Patents by Inventor Viktor Melnik

Viktor Melnik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of fabricating ion implanted doping layers in semiconductor materials and integrated circuits made therefrom
    Patent number: 6358823
    Abstract: A method of fabricating ion implanted doping layers in semiconductor materials by subjecting the material to an ultrasonic treatment during the implantation of predetermined impurities. In an alternate embodiment ultrasonic vibrations are generated by primary ion currents of sufficient density reflected by a piezo-electric element applied to the semiconductor material.
    Type: Grant
    Filed: April 12, 2000
    Date of Patent: March 19, 2002
    Assignee: Institut fuer Halbleiterphysik Frankfurt (Oder) GmbH.
    Inventors: Dietmar Krueger, Rainer Kurps, Boris Romanjuk, Viktor Melnik, Jaroslav Olich