015Applicant: MASSACHUSETTS INSTITUTE OF TECHNOLOGYInventors: Joseph M. Jacobson, David Kong, Vikas Anant, Ashley Salomon, Saul Griffith, Will DelHagen, Vikrant Agnihotri
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Patent number: 8937001Abstract: A technique for forming nanostructures including a definition of a charge pattern on a substrate and introduction of charged molecular scale sized building blocks (MSSBBs) to a region proximate the charge pattern so that the MSSBBs adhere to the charge pattern to form the feature.Type: GrantFiled: January 10, 2012Date of Patent: January 20, 2015Assignee: Massachusetts Institute of TechnologyInventors: Joseph M. Jacobson, David Kong, Vikas Anant, Ashley Salomon, Saul Griffith, Will DelHagen, Vikrant Agnihotri
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Patent number: 8367525Abstract: A process for forming nanostructures comprises generating charged nanoparticles with an electrospray system and introduction of the charged nanoparticles to a substrate, so that the particles adhere to the substrate in order to form the desired structure. The charged nanoparticles may be directed to a target position by at least one deflector in the electrospray apparatus, which may also include a column optic system. The adhered nanoparticles may be sintered to form the structure. The electrospray apparatus may be single source, multi-source injection, or multi-source selection. An array of electrospray apparatuses with deflectors may be used concurrently to form the structure.Type: GrantFiled: January 23, 2010Date of Patent: February 5, 2013Assignee: Massachusetts Institute of TechnologyInventors: Joseph M. Jacobson, Jae-bum Joo, Jon Varsanik, Vikrant Agnihotri
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Publication number: 20120108041Abstract: A technique for forming nanostructures including a definition of a charge pattern on a substrate and introduction of charged molecular scale sized building blocks (MSSBBs) to a region proximate the charge pattern so that the MSSBBs adhere to the charge pattern to form the feature.Type: ApplicationFiled: January 10, 2012Publication date: May 3, 2012Applicant: MASSACHUSETTS INSTITUTE OF TECHNOLOGYInventors: Joseph M. Jacobson, David Kong, Vikas Anant, Ashley Salomon, Saul Griffith, Will DelHagen, Vikrant Agnihotri
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Patent number: 8093144Abstract: A technique for forming nanostructures including a definition of a charge pattern on a substrate and introduction of charged molecular scale sized building blocks (MSSBBs) to a region proximate the charge pattern so that the MSSBBs adhere to the charge pattern to form the feature.Type: GrantFiled: May 23, 2003Date of Patent: January 10, 2012Assignee: Massachusetts Institute of TechnologyInventors: Joseph M. Jacobson, David Kong, Vikas Anant, Ashley Salomon, Saul Griffith, Will DelHagen, Vikrant Agnihotri
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Publication number: 20100144125Abstract: A process for forming nanostructures comprises generating charged nanoparticles with an electrospray system and introduction of the charged nanoparticles to a substrate, so that the particles adhere to the substrate in order to form the desired structure. The charged nanoparticles may be directed to a target position by at least one deflector in the electrospray apparatus, which may also include a column optic system. The adhered nanoparticles may be sintered to form the structure. The electrospray apparatus may be single source, multi-source injection, or multi-source selection. An array of electrospray apparatuses with deflectors may be used concurrently to form the structure.Type: ApplicationFiled: January 23, 2010Publication date: June 10, 2010Applicant: MASSACHUSETTS INSTITUTE OF TECHNOLOGYInventors: Joseph M. Jacobson, Jae-bum Joo, Jon Varsanik, Vikrant Agnihotri
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Patent number: 7651926Abstract: A process for forming nanostructures comprises generating charged nanoparticles with an electrospray system in a vacuum chamber and introduction of the charged nanoparticles to a region proximate to a charge pattern, so that the particles adhere to the charge pattern in order to form the feature. Two- or three-dimensional nanostructures may be formed by rapidly creating a charge pattern of nanoscale dimensions on a substrate using a normal electron beam or a microcolumn electron beam, generating high purity nanoscale or molecular size scale building blocks of a first type that image the charge pattern using the electrospray system, and then optionally sintering the building blocks to form the feature.Type: GrantFiled: January 12, 2006Date of Patent: January 26, 2010Assignee: Massachusetts Institute of TechnologyInventors: Joseph M. Jacobson, Jae-bum Joo, Jon Varsanik, Vikrant Agnihotri
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Publication number: 20070197044Abstract: A process for forming nanostructures comprises generating charged nanoparticles with an electrospray system in a vacuum chamber and introduction of the charged nanoparticles to a region proximate to a charge pattern, so that the particles adhere to the charge pattern in order to form the feature. Two- or three-dimensional nanostructures may be formed by rapidly creating a charge pattern of nanoscale dimensions on a substrate using a normal electron beam or a microcolumn electron beam, generating high purity nanoscale or molecular size scale building blocks of a first type that image the charge pattern using the electrospray system, and then optionally sintering the building blocks to form the feature.Type: ApplicationFiled: January 12, 2006Publication date: August 23, 2007Inventors: Joseph Jacobson, Jae-bum Joo, Jon Varsanik, Vikrant Agnihotri
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Publication number: 20040033679Abstract: A technique for forming nanostructures including a definition of a charge pattern on a substrate and introduction of charged molecular scale sized building blocks (MSSBBs) to a region proximate the charge pattern so that the MSSBBs adhere to the charge pattern to form the feature.Type: ApplicationFiled: May 23, 2003Publication date: February 19, 2004Applicant: Massachusetts Institute of TechnologyInventors: Joseph M. Jacobson, David Kong, Vikas Anant, Ashley Salomon, Saul Griffith, Will DelHagen, Vikrant Agnihotri