Publication number: 20070161537
Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RFmonomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and/or RF-foam stabilizers. The RF portion can include at least two CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover.
Type:
Application
Filed:
January 28, 2005
Publication date:
July 12, 2007
Applicant:
Great Lakes Chemical Corporation
Inventors:
Janet Boggs, Stephan Brandstadter, John Chien, Vimal Sharma, Edwards Bradley, Victoria Hedrick, Andrew Jackson, Gregory Leman, Bruno Ameduri, George Kostov
Publication number: 20070149437
Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF urethanes, and/or RF-foam stabilizers. The RF portion can include at least two —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit Compositions are provided that include a substrate having a RF-composition thereover.
Type:
Application
Filed:
January 28, 2005
Publication date:
June 28, 2007
Inventors:
Janet Boggs, Stephan Brandstadter, John Chien, Vimal Sharma, E. Bradley Edwards, Victoria Hedrick, Andrew Jackson, Gregory Leman, Edward Norman, Robert Kaufman
Patent number: 7094936
Abstract: Methods and materials are provided for the production and purification of halogenated compounds and intermediates in the production of 1,1,1,3,3-pentafluoropropane. In a preferred embodiment, the process steps include: (1) reacting carbon tetrachloride with vinyl chloride to produce 1,1,1,3,3-pentachloropropane; (2) dehydrochlorinating the 1,1,1,3,3-pentachloropropane with a Lewis acid catalyst to produce 1,1,3,3-tetrachloropropene; (3) fluorinating the 1,1,3,3-tetrachloropropene to produce 1-chloro-3,3,3-trifluoropropene; (4) fluorinating the 1-chloro-3,3,3-trifluoropropene to produce a product mixture containing 1,1,1,3,3-pentafluoropropane; and (5) separating 1,1,1,3,3-pentafluoropropane from by-products.
Type:
Grant
Filed:
October 16, 2003
Date of Patent:
August 22, 2006
Assignee:
Great Lakes Chemical Corporation
Inventors:
Stephen Owens, Andrew Jackson, Vimal Sharma, Mitchel Cohn, John Cheng-Ping Qian, Julia Ann Sacarias, Yuichi Iikubo
Publication number: 20060161029
Abstract: Methods and materials are provided for the production and purification of halogenated compounds and intermediates in the production of 1,1,1,3,3-pentafluoropropane. In a preferred embodiment, the process steps include: (1) reacting carbon tetrachloride with vinyl chloride to produce 1,1,1,3,3-pentachloropropane; (2) dehydrochlorinating the 1,1,1,3,3-pentachloropropane with a Lewis acid catalyst to produce 1,1,3,3-tetrachloropropene; (3) fluorinating the 1,1,3,3-tetrachloroprope-ne to produce 1-chloro-3,3,3-trifluoropropene; (4) fluorinating the 1-chloro-3,3,3-trifluoropropene to produce a product mixture containing 1,1,1,3,3-pentafluoropropane; and (5) separating 1,1,1,3,3-pentafluoropro-pane from by-products.
Type:
Application
Filed:
December 29, 2005
Publication date:
July 20, 2006
Inventors:
Stephen Owens, Andrew Jackson, Vimal Sharma, Mitchel Cohn, John Qian, Julia Sacarias, Yuichi Iikubo
Publication number: 20050101810
Abstract: Methods and materials are provided for the production and purification of halogenated compounds and intermediates in the production of 1,1,1,3,3-pentafluoropropane. In a preferred embodiment, the process steps include: (1) reacting carbon tetrachloride with vinyl chloride to produce 1,1,1,3,3-pentachloropropane; (2) dehydrochlorinating the 1,1,1,3,3 -pentachloropropane with a Lewis acid catalyst to produce 1,1,3,3-tetrachloropropene; (3) fluorinating the 1,1,3,3-tetrachloropropene to produce 1-chloro-3,3,3-trifluoropropene; (4) fluorinating the 1-chloro-3,3,3-trifluoropropene to produce a product mixture containing 1,1,1,3,3 -pentafluoropropane; and (5) separating 1,1,1,3,3-pentafluoropropane from by-products.
Type:
Application
Filed:
December 8, 2004
Publication date:
May 12, 2005
Inventors:
Stephen Owens, Andrew Jackson, Vimal Sharma, Mitchel Cohn, John Qian, Julia Sacarias, Yuichi Iikubo
Publication number: 20030028057
Abstract: Methods and materials are provided for the production and purification of halogenated compounds and intermediates in the production of 1,1,1,3,3-pentafluoropropane. In a preferred embodiment, the process steps include: (1) reacting carbon tetrachloride with vinyl chloride to produce 1,1,1,3,3-pentachloropropane; (2) dehydrochlorinating the 1,1,1,3,3-pentachloropropane with a Lewis acid catalyst to produce 1,1,3,3-tetrachloropropene; (3) fluorinating the 1,1,3,3-tetrachloropropene to produce 1-chloro-3,3,3-trifluoropropene; (4) fluorinating the 1-chloro-3,3,3-trifluoropropene to produce a product mixture containing 1,1,1,3,3-pentafluoropropane; and (5) separating 1,1,1,3,3-pentafluoropropane from by-products.
Type:
Application
Filed:
April 26, 2002
Publication date:
February 6, 2003
Inventors:
Stephen Owens, Andrew Jackson, Vimal Sharma, Mitchel Cohn, John Cheng-Ping Qian, Julia Ann Sacarias, Yuichi Iikubo